Invention Publication
- Patent Title: APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
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Application No.: US18345956Application Date: 2023-06-30
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Publication No.: US20240014003A1Publication Date: 2024-01-11
- Inventor: Shuai LI , Weiming REN , Xuedong LIU , Juying DOU , Xuerang HU , Zhongwei CHEN
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: H01J37/28
- IPC: H01J37/28 ; H01J37/10

Abstract:
A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.
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