Invention Grant
- Patent Title: Dual-purpose facility of continuous hot-dip coating and continuous annealing
- Patent Title (中): 连续热浸涂层和连续退火两用设备
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Application No.: US13498461Application Date: 2010-09-22
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Publication No.: US08714104B2Publication Date: 2014-05-06
- Inventor: Masanori Hoshino
- Applicant: Masanori Hoshino
- Applicant Address: JP Tokyo
- Assignee: Nippon Steel & Sumitomo Metal Corporation
- Current Assignee: Nippon Steel & Sumitomo Metal Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JPP2009-229519 20091001
- International Application: PCT/JP2010/066394 WO 20100922
- International Announcement: WO2011/040303 WO 20110407
- Main IPC: B05C11/00
- IPC: B05C11/00 ; B05C13/00 ; B05C13/02 ; C21D1/70 ; B05D3/00 ; B05D3/02

Abstract:
A dual-purpose facility of continuous hot-dip coating and continuous annealing is configured so as to be switched between a continuous hot-dip coated material production line and a continuous annealed material production line, and includes a gas discharge path that discharges atmosphere gas in an annealing furnace from a gas discharge port provided in an outlet side of the annealing furnace out of the annealing furnace and a path opening and closing unit for opening and closing the gas discharge path. The path opening and closing unit opens the gas discharge path when the dual-purpose facility is used as the continuous hot-dip coated material production line and closes the gas discharge path when the dual-purpose facility is used as the continuous annealed material production line.
Public/Granted literature
- US20120180721A1 DUAL-PURPOSE FACILITY OF CONTINUOUS HOT-DIP COATING AND CONTINUOUS ANNEALING Public/Granted day:2012-07-19
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