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公开(公告)号:US11658269B2
公开(公告)日:2023-05-23
申请号:US17206647
申请日:2021-03-19
Applicant: EPISTAR CORPORATION
Inventor: Chao-Hsing Chen , Jia-Kuen Wang , Tzu-Yao Tseng , Bo-Jiun Hu , Tsung-Hsun Chiang , Wen-Hung Chuang , Kuan-Yi Lee , Yu-Ling Lin , Chien-Fu Shen , Tsun-Kai Ko
CPC classification number: H01L33/46 , H01L33/382 , H01L33/38 , H01L33/405
Abstract: A light-emitting device includes a semiconductor stack including a first semiconductor layer, a second semiconductor layer, and an active layer between the first semiconductor layer and the second semiconductor layer; one or multiple vias penetrating the active layer and the second semiconductor layer to expose the first semiconductor layer; a first contact layer covering the one or multiple vias; a third insulating layer including a first group of one or multiple third insulating openings on the second semiconductor layer to expose the first contact layer; a first pad on the semiconductor stack and covering the first group of one or multiple third insulating openings; and a second pad on the semiconductor stack and separated from the first pad with a distance, wherein the second pad is formed at a position other than positions of the one or multiple vias in a top view of the light-emitting device.
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公开(公告)号:US11563149B2
公开(公告)日:2023-01-24
申请号:US17357164
申请日:2021-06-24
Applicant: EPISTAR CORPORATION
Inventor: Yi-Hung Lin , Chao-Hsing Chen , Jia-Kuen Wang , Tzu-Yao Tseng
IPC: H01L33/00 , H01L33/40 , H01L33/22 , H01L33/46 , H01L33/42 , H01L33/62 , H01L33/32 , F21K9/23 , H01L33/06 , H01L33/12 , F21K9/232 , F21Y115/10 , F21K9/69
Abstract: A light-emitting device includes a semiconductor structure including a first semiconductor layer, a second semiconductor layer, and an active layer formed between the first semiconductor layer and the second semiconductor layer; a via penetrating the second semiconductor layer and the active layer to expose a surface of the first semiconductor layer; a first electrode formed in the via and on the second semiconductor layer; a second electrode formed on the second semiconductor layer; and an insulating structure covering the first electrode, the second electrode and the semiconductor structure and including a first opening to expose the first electrode and a second opening to expose the second electrode, wherein the first electrode and the second electrode respectively include a metal layer contacting the insulating layer, the metal layer includes a material including a surface tension value larger than 1500 dyne/cm and a standard reduction potential larger than 0.3 V.
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公开(公告)号:US11329195B2
公开(公告)日:2022-05-10
申请号:US16938249
申请日:2020-07-24
Applicant: EPISTAR CORPORATION
Inventor: Chao-Hsing Chen , Jia-Kuen Wang , Tzu-Yao Tseng , Tsung-Hsun Chiang , Bo-Jiun Hu , Wen-Hung Chuang , Yu-Ling Lin
IPC: H01L33/38 , H01L33/00 , H01L33/10 , H01L33/24 , H01L33/42 , H01L33/46 , H01L33/62 , H01L33/08 , H01L33/22 , H01L33/44 , H01L33/40 , H01L33/02
Abstract: A semiconductor light-emitting device includes a substrate; a first semiconductor layer and a second semiconductor layer formed on the substrate, wherein the first semiconductor layer includes a first exposed portion and a second portion; a plurality of first trenches formed on the substrate and including a surface composed by the first exposed portion; a second trench formed on the substrate and including a surface composed by the second exposed portion at a periphery region of the semiconductor light-emitting device, wherein each of the plurality of first trenches is branched from the second trench; and a patterned metal layer formed on the second semiconductor layer and including a first metal region and a second metal region, and portions of the second metal region are formed in the plurality of first trenches and the second trench to electrically connect to the first exposed portion and the second exposed portion.
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公开(公告)号:US11011679B2
公开(公告)日:2021-05-18
申请号:US16703419
申请日:2019-12-04
Applicant: EPISTAR CORPORATION
Inventor: Chao-Hsing Chen , Jia-Kuen Wang , Chien-Chih Liao , Tzu-Yao Tseng , Tsun-Kai Ko , Chien-Fu Shen
Abstract: An optoelectronic device, comprising a first semiconductor layer comprising four boundaries comprising two longer sides and two shorter sides; a second semiconductor layer formed on the first semiconductor layer; and a plurality of first conductive type electrodes formed on the first semiconductor layer, wherein one first part of the plurality of first conductive type electrodes is formed on a corner constituted by one of the two longer sides and one of the two shorter sides, and wherein one fourth part of the plurality of first conductive type electrodes is formed along the one of the two longer sides, the one fourth part of the plurality of first conductive type electrodes comprises a head portion and a tail portion, the head portion comprises a width larger than that of the tail portion.
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公开(公告)号:US10411162B2
公开(公告)日:2019-09-10
申请号:US15265069
申请日:2016-09-14
Applicant: EPISTAR CORPORATION
Inventor: Chao-Hsing Chen , Jia-Kuen Wang , Tzu-Yao Tseng , Tsung-Hsun Chiang , Bo-Jiun Hu , Wen-Hung Chuang , Yu-Ling Lin
Abstract: A semiconductor light-emitting device includes a semiconductor stack including a first semiconductor layer, a second semiconductor layer, and an active layer; a plurality of first trenches penetrating the second semiconductor layer and the active layer to expose the first semiconductor layer; a second trench penetrating the second semiconductor layer and the active layer to expose the first semiconductor layer, wherein the second trench is disposed near an outmost edge of the active layer, and surrounds the active layer and the plurality of first trenches; a patterned metal layer formed on the second semiconductor layer and formed in one of the plurality of first trenches or the second trench; and a first pad portion and a second pad portion both formed on the second semiconductor layer and electrically connecting the second semiconductor layer and the first semiconductor layer respectively.
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公开(公告)号:US12176465B2
公开(公告)日:2024-12-24
申请号:US18136921
申请日:2023-04-20
Applicant: EPISTAR CORPORATION
Inventor: Chao-Hsing Chen , Jia-Kuen Wang , Tzu-Yao Tseng , Bo-Jiun Hu , Tsung-Hsun Chiang , Wen-Hung Chuang , Kuan-Yi Lee , Yu-Ling Lin , Chien-Fu Shen , Tsun-Kai Ko
Abstract: A light-emitting device includes a semiconductor stack including a first semiconductor layer, a second semiconductor layer, and an active layer between the first semiconductor layer and the second semiconductor layer; one or multiple vias penetrating the active layer and the second semiconductor layer to expose the first semiconductor layer; a first contact layer covering the one or multiple vias; a third insulating layer including a first group of one or multiple third insulating openings on the second semiconductor layer to expose the first contact layer; a first pad on the semiconductor stack and covering the first group of one or multiple third insulating openings; and a second pad on the semiconductor stack and separated from the first pad with a distance, wherein the second pad is formed at a position other than positions of the one or multiple vias in a top view of the light-emitting device.
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公开(公告)号:US11908975B2
公开(公告)日:2024-02-20
申请号:US17228602
申请日:2021-04-12
Applicant: EPISTAR CORPORATION
Inventor: Chao-Hsing Chen , Jia-Kuen Wang , Chien-Chih Liao , Tzu-Yao Tseng , Tsun-Kai Ko , Chien-Fu Shen
CPC classification number: H01L33/38 , H01L33/382 , H01L33/387 , H01L33/405
Abstract: An optoelectronic device includes a first semiconductor layer, a second semiconductor layer and an active layer between the first semiconductor layer and the second semiconductor layer; a first insulating layer on the second semiconductor layer and including a plurality of first openings exposing the first semiconductor layer, wherein the first openings include a first group and a second group; a third electrode on the first insulating layer and including a first extended portion and a second extended portion, wherein the first extended portion and the second extended portion are respectively electrically connected to the first semiconductor layer through the first group of the first openings and the second group of the first openings, and wherein the number of the first group of the first openings is different from the number of the second group of the first openings; and a plurality of fourth electrodes on the second insulating layer and electrically connected to the second semiconductor layer, wherein in a top view of the optoelectronic device, the first extended portion is located between the fourth electrodes.
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公开(公告)号:US11764332B2
公开(公告)日:2023-09-19
申请号:US17712690
申请日:2022-04-04
Applicant: EPISTAR CORPORATION
Inventor: Chao-Hsing Chen , Jia-Kuen Wang , Tzu-Yao Tseng , Tsung-Hsun Chiang , Bo-Jiun Hu , Wen-Hung Chuang , Yu-Ling Lin
IPC: H01L33/10 , H01L33/24 , H01L33/38 , H01L33/42 , H01L33/62 , H01L33/22 , H01L33/44 , H01L33/00 , H01L33/46 , H01L33/02 , H01L33/08 , H01L33/40
CPC classification number: H01L33/382 , H01L33/00 , H01L33/10 , H01L33/24 , H01L33/385 , H01L33/387 , H01L33/42 , H01L33/46 , H01L33/62 , H01L33/0012 , H01L33/02 , H01L33/08 , H01L33/22 , H01L33/38 , H01L33/405 , H01L33/44 , H01L2224/48091 , H01L2224/73265 , H01L2224/48091 , H01L2924/00014
Abstract: A semiconductor light-emitting device includes a semiconductor stack including a first semiconductor layer, a second semiconductor layer, and an active layer between the first semiconductor layer and the second semiconductor layer, wherein the first semiconductor layer includes a lateral outer perimeter surface surrounding the active layer; a plurality of vias penetrating the semiconductor stack to expose the first semiconductor layer; a first pad portion and a second pad portion formed on the semiconductor stack to respectively electrically connected to the first semiconductor layer and the second semiconductor layer, wherein the second pad portion and the first pad portion are arranged in a first direction; wherein the plurality of vias is arranged in a plurality of rows, the plurality of rows are arranged in the first direction and includes a first row and a second row, the first row is covered by the second pad portion, the second row is not covered by the first pad portion and the second pad portion, wherein a spacing between two adjacent vias in the first row is different from a spacing between two adjacent vias in the second row.
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公开(公告)号:US11011680B2
公开(公告)日:2021-05-18
申请号:US16566585
申请日:2019-09-10
Applicant: EPISTAR CORPORATION
Inventor: Yi-Hung Lin , Chao-Hsing Chen , Jia-Kuen Wang , Tzu-Yao Tseng , Jen-Chieh Yu , Guan-Wu Chen
IPC: H01L33/40 , H01L33/22 , H01L33/46 , H01L33/42 , H01L33/62 , H01L33/00 , H01L33/32 , H01L33/06 , H01L33/12 , F21K9/23 , F21K9/232 , F21Y115/10 , F21K9/69
Abstract: A light-emitting device includes a semiconductor structure including a first semiconductor layer, a second semiconductor layer, and an active layer formed between the first semiconductor layer and the second semiconductor layer; a via penetrating the second semiconductor layer and the active layer to expose a surface of the first semiconductor layer; a first electrode formed in the via and on the second semiconductor layer; a second electrode formed on the second semiconductor layer; and an insulating structure covering the first electrode, the second electrode and the semiconductor structure and including a first opening to expose the first electrode and a second opening to expose the second electrode, wherein the first electrode and the second electrode respectively include a metal layer contacting the insulating layer, the metal layer includes a material including a surface tension value larger than 1500 dyne/cm and a standard reduction potential larger than 0.3 V.
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公开(公告)号:US10950758B2
公开(公告)日:2021-03-16
申请号:US16877840
申请日:2020-05-19
Applicant: EPISTAR CORPORATION
Inventor: Chao-Hsing Chen , Jia-Kuen Wang , Wen-Hung Chuang , Tzu-Yao Tseng , Cheng-Lin Lu
IPC: H01L33/00 , H01L33/40 , H01L33/22 , H01L33/46 , H01L33/42 , H01L33/62 , H01L33/32 , F21K9/23 , H01L33/06 , H01L33/12 , F21K9/232 , F21Y115/10 , F21K9/69
Abstract: A light-emitting device comprises a semiconductor structure comprising a surface and a side wall inclined to the surface, wherein the semiconductor structure comprises a first semiconductor layer, a second semiconductor layer on the first semiconductor layer, and an active layer between the first semiconductor layer and the second semiconductor layer, and the second semiconductor layer comprises a first edge and a first area; a reflective layer located on the second semiconductor layer and comprising an outer edge and a second area, wherein a distance between the first edge and the outer edge is greater than 0 μm and is not greater than 10 μm; and a first contact part comprising a metal formed on the reflective layer and the first semiconductor layer, wherein the first contact part comprises a first periphery comprising a first periphery length larger than a periphery length of the active layer from a top-view of the light-emitting device.
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