Invention Grant
US09082590B2 Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates
有权
具有侧RF馈电和RF分配板的对称电感耦合等离子体源
- Patent Title: Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates
- Patent Title (中): 具有侧RF馈电和RF分配板的对称电感耦合等离子体源
-
Application No.: US13966614Application Date: 2013-08-14
-
Publication No.: US09082590B2Publication Date: 2015-07-14
- Inventor: James D. Carducci , Kenneth S. Collins , Richard Fovell , Jason A. Kenney , Kartik Ramaswamy , Shahid Rauf
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agent Robert M. Wallace
- Main IPC: H01J7/24
- IPC: H01J7/24 ; H05B31/26 ; H01J37/32 ; H05H1/46 ; C23C16/505
Abstract:
A plasma reactor has an overhead multiple coil inductive plasma source with symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.
Public/Granted literature
- US20140021861A1 SYMMETRICAL INDUCTIVELY COUPLED PLASMA SOURCE WITH SIDE RF FEEDS AND RF DISTRIBUTION PLATES Public/Granted day:2014-01-23
Information query
