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公开(公告)号：WO2006071936A3
公开(公告)日：2006-07-06
申请号：PCT/US2005/047257
申请日：2005-12-28
Applicant: CORNING INCORPORATED , BOOKBINDER, Dana C , FIACCO, Richard M , HRDINA, Kenneth E , TANDON, Pushkar , BLEAKING, Daniel J , MAXON, John E , WILBERT, Kimberly A
Inventor： BOOKBINDER, Dana C , FIACCO, Richard M , HRDINA, Kenneth E , TANDON, Pushkar , BLEAKING, Daniel J , MAXON, John E , WILBERT, Kimberly A
Abstract: Disclosed are high purity synthetic silica glass material having a high OH concentration homogeneity in a plane perpendicular to the optical axis, and process of making the same. The glass has high refractive index homogeneity. The glass can have high internal transmission of at least 99.65%/cm at 193 nm. The process does not require a post-sintering homogenization step. The controlling factors for high compositional homogeneity, thus high refractive index homogeneity, include high initial local soot density uniformity in the soot preform and slow sintering, notably isothermal treatment during consolidation.
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2.发明申请HIGH REFRACTIVE INDEX HOMOGENEITY FUSED SILICA GLASS AND METHOD OF MAKING SAME 审中-公开高折射率均匀性融合硅胶玻璃及其制造方法
公开(公告)号：WO2006071936A2
公开(公告)日：2006-07-06
申请号：PCT/US2005047257
申请日：2005-12-28
Applicant: CORNING INC , BOOKBINDER DANA C , FIACCO RICHARD M , HRDINA KENNETH E , TANDON PUSHKAR , BLEAKING DANIEL J , MAXON JOHN E , WILBERT KIMBERLY A
Inventor： BOOKBINDER DANA C , FIACCO RICHARD M , HRDINA KENNETH E , TANDON PUSHKAR , BLEAKING DANIEL J , MAXON JOHN E , WILBERT KIMBERLY A
CPC classification number: C03C3/06 , C03B19/1453 , C03B2201/03 , C03B2201/04 , C03B2201/07 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03C2201/12 , C03C2201/21 , C03C2201/23
Abstract: Disclosed are high purity synthetic silica glass material having a high OH concentration homogeneity in a plane perpendicular to the optical axis, and process of making the same. The glass has high refractive index homogeneity. The glass can have high internal transmission of at least 99.65%/cm at 193 nm. The process does not require a post-sintering homogenization step. The controlling factors for high compositional homogeneity, thus high refractive index homogeneity, include high initial local soot density uniformity in the soot preform and slow sintering, notably isothermal treatment during consolidation.
Abstract translation: 公开了在垂直于光轴的平面内具有高OH浓度均匀性的高纯度合成石英玻璃材料及其制造方法。 玻璃具有高折射率均匀性。 该玻璃在193nm下可以具有至少99.65％/ cm的高内部透射率。 该方法不需要烧结后均化步骤。 高成分均匀性因此高折射率均匀性的控制因素包括在烟灰预制棒中的初始局部烟灰密度均匀性和慢速烧结，特别是在固结期间的等温处理。
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公开(公告)号：WO2002088035A1
公开(公告)日：2002-11-07
申请号：PCT/US2002/009189
申请日：2002-03-25
Applicant: CORNING INCORPORATED , HRDINA, Kenneth E , RUSSO, Nikki J , WASILEWSKI, Michael H
Inventor： HRDINA, Kenneth E , RUSSO, Nikki J , WASILEWSKI, Michael H
IPC: C03B8/04
CPC classification number: C03B19/1453 , C03B19/1407 , C03B19/1484 , C03B2201/04 , C03B2201/075 , C03B2201/42 , C03B2207/32
Abstract: A method for forming EUV Lithography large dimension homogeneous glass body is disclosed which includes delivering a silica precursor (28) to a burner (16) and passing the silica precursor (16) through the flame (36) of the burner (16) to form silica particles (38), depositing the silica particles (38) on a planar surface (14) to form a flat porous EUV Lithography large dimension preform (40) and consolidating the flat porous EUV Lithography large dimension preform (40) into a flat dense EUV Lithography large dimension homogeneous glass body.
Abstract translation: 公开了一种用于形成EUV平版印刷大尺寸均匀玻璃体的方法，其包括将二氧化硅前体（28）输送到燃烧器（16）并使二氧化硅前体（16）通过燃烧器（16）的火焰（36）形成 二氧化硅颗粒（38），将二氧化硅颗粒（38）沉积在平坦表面（14）上以形成平坦多孔EUV平版印刷大尺寸预制件（40），并将平面多孔EUV平版印刷大尺寸预成型件（40）固结成扁平密度 EUV平版印刷大尺寸均匀玻璃体。
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Patent Agency Ranking4.发明申请
公开(公告)号：WO2012148611A1
公开(公告)日：2012-11-01
申请号：PCT/US2012/030681
申请日：2012-03-27
Applicant: CORNING INCORPORATED , COOK, Glen Bennett , HRDINA, Kenneth E , THOMAS, Christopher S , WIGHT, John Forrest Jr
CPC classification number: C30B28/06 , C30B29/06 , C30B35/002
Abstract: The disclosure relates to vessels configured to contain molten semiconducting materials. The vessels include a high purity fused silica lining having a base and sidewalls that define an interior volume, and a fused silica backing proximate the external surfaces of the lining.
Abstract translation: 本公开涉及构造成容纳熔融半导体材料的容器。 容器包括具有限定内部容积的基部和侧壁的高纯度熔融石英衬里，以及靠近衬里的外表面的熔融石英衬垫。
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公开(公告)号：WO2009070223A1
公开(公告)日：2009-06-04
申请号：PCT/US2008/012897
申请日：2008-11-19
Applicant: CORNING INCORPORATED , HRDINA, Kenneth, E. , SABIA, Robert
Inventor： HRDINA, Kenneth, E. , SABIA, Robert
IPC: C03C3/097
CPC classification number: C03C3/06 , C03B19/1407 , C03B19/143 , C03B19/1484 , C03B2201/42 , C03C2201/42 , C03C2203/40
Abstract: A low expansion glass substrate includes titania and silica and has a thermal expansivity with an average gradient less than 1 ppb/°C /°C in a temperature range of 19°C to 25°C.
Abstract translation: 低膨胀玻璃基板包括二氧化钛和二氧化硅，并且在19℃至25℃的温度范围内具有平均梯度小于1ppb /℃/℃的热膨胀性。
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公开(公告)号：WO2005082800A1
公开(公告)日：2005-09-09
申请号：PCT/US2005/005709
申请日：2005-02-23
Applicant: CORNING INCORPORATED , BOOKBINDER, Dana C , FIACCO, Richard M , HRDINA, Kenneth E , MOORE, Lisa A , SCHIEFELBEIN, Susan L
Inventor： BOOKBINDER, Dana C , FIACCO, Richard M , HRDINA, Kenneth E , MOORE, Lisa A , SCHIEFELBEIN, Susan L
IPC: C03C3/06
CPC classification number: C03C3/06 , C03B19/1453 , C03B32/00 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03B2207/32 , C03C2201/21 , C03C2201/23
Abstract: Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633nm, of between about -1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70µJ/cm 2 . The synthetic silica glass optical material of the present invention comprises OH concentration levels less than about 600ppm, preferably less than 200ppm, and H 2 concentration levels less than about 5.0x10 17 molecules/cm 3 , and preferably less than about 2.0x10 17 molecules/cm 3 . A method of producing a synthetic silica glass optical material is also claimed.
Abstract translation: 公开了一种合成石英玻璃光学材料，其特征在于波长小于约250nm，特别是具有低激光诱导波前失真的紫外线波长范围内具有高抗紫外线辐射的光学损伤。 具体地，当经受在约193nm的操作的激光器和约70μJ/ cm 2的通量时，在633nm处测量的激光诱导波前失真在约-1.0和1.0nm / cm之间。 本发明的合成二氧化硅玻璃光学材料包括OH浓度水平低于约600ppm，优选小于200ppm，H 2浓度水平低于约5.0×10 17分子/ cm 3，优选小于约2.0×10 3 17分子/ cm 3。 还要求生产合成石英玻璃光学材料的方法。
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7.发明申请METHOD FOR PRODUCING TITANIA-DOPED FUSED SILICA EXTREME ULTRAVIOLET LITHOGRAPHY SUBSTRATES GLASS 审中-公开生产钛酸钠熔融二氧化硅超高压超薄基板玻璃的方法
公开(公告)号：WO2002088036A1
公开(公告)日：2002-11-07
申请号：PCT/US2002/009461
申请日：2002-03-25
Applicant: CORNING INCORPORATED , ACKERMAN, Bradford G , HRDINA, Kenneth E , MOORE, Lisa A , RUSSO, Nikki J , YU, Chunzhe C
Inventor： ACKERMAN, Bradford G , HRDINA, Kenneth E , MOORE, Lisa A , RUSSO, Nikki J , YU, Chunzhe C
IPC: C03B8/04
CPC classification number: C03C4/0085 , C03B19/1415 , C03B19/1453 , C03B19/1484 , C03B2201/12 , C03B2201/42 , C03B2207/32 , C03B2207/62 , C03B2207/70 , C03C3/06 , C03C3/076 , C03C2201/12 , C03C2201/42 , C03C2203/40 , Y02P40/57
Abstract: A titania precursor (18) and a silica precursor (6) are mixed in a manifold (14) and are fed to a burner (28) to create soot (40) which is deposited on a deposition surface (34) which is rotated and elevated. The end product is useful for Extreme UV lithography.
Abstract translation: 将二氧化钛前体（18）和二氧化硅前体（6）混合在歧管（14）中并被供给到燃烧器（28）以产生沉积在旋转的沉积表面（34）上的烟灰（40） 升高。 最终产品适用于Extreme UV光刻。
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8.发明申请SYNTHETIC SILICA MATERIAL WITH LOW FLUENCE-DEPENDENT-TRANSMISSION AND METHOD OF MAKING THE SAME 审中-公开具有低流变依赖性传输的合成二氧化硅材料及其制造方法
公开(公告)号：WO2007005322A1
公开(公告)日：2007-01-11
申请号：PCT/US2006/024346
申请日：2006-06-23
Applicant: CORNING INCORPORATED , BOOKBINDER, Dana C , HRDINA, Kenneth E , KOHNKE, Glenn E , MOORE, Lisa A , NEUKIRCH, Ulrich , SCHIEFELBEIN, Susan L , SMITH, Charlene M
Inventor： BOOKBINDER, Dana C , HRDINA, Kenneth E , KOHNKE, Glenn E , MOORE, Lisa A , NEUKIRCH, Ulrich , SCHIEFELBEIN, Susan L , SMITH, Charlene M
CPC classification number: C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2201/54
Abstract: Disclosed in the application are a synthetic silica glass having low fluence-dependent transmission, particularly at about 193 nm, and a process for making the same. The glass may desirably exhibit a low level of fluorescence at 290 and 390 nm when activated at about 248 nm. The glass may desirably exhibit low level of LIWFD, [SiH*] and/or [ODC].
Abstract translation: 在本申请中公开了具有低注射度依赖性透射率，特别是约193nm的合成二氧化硅玻璃及其制造方法。 当在约248nm激活时，该玻璃可期望地在290和390nm处表现出低水平的荧光。 玻璃可能期望显示低水平的LIWFD，[SiH *]和/或[ODC]。
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