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    METHOD, APPARATUS, AND SYSTEM FOR WAFER GROUNDING
    1.
    发明申请
    METHOD, APPARATUS, AND SYSTEM FOR WAFER GROUNDING 有权

    公开(公告)号：US20220277926A1

    公开(公告)日：2022-09-01

    申请号：US17753298

    申请日：2020-08-25

    Applicant: ASML Netherlands B.V.

    Inventor： Yixiang WANG ,  Shibing LIU ,  Shanhui CAO ,  Kangsheng QIU ,  Juying DOU ,  Ying LUO ,  Yinglong LI ,  Qiang LI ,  Ronald VAN DER WILK ,  Jan-Gerard Cornelis VAN DER TOORN

    IPC: H01J37/20 ,  H01L21/683

    Abstract: Systems and methods for wafer grounding and wafer grounding location adjustment are disclosed. A first method may include receiving a first value of an electric characteristic associated with the wafer being grounded by an electric signal; determining a first control parameter using at least the first value; and controlling a characteristic of the electric signal using the first control parameter and the first value. A second method for adjusting a grounding location for a wafer may include terminating an electric connection between the wafer and at least one grounding pin in contact the wafer; adjusting a relative position between the wafer and the grounding pin; and restoring the electric connection between the grounding pin and the wafer. A third method may include causing a grounding pin to penetrate through a coating on the wafer by impact; and establishing an electrical connection between the grounding pin and the wafer.

    APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
    3.
    发明申请
    APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS 有权

    公开(公告)号：US20210384008A1

    公开(公告)日：2021-12-09

    申请号：US17373716

    申请日：2021-07-12

    Applicant: ASML Netherlands B.V.

    Inventor： Shuai LI ,  Weiming REN ,  Xuedong LIU ,  Juying DOU ,  Xuerang HU ,  Zhongwei CHEN

    IPC: H01J37/28 ,  H01J37/10

    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

    APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
    4.
    发明公开
    APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS 审中-公开

    公开(公告)号：US20240014003A1

    公开(公告)日：2024-01-11

    申请号：US18345956

    申请日：2023-06-30

    Applicant: ASML Netherlands B.V.

    Inventor： Shuai LI ,  Weiming REN ,  Xuedong LIU ,  Juying DOU ,  Xuerang HU ,  Zhongwei CHEN

    IPC: H01J37/28 ,  H01J37/10

    CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/20

    Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

    VALVES WITH REDUCED PARTICLE GENERATION AND INCREASED CYCLE LIFE
    6.
    发明申请
    VALVES WITH REDUCED PARTICLE GENERATION AND INCREASED CYCLE LIFE 有权

    公开(公告)号：US20250003505A1

    公开(公告)日：2025-01-02

    申请号：US18709792

    申请日：2022-10-19

    Applicant: ASML Netherlands B.V.

    Inventor： Shichen GU ,  Qingpo XI ,  Juying DOU

    IPC: F16K3/18 ,  F16K51/02

    Abstract: Systems with valves that increase cycle life and reduce particle generation. Embodiments may include a first movable member, a second movable member, and a third movable member; a first link coupled to the first movable member and the second movable member such that when the second movable member is moved laterally and the third movable member is stopped, the first link exerts a force on the first movable member that causes the first movable member to move towards a surface and press against the surface to form a vacuum seal; and a second link coupled to the first movable member and the third movable member such that when the first link causes the first movable member to move, the second link exerts a force on the first movable member that limits movement of the first movable member such that the first movable member moves towards the surface with limited offset.

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