Invention Grant
- Patent Title: Semiconductor device containing nitrogen
-
Application No.: US15708162Application Date: 2017-09-19
-
Publication No.: US10468549B2Publication Date: 2019-11-05
- Inventor: Hsin-Chiao Fang , Cheng-Hsueh Lu , Cheng-Hung Lin , Chi-Hao Cheng , Chi-Feng Huang
- Applicant: Genesis Photonics Inc.
- Applicant Address: TW Tainan
- Assignee: Genesis Photonics Inc.
- Current Assignee: Genesis Photonics Inc.
- Current Assignee Address: TW Tainan
- Agency: JCIPRNET
- Priority: TW105130173A 20160919
- Main IPC: H01L33/14
- IPC: H01L33/14 ; H01L33/06 ; H01L33/02 ; H01L33/32

Abstract:
A nitrogen-containing semiconductor device including a first type doped semiconductor layer, a multiple quantum well layer and a second type doped semiconductor layer is provided. The multiple quantum well layer includes barrier layers and well layers, and the well layers and the barrier layers are arranged alternately. The multiple quantum well layer is located between the first type doped semiconductor layer and the second type doped semiconductor layer, and one of the well layers of the multiple quantum well layer is connected to the second type doped semiconductor layer.
Public/Granted literature
- US20180083162A1 SEMICONDUCTOR DEVICE CONTAINING NITROGEN Public/Granted day:2018-03-22
Information query
IPC分类: