Invention Grant
- Patent Title: Coating compositions suitable for use with an overcoated photoresist
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Application No.: US14605465Application Date: 2015-01-26
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Publication No.: US10539873B2Publication Date: 2020-01-21
- Inventor: James F. Cameron , Jin Wuk Sung , John P. Amara , Gregory P. Prokopowicz , David A. Valeri
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Main IPC: G03F7/32
- IPC: G03F7/32 ; G03F7/20 ; G03F7/16 ; G03F7/11 ; G03F7/09 ; C09D5/00 ; C08F220/36 ; C09D133/12 ; B05D1/00 ; B05D3/02 ; B05D3/06 ; B05D5/06 ; B05D7/00
Abstract:
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
Public/Granted literature
- US20170108776A1 COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST Public/Granted day:2017-04-20
Information query
IPC分类:
