Invention Application
- Patent Title: INSPECTION METHOD
- Patent Title (中): 检查方法
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Application No.: US15016301Application Date: 2016-02-05
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Publication No.: US20160153909A1Publication Date: 2016-06-02
- Inventor: Cheng-Pin Chen , Yun-Li Li , Shou-Wen Hsu , Chih-Hung Tseng , Pei-Yi Huang , Ching-Cheng Sun , Tsung-Syun Huang , Yung-Tsung Lin , Ping-Tsung Tsai
- Applicant: Genesis Photonics Inc.
- Priority: TW102127517 20130731
- Main IPC: G01N21/63
- IPC: G01N21/63 ; G01N21/88
Abstract:
An inspection apparatus is capable for inspecting at least one light-emitting device. The inspection apparatus includes a working machine and an inspection light source. The inspection light source is disposed on the working machine and located above the light-emitting device. A dominant wavelength of the inspection light source is smaller than a dominant wavelength of the light-emitting device so as to excite the light-emitting device and get an optical property of the light-emitting device.
Information query
