Invention Grant
- Patent Title: Functional film manufacturing method and functional film
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Application No.: US14157814Application Date: 2014-01-17
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Publication No.: US09670370B2Publication Date: 2017-06-06
- Inventor: Eijiro Iwase , Jiro Tsukahara
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Edwards Neils LLC
- Agent Jean C. Edwards, Esq.
- Priority: JP2011-168360 20110801
- Main IPC: C09D7/12
- IPC: C09D7/12 ; B05D1/36 ; H05B33/04 ; B05D7/24 ; B05D7/04 ; B05D7/00 ; C23C16/34 ; C23C16/54 ; C08J7/04 ; H01L51/52 ; B05D3/04 ; B05D3/06

Abstract:
The present invention relates to a functional film and a method for manufacturing the same, the functional film being organically and inorganically laminated to have a desired function such as high gas barrier performance and having high adhesiveness between inorganic and organic layers. The organic layer on top of the inorganic layer contains an organic solvent; an organic compound formed of the organic layer; and a silane coupling agent with a concentration between 0.1 and 25 percentages by mass excluding the organic solvent, the organic layer uses a coating material not containing a pH controller, and the organic layer is formed through curing via a heating process after coating.
Public/Granted literature
- US20140178700A1 FUNCTIONAL FILM MANUFACTURING METHOD AND FUNCTIONAL FILM Public/Granted day:2014-06-26
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