Invention Grant
- Patent Title: Crystalline oxide semiconductor film and semiconductor device
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Application No.: US17832984Application Date: 2022-06-06
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Publication No.: US11967618B2Publication Date: 2024-04-23
- Inventor: Isao Takahashi , Takashi Shinohe , Rie Tokuda , Masaya Oda , Toshimi Hitora
- Applicant: FLOSFIA INC.
- Applicant Address: JP Kyoto
- Assignee: FLOSFIA INC.
- Current Assignee: FLOSFIA INC.
- Current Assignee Address: JP Kyoto
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP 16217661 2016.11.07 JP 17137447 2017.07.13
- Main IPC: H01L29/22
- IPC: H01L29/22 ; C23C16/40 ; C30B25/02 ; C30B29/16 ; H01L21/02 ; H01L29/04 ; H01L29/12 ; H01L29/227 ; H01L29/24 ; H01L29/739 ; H01L29/778 ; H01L29/78 ; H01L29/808 ; H01L29/812 ; H01L29/872

Abstract:
A crystalline oxide semiconductor film with an enhanced electrical property is provided. By use of a mist CVD apparatus, a crystalline oxide semiconductor film with a corundum structure and a principal plane that is an a-plane or an m-plane was obtained on a crystalline substrate by atomizing a raw-material solution containing a dopant that is an n-type dopant to obtain atomized droplets, carrying the atomized droplets by carrier gas onto the crystalline substrate that is an a-plane corundum-structured crystalline substrate or an m-plane corundum-structured crystalline substrate placed in a film-formation chamber, and the atomized droplets were thermally reacted to form the crystalline oxide semiconductor film on the crystalline substrate.
Public/Granted literature
- US20220302263A1 CRYSTALLINE OXIDE SEMICONDUCTOR FILM AND SEMICONDUCTOR DEVICE Public/Granted day:2022-09-22
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