Invention Grant
- Patent Title: Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates
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Application No.: US14319089Application Date: 2014-06-30
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Publication No.: US09870897B2Publication Date: 2018-01-16
- Inventor: James D. Carducci , Kenneth S. Collins , Richard Fovell , Jason A. Kenney , Kartik Ramaswamy , Shahid Rauf
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L21/306 ; H01J37/32 ; H05H1/46 ; C23C16/505
Abstract:
A plasma reactor has an overhead inductively coupled plasma source with two coil antennas and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.
Public/Granted literature
- US20140312766A1 SYMMETRICAL PLURAL-COIL PLASMA SOURCE WITH SIDE RF FEEDS AND RF DISTRIBUTION PLATES Public/Granted day:2014-10-23
Information query
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