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1.发明申请
公开(公告)号：WO2019011608A1
公开(公告)日：2019-01-17
申请号：PCT/EP2018/066438
申请日：2018-06-20
Applicant: ASML NETHERLANDS B.V.
Inventor： QUINTANILHA, Richard , SMAKMAN, Erwin, Paul , AKBULUT, Duygu , KUMAR, Nitish , GOORDEN, Sebastianus, Adrianus , SETIJA, Irwan, Dani
IPC: G03F9/00 , G01N23/225 , G01R31/305
Abstract: An inspection tool for inspecting a semiconductor substrate is described, the inspection tool comprising: - an substrate table configured to hold the substrate; - an electron beam source configured to project an electron beam onto an area of interest of the substrate, the area of interest comprising a buried structure; - a cathodoluminescent detector configured to detect cathodoluminescent light emitted from the buried structure; - a control unit configured to: - control the electron beam source to project to electron beam onto the area of interest; - receive a signal representative of the detected cathodoluminescent light; - determine, based on the signal, a characteristic of the buried structure.
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公开(公告)号：WO2017211694A1
公开(公告)日：2017-12-14
申请号：PCT/EP2017/063356
申请日：2017-06-01
Applicant: ASML NETHERLANDS B.V.
Inventor： KUMAR, Nitish , HUISMAN, Simon, Reinald
Abstract: A supercontinuum radiation source for an alignment mark measurement system comprises: a radiation source; illumination optics; a plurality of waveguides; and collection optics. The radiation source is operable to produce a pulsed radiation beam. The illumination optics is arranged to receive the pulsed pump radiation beam and to form a plurality of pulsed sub-beams, each pulsed sub-beam comprising a portion of the pulsed radiation beam. Each of the plurality of waveguides is arranged to receive at least one of the plurality of pulsed sub-beams beam and to broaden a spectrum of that pulsed sub- beam so as to generate a supercontinuum sub-beam. The collection optics is arranged to receive the supercontinuum sub-beam from each of the plurality of waveguides and to combine them so as to form a supercontinuum radiation beam.
Abstract translation: 用于对准标记测量系统的超连续谱辐射源包括：辐射源; 照明光学; 多个波导; 和收集光学。 辐射源可操作以产生脉冲辐射束。 照明光学器件布置成接收脉冲式泵辐射束并形成多个脉冲式子束，每个脉冲式子束包括脉冲式辐射束的一部分。 多个波导中的每一个布置成接收多个脉冲子光束中的至少一个，并且扩大该脉冲子光束的光谱以产生超连续谱子光束。 收集光学器件被设置为从多个波导中的每一个接收超连续谱子光束并将它们组合以形成超连续谱辐射光束。
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公开(公告)号：WO2019149477A1
公开(公告)日：2019-08-08
申请号：PCT/EP2019/050306
申请日：2019-01-08
Applicant: ASML NETHERLANDS B.V.
Inventor： KUMAR, Nitish , QUINTANILHA, Richard , VAN KRAAIJ, Markus, Gerardus, Martinus, Maria , TSIGUTKIN, Konstantin , COENE, Willem, Marie, Julia, Marcel
Abstract: Disclosed is a method of inspection for defects on a substrate, such as a reflective reticle substrate, and associated apparatuses. The method comprises performing the inspection using first inspection radiation obtained from a high harmonic generation source and having one or more first wavelengths within a first wavelength range of between 20nm and 150nm. Also disclosed is a method comprising performing (310) a coarse inspection using first inspection radiation having one or more first wavelengths within a first wavelength range; and performing (320) a fine inspection using second inspection radiation having one or more second wavelengths within a second wavelength range, said second wavelength range comprising wavelengths shorter than said first wavelength range.
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4.发明申请
公开(公告)号：WO2019011606A1
公开(公告)日：2019-01-17
申请号：PCT/EP2018/066428
申请日：2018-06-20
Applicant: ASML NETHERLANDS B.V.
Inventor： QUINTANILHA, Richard , KUMAR, Nitish , AKBULUT, Duygu
IPC: G03F9/00
Abstract: An inspection tool for inspecting a semiconductor substrate is described, the inspection tool comprising: - a substrate table configured to hold the substrate; - an electron beam source configured to project an electron beam onto an area of interest of the substrate; - a cathode-luminesce detector configured to detect cathodoluminescent light emitted from the area of interest; - a control unit configured to: - receive a signal representative of the detected cathodoluminescent light; - determine, based on the signal, a stress distribution of the area of interest.
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5.发明申请METHOD AND APPARATUS FOR DERIVING CORRECTIONS, METHOD AND APPARATUS FOR DETERMINING A PROPERTY OF A STRUCTURE, DEVICE MANUFACTURING METHOD 审中-公开用于导出校正的方法和装置，用于确定结构特性的方法和装置，装置制造方法
公开(公告)号：WO2018046284A1
公开(公告)日：2018-03-15
申请号：PCT/EP2017/070990
申请日：2017-08-21
Applicant: ASML NETHERLANDS B.V.
Inventor： KUMAR, Nitish , SCHELLEKENS, Adrianus, Johannes, Hendrikus , VAN DER POST, Sietse, Thijmen , ZIJP, Ferry , COENE, Willem, Marie, Julia, Marcel , VAN VOORST, Peter, Danny , AKBULUT, Duygu , ROY, Sarathi
IPC: G03F7/20
Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a calibration method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a SIL would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.
Abstract translation: 光学系统在与基底上的目标结构相互作用之后提供照射辐射并收集辐射。 测量强度分布用于计算结构性质的测量值。 该光学系统可以包括固体浸没式透镜。 在校准方法中，控制光学系统以使用第一照射轮廓获得第一强度轮廓，并使用第二照射轮廓获得第二强度轮廓。 这些配置文件用于推导用于减轻重影反射影响的修正。 使用例如不同取向的半月照明轮廓，该方法即使在SIL会引起全内反射的情况下也可以测量重影反射。 光学系统可以包括污染物检测系统以基于接收到的散射检测辐射来控制移动。 该光学系统可以包括具有介电涂层的光学部件以增强瞬逝波相互作用。
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Patent Agency Ranking
公开(公告)号：WO2022008160A1
公开(公告)日：2022-01-13
申请号：PCT/EP2021/065681
申请日：2021-06-10
Applicant: ASML NETHERLANDS B.V.
Inventor： HUISMAN, Simon, Reinald , BEUKMAN, Arjan, Johannes, Anton , DEN BOEF, Arie, Jeffrey , GOORDEN, Sebastianus, Adrianus , KUMAR, Nitish , LIAN, Jin , ZHOU, Zili
Abstract: Disclosed is an illumination arrangement for spectrally shaping a broadband illumination beam to obtain a spectrally shaped illumination beam. The illumination arrangement comprises a beam dispersing element for dispersing the broadband illumination beam and a spatial light modulator for spatially modulating the broadband illumination beam subsequent to being dispersed. The illumination arrangement further comprises at least one of a beam expanding element for expanding said broadband illumination beam in at least one direction, located between an input of the illumination arrangement and the spatial light modulator; and a lens array, each lens of which for directing a respective wavelength band of the broadband illumination beam subsequent to being dispersed onto a respective region of the spatial light modulator.
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公开(公告)号：WO2020141050A1
公开(公告)日：2020-07-09
申请号：PCT/EP2019/084725
申请日：2019-12-11
Applicant: ASML NETHERLANDS B.V.
Inventor： BEUKMAN, Arjan, Johannes, Anton , POLO, Alessandro , PELLEMANS, Henricus, Petrus, Maria , KUMAR, Nitish
Abstract: Disclosed is a metrology apparatus comprising an optical element configured to receive at or near a pupil plane of the metrology apparatus, at least first radiation comprising a first higher diffracted order and second radiation comprising a zeroth order resulting from illumination of a metrology target with radiation; and to direct said first radiation and second radiation together in a first direction. The metrology apparatus is further configured to form at least a first image of a first interference pattern, the first interference pattern resulting from interference of said first radiation and second radiation at an image plane.
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公开(公告)号：WO2018233951A1
公开(公告)日：2018-12-27
申请号：PCT/EP2018/062980
申请日：2018-05-17
Applicant: ASML NETHERLANDS B.V.
Inventor： D'ACHARD VAN ENSCHUT, Johannes, Franciscus, Martinus , DRUZHININA, Tamara , KUMAR, Nitish , ROY, Sarathi , HUANG, Yang-Shan , NIENHUYS, Han-Kwang , DEN BOEF, Arie, Jeffrey , VAN ZWOL, Pieter-Jan , ROOBOL, Sander, Bas
Abstract: Disclosed is a method and associated inspection apparatus for detecting variations on a surface of a substrate. The method comprises providing patterned inspection radiation to a surface of a substrate. The inspection radiation is patterned such that an amplitude of a corresponding enhanced field is modulated in a manner corresponding to the patterned inspection radiation. The scattered radiation resultant from interaction between the enhanced field and the substrate surface is received and variations on the surface of the substrate are detected based on the interaction between the enhanced field and the substrate surface. Also disclosed is a method of detecting any changes to at least one characteristic of received radiation, the said changes being induced by the generation of a surface plasmon at said surface of the optical element.
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9.发明申请
公开(公告)号：WO2022028778A1
公开(公告)日：2022-02-10
申请号：PCT/EP2021/067854
申请日：2021-06-29
Applicant: ASML NETHERLANDS B.V.
Inventor： HASAN, Shakeeb Bin , KUMAR, Nitish
IPC: G03F7/20 , G01N21/55 , G01N21/956
Abstract: The present disclosure relates to a method for determining deviations in a fabrication process, comprising the following steps: a. providing a sample with a layer having a periodic structure fabricated using the fabrication process and intended to cause a corresponding part of the layer to be fully reflective for light having a wavelength in a wavelength range and having an angle of incidence in an angle range; b. illuminating the sample with light having a wavelength in the wavelength range and an angle of incidence in the angle range; c. detecting light reflected and/or scattered from the layer of the sample; and d. determining deviations in the fabrication process from the detected light.
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公开(公告)号：WO2017211545A1
公开(公告)日：2017-12-14
申请号：PCT/EP2017/061670
申请日：2017-05-16
Applicant: ASML NETHERLANDS B.V.
Inventor： QUINTANILHA, Richard , KUMAR, Nitish
IPC: G03F7/20
CPC classification number: G03F7/0002 , G01N21/956 , G03F7/0005 , G03F7/2004 , G03F7/2008 , G03F7/70625 , G03F7/70633 , G03F9/7019
Abstract: A metrology apparatus uses radiation (304) in an EUV waveband. A first detection system (333) includes a spectroscopic grating (312) and a detector (313) for capturing a spectrum of the EUV radiation after interaction with a target (T). Properties of the target are measured by analyzing the spectrum. The radiation (304) further includes radiation in other wavebands such as VUV, DUV, UV, visible and IR. A second detection system (352, 372, 382) is arranged to receive at least a portion of radiation (350) reflected by the first spectroscopic grating and to capture a spectrum (SA) in one or more of said other wavebands. The second waveband spectrum can be used to enhance accuracy of the measurement based on the EUV spectrum, and/or it can be used for a different measurement. Other types of detection, such as polarization can be used instead or in addition to spectroscopic gratings.
Abstract translation: 测量设备在EUV波段中使用辐射（304）。 第一检测系统（333）包括用于在与目标（T）相互作用之后捕获EUV辐射的光谱的光谱光栅（312）和检测器（313）。 通过分析光谱来测量目标的属性。 辐射（304）还包括其他波段（例如VUV，DUV，UV，可见光和IR）中的辐射。 第二检测系统（352,372,382）被布置成接收由第一光谱光栅反射的辐射（350）的至少一部分并捕获一个或多个所述其他波段中的光谱（SA）。 第二波段频谱可用于提高基于EUV频谱的测量精度，和/或其可用于不同的测量。 其他类型的检测，例如偏振可以替代或除了光谱光栅之外使用。
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