Invention Grant
- Patent Title: Optoelectronic device and method for manufacturing the same
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Application No.: US15820002Application Date: 2017-11-21
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Publication No.: US10529893B2Publication Date: 2020-01-07
- Inventor: Chao-Hsing Chen , Jia-Kuen Wang , Chien-Chih Liao , Tzu-Yao Tseng , Tsun-Kai Ko , Chien-Fu Shen
- Applicant: EPISTAR CORPORATION
- Applicant Address: TW Hsinchu
- Assignee: EPISTAR CORPORATION
- Current Assignee: EPISTAR CORPORATION
- Current Assignee Address: TW Hsinchu
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: TW103123102A 20140703
- Main IPC: H01L33/38
- IPC: H01L33/38 ; H01L33/40

Abstract:
An optoelectronic device, comprising a first semiconductor layer comprising four boundaries comprising two longer sides and two shorter sides; a second semiconductor layer formed on the first semiconductor layer; and a plurality of first conductive type electrodes formed on the first semiconductor layer, wherein one first part of the plurality of first conductive type electrodes is formed on a corner constituted by one of the two longer sides and one of the two shorter sides, and wherein one fourth part of the plurality of first conductive type electrodes is formed along the one of the two longer sides, the one fourth part of the plurality of first conductive type electrodes comprises a head portion and a tail portion, the head portion comprises a width larger than that of the tail portion.
Public/Granted literature
- US20180076358A1 OPTOELECTRONIC DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2018-03-15
Information query
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