Invention Grant
- Patent Title: Inductively coupled plasma source with symmetrical RF feed
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Application No.: US13897592Application Date: 2013-05-20
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Publication No.: US09928987B2Publication Date: 2018-03-27
- Inventor: Jason A. Kenney , James D. Carducci , Kenneth S. Collins , Richard Fovell , Kartik Ramaswamy , Shahid Rauf
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L21/306 ; H01J37/04 ; H01J37/32 ; H05H1/46
Abstract:
A plasma reactor has an overhead multiple coil inductive plasma source with RF feeds arranged in equilateral symmetry.
Public/Granted literature
- US20140020839A1 INDUCTIVELY COUPLED PLASMA SOURCE WITH SYMMETRICAL RF FEED Public/Granted day:2014-01-23
Information query
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