Invention Grant
- Patent Title: Method and system for ion beam delayering of a sample and control thereof
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Application No.: US15379049Application Date: 2016-12-14
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Publication No.: US10689763B2Publication Date: 2020-06-23
- Inventor: Robert K. Foster , Christopher Pawlowicz , Jason Abt , Ian Jones , Heinz Josef Nentwich
- Applicant: TECHINSIGHTS INC.
- Applicant Address: CA Ottawa
- Assignee: TECHINSIGHTS INC.
- Current Assignee: TECHINSIGHTS INC.
- Current Assignee Address: CA Ottawa
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Main IPC: C23F4/00
- IPC: C23F4/00 ; G01N1/32 ; H01L23/00 ; H01J37/32 ; H01L21/263 ; H01L21/66

Abstract:
There is provided a method, system and computer program product to delayer a layer of a sample, the layer comprising one or more materials, in an ion beam mill by adjusting one or more operating parameters of the ion beam mill and selectively removing each of the one or more materials at their respective predetermined rates. There is also provided a method and system for obtaining rate of removal of a material from a sample in an ion beam mill.
Public/Granted literature
- US20170089813A1 METHOD AND SYSTEM FOR ION BEAM DELAYERING OF A SAMPLE AND CONTROL THEREOF Public/Granted day:2017-03-30
Information query
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