Invention Grant
US09196468B2 Method and system for introducing make-up flow in an electrospray ion source system
有权
在电喷雾离子源系统中引入补充流的方法和系统
- Patent Title: Method and system for introducing make-up flow in an electrospray ion source system
- Patent Title (中): 在电喷雾离子源系统中引入补充流的方法和系统
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Application No.: US14395705Application Date: 2013-05-17
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Publication No.: US09196468B2Publication Date: 2015-11-24
- Inventor: John L. Campbell , Thomas Covey , Yves LeBlanc , Bradley B. Schneider
- Applicant: DH Technologies Development Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: DH Technologies Development Pte. Ltd.
- Current Assignee: DH Technologies Development Pte. Ltd.
- Current Assignee Address: SG Singapore
- International Application: PCT/IB2013/000976 WO 20130517
- International Announcement: WO2013/171574 WO 20131121
- Main IPC: B05B5/025
- IPC: B05B5/025 ; G01N30/02 ; H01J49/00 ; F23D11/22 ; H01J49/16 ; G01N27/62 ; H01J49/04

Abstract:
An electrospray ion source method and system is provided for detecting emitter failure comprising a liquid chromatography column suitable for chromatographic separation of a sample. The column can have an inlet for receiving the sample; and an outlet for ejecting the sample. A make-up flow channel is provided for introducing make-up flow of liquid to the sample post-column, wherein the make-up flow normalizes the spray current. An electrospray ionization source is provided having one or more electrospray ionization emitter nozzles for receiving the make-up flow containing sample. A power supply can provide a voltage to the one or more emitter nozzles, and a measurement device can measure and monitor the spray current.
Public/Granted literature
- US20150076342A1 METHOD AND SYSTEM FOR INTRODUCING MAKE-UP FLOW IN AN ELECTROSPRAY ION SOURCE SYSTEM Public/Granted day:2015-03-19
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