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    METHOD AND APPARATUS FOR INSPECTION
    3.
    发明申请
    METHOD AND APPARATUS FOR INSPECTION 审中-公开
    检测方法和设备

    公开(公告)号：WO2017108444A1

    公开(公告)日：2017-06-29

    申请号：PCT/EP2016/080374

    申请日：2016-12-09

    Applicant: ASML NETHERLANDS B.V.

    Inventor： KASTRUP, Bernardo ,  MULKENS, Johannes, Catharinus, Hubertus ,  VAN DEN BRINK, Marinus, Aart ,  BENSCHOP, Jozef, Petrus, Henricus ,  SMAKMAN, Erwin, Paul ,  DRUZHININA, Tamara ,  VERSCHUREN, Coen, Adrianus

    IPC: H01J37/065 ,  H01J37/15

    CPC classification number: H01J37/023 ,  H01J37/15 ,  H01J37/22 ,  H01J2237/0245 ,  H01J2237/2817

    Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns (600), each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system (600, 610) configured to move (640, 630) one or more of the electron beam columns relative to another one or more of the electron beam columns. The actuator system may include a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.

    Abstract translation: 电子束检测设备，该设备包括多个电子束柱（600），每个电子束柱被配置为提供电子束并检测来自物体的散射或二次电子，以及致动器 系统（600,610），被配置为相对于另一个或多个电子束列移动（640,630）一个或多个电子束列。 致动器系统可以包括与多个第二可移动结构至少部分重叠的多个第一可移动结构，第一可移动结构和第二可移动结构支撑多个电子束柱。

    METHODS FOR PROVIDING SPACED LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS
    5.
    发明申请
    METHODS FOR PROVIDING SPACED LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS 审中-公开
    通过块状共聚物自组装提供基板上的间距平面特征的方法

    公开(公告)号：WO2014124795A1

    公开(公告)日：2014-08-21

    申请号：PCT/EP2014/051451

    申请日：2014-01-24

    Applicant: ASML NETHERLANDS B.V.

    Inventor： WUISTER, Sander ,  DRUZHININA, Tamara ,  DUSA, Mircea

    IPC: H01L21/027 ,  G03F7/00 ,  H01L21/033 ,  H01L21/308 ,  H01L29/66

    CPC classification number: H01L21/3086 ,  B82Y10/00 ,  G03F1/50 ,  G03F1/80 ,  G03F7/0002 ,  H01L21/0271 ,  H01L21/0337 ,  H01L29/0673 ,  H01L29/66439 ,  H01L29/66795 ,  H01L29/775 ,  H01L29/785

    Abstract: A method of forming a plurality of regularly spaced lithography features, the method including providing a self-assemblable block copolymer having first and second blocks in a plurality of trenches on a substrate, each trench including opposing side-walls and a base, with the side-walls having a width therebetween, wherein a first trench has a greater width than a second trench; causing the self-assemblable block copolymer to self-assemble into an ordered layer in each trench, the layer having a first domain of the first block alternating with a second domain of the second block, wherein the first and second trenches have the same number of each respective domain; and selectively removing the first domain to form regularly spaced rows of lithography features having the second domain along each trench, wherein the pitch of the features in the first trench is greater than the pitch of the features in the second trench.

    Abstract translation: 一种形成多个规则间隔的光刻特征的方法，所述方法包括提供在衬底上的多个沟槽中具有第一和第二块的自组装嵌段共聚物，每个沟槽包括相对的侧壁和底部， 在其间具有宽度的壁，其中第一沟槽具有比第二沟槽更大的宽度; 使得所述自组装嵌段共聚物自组装成每个沟槽中的有序层，所述层具有所述第一嵌段的第一区域与所述第二嵌段的第二区域交替，其中所述第一和第二沟槽具有相同数量的 各个域; 并且选择性地移除所述第一区域以形成沿着每个沟槽具有所述第二区域的规则间隔的光刻特征行，其中所述第一沟槽中的所述特征的间距大于所述第二沟槽中的所述特征的间距。

    METHOD TO PROVIDE A PATTERNED ORIENTATION TEMPLATE FOR A SELF-ASSEMBLABLE POLYMER
    6.
    发明申请
    METHOD TO PROVIDE A PATTERNED ORIENTATION TEMPLATE FOR A SELF-ASSEMBLABLE POLYMER 审中-公开
    为自组装聚合物提供图案方向模板的方法

    公开(公告)号：WO2013050338A1

    公开(公告)日：2013-04-11

    申请号：PCT/EP2012/069400

    申请日：2012-10-02

    Applicant: ASML NETHERLANDS B.V.

    Inventor： NGUYEN, Thanh ,  FINDERS, Jozef ,  KETELAARS, Wilhelmus ,  WUISTER, Sander ,  VAN DER HEIJDEN, Eddy ,  MEESSEN, Hieronymus ,  KOOLE, Roelof ,  PEETERS, Emiel ,  VAN HEESCH, Chris ,  BRIZARD, Aurelie ,  BOOTS, Henri ,  DRUZHININA, Tamara ,  DE RUITER, Jessica

    IPC: B81C1/00

    CPC classification number: C30B1/12 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  G03F7/0002 ,  H01L21/0337 ,  Y10T117/10

    Abstract: A graphoepitaxy template to align a self-assembled block polymer adapted to self-assemble into a 2-D array having parallel rows of discontinuous first domains extending parallel to a first axis, mutually spaced along an orthogonal second axis, and separated by a continuous second domain. The graphoepitaxy template has first and second substantially parallel side walls extending parallel to and defining the first axis and mutually spaced along the second axis to provide a compartment to hold at least one row of discontinuous first domains of the self-assembled block copolymer on the substrate between and parallel to the side walls, and separated therefrom by a continuous second domain. The compartment has a graphoepitaxial nucleation feature arranged to locate at least one of the discontinuous first domains at a specific position within the compartment. Methods for forming the graphoepitaxy template and its use for device lithography are also disclosed.

    Abstract translation: 用于使自组装嵌段聚合物对准以将其自组装成具有平行于第一轴线延伸的不连续第一区域的平行行的二维阵列，并且沿着正交的第二轴相互间隔开并由连续的第二轴 域。 所述方解石模板具有第一和第二基本上平行的侧壁，所述第一和第二基本平行的侧壁平行于并限定第一轴线并且限定第一轴线并且沿着第二轴线相互间隔延伸，以提供隔室，以将自组装嵌段共聚物的至少一排不连续的第一区域保持在基板上 在侧壁之间并平行于侧壁，并通过连续的第二结构域与之隔开。 隔室具有图案外延成核特征，布置成将隔离物内的特定位置处的不连续的第一结构域中的至少一个定位。 还公开了用于形成图案石墨模板的方法及其用于器件光刻的方法。

    METHOD OF SIMULATING FORMATION OF LITHOGRAPHY FEATURES BY SELF-ASSEMBLY OF BLOCK COPOLYMERS
    9.
    发明申请
    METHOD OF SIMULATING FORMATION OF LITHOGRAPHY FEATURES BY SELF-ASSEMBLY OF BLOCK COPOLYMERS 审中-公开
    通过块状共聚物自组装模拟成像特征的方法

    公开(公告)号：WO2014191163A1

    公开(公告)日：2014-12-04

    申请号：PCT/EP2014/059097

    申请日：2014-05-05

    Applicant: ASML NETHERLANDS B.V.

    Inventor： WUISTER, Sander ,  DRUZHININA, Tamara ,  VAN MALE, Jan ,  KLEIN-WOLTERINK, Joanne ,  AMBESI, Davide

    IPC: G03F7/00

    CPC classification number: G06F17/5009 ,  G03F7/0002 ,  G06F17/5081 ,  G06F2217/12

    Abstract: A method of determining an uncertainty in the position of a domain within a self- assembly block copolymer (BCP) feature. The method includes simulating a BCP feature, calculating a minimum energy position of a first domain within the simulated BCP feature, simulating the application of a potential that causes the position of the first domain to be displaced from the minimum energy position, simulating release of the potential back toward the minimum energy, recording a plurality of energies of the BCP feature during the release and recording at each of the plurality of energies a displacement of the first domain from the minimum energy position, calculating, from the recorded energies and recorded displacements, a probability distribution indicating a probability of the first domain being displaced from the minimum energy position, and, from the probability distribution, calculating an uncertainty in the position of the first domain within the BCP feature.

    Abstract translation: 确定自组装嵌段共聚物（BCP）特征中的域的位置的不确定性的方法。 该方法包括模拟BCP特征，计算模拟BCP特征中的第一域的最小能量位置，模拟使第一域的位置从最小能量位置移位的电位的应用，模拟BCP特征的释放 在释放期间记录多个能量的BCP特征，并且在多个能量中的每一个处记录第一域从最小能量位置的位移，从记录的能量和记录的位移计算出， 指示第一域从最小能量位置移位的概率的概率分布，并且从概率分布计算BCP特征中的第一域的位置的不确定性。

    METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS
    10.
    发明申请
    METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS 审中-公开
    通过嵌段共聚物自组装提供基板上的刻蚀特征的方法

    公开(公告)号：WO2014023589A1

    公开(公告)日：2014-02-13

    申请号：PCT/EP2013/065824

    申请日：2013-07-26

    Applicant: ASML NETHERLANDS B.V.

    Inventor： FINDERS, Jozef ,  DRUZHININA, Tamara ,  PEETERS, Emiel ,  WUISTER, Sander ,  VAN HEESCH, Chris ,  VAN DER HEIJDEN, Eddy ,  BOOTS, Henri

    IPC: G03F7/00

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G06F17/5009 ,  G06F17/5068

    Abstract: A method of designing an epitaxy template to direct self-assembly of a block copolymer on a substrate into an ordered target pattern involves providing a primary epitaxy template design and then varying the design to optimize a pattern fidelity statistic, such as placement error, relative to the target pattern by modelling predicted self-assembled block copolymer patterns and optimizing pattern placement as a function of a varied design parameter. In addition to varying a design parameter to optimize the pattern fidelity statistic, a random error in the template design is included prior to modelling predicted patterns in order to compensate for expected template inaccuracy in practice. The inclusion of a realistic random error in the template design, in addition to systematic variation of a design parameter, may improve the template design optimization to render the result less sensitive to error which may be inevitable in practice.

    Abstract translation: 设计外延模板以将基底上的嵌段共聚物自组装成有序目标图案的方法包括提供初级外延模板设计，然后改变设计以优化图案保真度统计量，例如放置误差，相对于 通过对预测的自组装嵌段共聚物图案进行模拟和优化作为不同设计参数的函数的图案放置来实现目标图案。 除了改变设计参数以优化模式保真度统计量之外，在模拟预测模式之前还包括模板设计中的随机误差，以便在实践中补偿预期的模板不准确性。 除了设计参数的系统变化之外，在模板设计中包括一个现实的随机误差，可以改进模板设计优化，使得结果对于在实践中可能是不可避免的误差较不敏感。

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