Invention Application
- Patent Title: METHOD AND APPARATUS FOR DETECTING SUBSTRATE SURFACE VARIATIONS
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Application No.: PCT/EP2018/062980Application Date: 2018-05-17
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Publication No.: WO2018233951A1Publication Date: 2018-12-27
- Inventor: D'ACHARD VAN ENSCHUT, Johannes, Franciscus, Martinus , DRUZHININA, Tamara , KUMAR, Nitish , ROY, Sarathi , HUANG, Yang-Shan , NIENHUYS, Han-Kwang , DEN BOEF, Arie, Jeffrey , VAN ZWOL, Pieter-Jan , ROOBOL, Sander, Bas
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: P.O. Box 324 5500 AH Veldhoven NL
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: P.O. Box 324 5500 AH Veldhoven NL
- Agency: WILLEKENS, Jeroen, Pieter, Frank
- Priority: EP17177138.9 20170621; EP17191239.7 20170915
- Main IPC: G01N21/95
- IPC: G01N21/95 ; H01L21/66 ; G03F7/20 ; G01B11/14 ; G01B11/25 ; G03F1/84
Abstract:
Disclosed is a method and associated inspection apparatus for detecting variations on a surface of a substrate. The method comprises providing patterned inspection radiation to a surface of a substrate. The inspection radiation is patterned such that an amplitude of a corresponding enhanced field is modulated in a manner corresponding to the patterned inspection radiation. The scattered radiation resultant from interaction between the enhanced field and the substrate surface is received and variations on the surface of the substrate are detected based on the interaction between the enhanced field and the substrate surface. Also disclosed is a method of detecting any changes to at least one characteristic of received radiation, the said changes being induced by the generation of a surface plasmon at said surface of the optical element.
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