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    ATTENUATION APPARATUS AND METHOD
    1.
    发明申请
    ATTENUATION APPARATUS AND METHOD 审中-公开
    衰减装置和方法

    公开(公告)号：WO2017036720A1

    公开(公告)日：2017-03-09

    申请号：PCT/EP2016/068528

    申请日：2016-08-03

    Applicant: ASML NETHERLANDS B.V.

    Inventor： NIENHUYS, Han-Kwang ,  DE VRIES, Gosse, Charles

    IPC: G03F7/20 ,  G02B26/02

    CPC classification number: G03F7/70191 ,  G02B26/023 ,  G03F7/70158

    Abstract: An apparatus (60) for adjusting an intensity of radiation. The apparatus comprises a grating (61) for receiving a radiation beam (B a ) and for directing at least a portion of the radiation beam in a first direction in the form of a first reflected radiation beam (B a0 ), and one or more first actuators operable to rotate the grating to adjust a grazing angle between the radiation beam and a surface of the grating so as to vary an intensity of the reflected radiation beam.

    Abstract translation: 一种用于调节辐射强度的装置（60）。 该装置包括用于接收辐射束（Ba）并用于沿第一反射辐射束（Ba0）形式的第一方向引导辐射束的至少一部分的光栅（61），以及一个或多个第一致动器 可操作以旋转光栅以调节辐射束和光栅表面之间的掠射角度，以便改变反射辐射束的强度。

    IMPROVED BEAM PIPE
    3.
    发明申请
    IMPROVED BEAM PIPE 审中-公开
    改进的束管

    公开(公告)号：WO2016131569A1

    公开(公告)日：2016-08-25

    申请号：PCT/EP2016/050731

    申请日：2016-01-15

    Applicant: ASML NETHERLANDS B.V.

    Inventor： NIKIPELOV, Andrey, Alexandrovich ,  LOOPSTRA, Erik, Roelof ,  BANINE, Vadim, Yevgenyevich ,  RENKENS, Michael, Jozef, Mathijs ,  NIENHUYS, Han-Kwang

    IPC: H05H7/14

    CPC classification number: H05H7/14 ,  H01J2237/0268 ,  H05H2007/041

    Abstract: A beam pipe (29) for an electron beam comprising a first section having an inner surface (28a), a vacuum layer (35) provided on a portion of the inner surface, and a conductive layer (36,37a). The vacuum layer is arranged such that at least a portion of the conductive layer is exposed to an electron beam during use and the conductive layer has a lower electrical resistance than the vacuum layer.

    Abstract translation: 一种用于电子束的光束管（29），包括具有内表面（28a）的第一部分，设置在内表面的一部分上的真空层（35）和导电层（36,37a）。 真空层布置成使得导电层的至少一部分在使用期间暴露于电子束，并且导电层具有比真空层更低的电阻。

    METROLOGY MEASUREMENT METHOD AND APPARATUS
    4.
    发明申请
    METROLOGY MEASUREMENT METHOD AND APPARATUS 审中-公开

    公开(公告)号：WO2022253526A1

    公开(公告)日：2022-12-08

    申请号：PCT/EP2022/062486

    申请日：2022-05-09

    Applicant: ASML NETHERLANDS B.V.

    Inventor： NIENHUYS, Han-Kwang ,  HELFENSTEIN, Patrick, Philipp ,  ROOBOL, Sander, Bas ,  VAN RIJSWIJK, Loes, Frederique ,  SCHOLZ, Sandy, Claudia

    IPC: G03F7/20

    Abstract: Disclosed is a method of measuring a target on a substrate using a metrology tool comprising an illumination source operable to emit an illumination beam for illuminating the target and a metrology sensor for collecting the scattered radiation having been scattered by the target. The method comprises calculating a target angle based on cell dimensions of a unit cell of said target in a first direction and a second direction orthogonal to said first direction; and order numbers of a selected pair of complementary diffraction orders in said first direction and second direction. At least one pair of measurement acquisitions is performed at a first target orientation and a second target orientation with respect to the illumination beam, wherein said target angle for at least one of said at least one pair of measurement acquisitions is an oblique angle.

    PARTICLE TRAPS AND BARRIERS FOR PARTICLE SUPPRESSION
    6.
    发明申请
    PARTICLE TRAPS AND BARRIERS FOR PARTICLE SUPPRESSION 审中-公开

    公开(公告)号：WO2019020445A1

    公开(公告)日：2019-01-31

    申请号：PCT/EP2018/069463

    申请日：2018-07-18

    Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

    Inventor： NIENHUYS, Han-Kwang ,  ALBRIGHT, Ronald, Peter ,  BRINKERT, Jacob ,  HUANG, Yang-Shan ,  SCHIMMEL, Hendrikus, Gijsbertus ,  VERWEIJ, Antonie, Hendrik

    IPC: G03F7/20

    Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.

    BEAM SPLITTING APPARATUS
    8.
    发明申请
    BEAM SPLITTING APPARATUS 审中-公开
    光束分割装置

    公开(公告)号：WO2017036717A2

    公开(公告)日：2017-03-09

    申请号：PCT/EP2016/068513

    申请日：2016-08-03

    Applicant: ASML NETHERLANDS B.V.

    Inventor： DE VRIES, Gosse, Charles ,  NIENHUYS, Han-Kwang

    CPC classification number: G03F7/70991 ,  G02B5/1838 ,  G02B5/1857 ,  G02B5/1861 ,  G02B6/00 ,  G02B6/29314 ,  G02B27/1086 ,  G02B27/1093 ,  G03F7/70025 ,  G03F7/70033 ,  G03F7/70158 ,  G03F7/70208 ,  G03F7/70316 ,  G03F7/7055 ,  G03F7/70566 ,  H01S3/0903

    Abstract: A beam-splitting apparatus arranged to receive an input radiation beam and split the input radiation beam into a plurality of output radiation beams. The beam-splitting apparatus comprising a plurality of reflective diffraction gratings arranged to receive a radiation beam and configured to form a diffraction pattern comprising a plurality of diffraction orders, at least some of the reflective diffraction gratings being arranged to receive a 0 th diffraction order formed at another of the reflective diffraction gratings. The reflective diffraction gratings are arranged such that the optical path of each output radiation beam includes no more than one instance of a diffraction order which is not a 0 th diffraction order.

    Abstract translation: 一种分束装置，被布置成接收输入辐射束并将输入辐射束分成多个输出辐射束。 所述分束装置包括多个反射衍射光栅，所述多个反射衍射光栅布置成接收辐射束并且被配置为形成包括多个衍射级的衍射图案，所述反射衍射光栅中的至少一些被布置成接收第 另一个反射衍射光栅。 反射衍射光栅被布置成使得每个输出辐射束的光路包括不超过第一衍射级的衍射级的不超过一个的情况。

    COMPONENT FOR A RADIATION SOURCE, ASSOCIATED RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
    10.
    发明申请
    COMPONENT FOR A RADIATION SOURCE, ASSOCIATED RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 审中-公开
    辐射源组件，相关辐射源和光刻设备

    公开(公告)号：WO2015014531A1

    公开(公告)日：2015-02-05

    申请号：PCT/EP2014/062686

    申请日：2014-06-17

    Applicant: ASML NETHERLANDS B.V.

    Inventor： NIENHUYS, Han-Kwang

    IPC: G03F7/20 ,  H05G2/00

    CPC classification number: G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    Abstract: Disclosed is component for a radiation source, said radiation source being operable to generate radiation from a fuel, said component having a surface comprising a plurality of first regions that have a high wettability by said fuel, separated by second regions which have a low wettability by said fuel. Said component may comprise a screening element for a droplet generator or contamination trap, for example.

    Abstract translation: 公开了一种用于辐射源的部件，所述辐射源可操作以产生来自燃料的辐射，所述部件具有包括多个第一区域的表面，所述第一区域具有由所述燃料具有高润湿性的第一区域，由具有低润湿性的第二区域分开， 说燃料 所述组件可以包括例如用于液滴发生器或污染物阱的筛选元件。

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