Invention Grant
- Patent Title: Method of aberration measurement and electron microscope
-
Application No.: US16282897Application Date: 2019-02-22
-
Publication No.: US10886099B2Publication Date: 2021-01-05
- Inventor: Yuji Kohno , Akiho Nakamura
- Applicant: JEOL Ltd.
- Applicant Address: JP Tokyo
- Assignee: JEOL Ltd.
- Current Assignee: JEOL Ltd.
- Current Assignee Address: JP Tokyo
- Agency: The Webb Law Firm
- Priority: JP2018-030713 20180223
- Main IPC: H01J37/00
- IPC: H01J37/00 ; H01J37/22 ; H01J37/28 ; H01J37/26 ; H01J37/153

Abstract:
There is provided a method of aberration measurement capable of reducing the effects of image drift. The novel method of aberration measurement is for use in an electron microscope. The method comprises the steps of: acquiring a first image that is a TEM (transmission electron microscope) image of a sample; scanning the illumination angle of an electron beam impinging on the sample and acquiring a second image by multiple exposure of a plurality of TEM images generated at different illumination angles; and calculating aberrations from the first and second images.
Public/Granted literature
- US20190267210A1 Method of Aberration Measurement and Electron Microscope Public/Granted day:2019-08-29
Information query