An apparatus for chemical bath deposition includes a housing defining a chemical tank, a circulation pipe, and at least one flow adjustment device disposed inside the chemical tank. The chemical tank has an opening on a top surface and is configured to accept and hold at least one substrate inside the chemical tank. The circulation pipe has at least one portion inside the chemical tank, and is configured to supply at least one chemical to the chemical tank. The at least one flowing adjustment device includes any one of a turbine, a diffuser and a bubbler, or a combination thereof.