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公开(公告)号：KR100782133B1
公开(公告)日：2007-12-05
申请号：KR1020060105936
申请日：2006-10-30
Applicant: 재단법인서울대학교산학협력재단 , 한국원자력연구원
CPC classification number: B82B3/0038 , B01J19/085 , B82Y30/00 , B82Y40/00
Abstract: A production method of nano material by radiating electronic beam is provided to mass-produce nano material having uniform particle size distribution or having different form for each production. A production method of nano material comprises a step of radiating electronic beam onto an organic-inorganic monomer compound represented by a structure formula: wherein M is metal element, X is selected from a group consisting of S, P, O and N, and R is a substituted or unsubstituted alkyl group. The organic-inorganic compound is prepared by polymerizing a metallic salt or at least two metallic salt compounds with hydrocarbon having at least one functional group. The other production method of nano material comprises a step of radiating electronic beam onto an organic-inorganic mixture prepared by mixing metallic salt or at least two metallic salts and hydrocarbon substituted by at least one functional group having one selected from a group consisting of S, P, O and N. Both a hydrocarbon having at least one functional group and the other hydrocarbon substituted by at least one functional group are selected from a group consisting of C1-C20 alkanethiol having -SH group, alkane thiol derivatives and di-thiol and tri-diol derivatives, or from a group consisting of compounds having C1-C20 alkyl group having at least one functional group selected from -OH, -C6H5, -NO2, -COOH, -H3PO4. The metal is selected from a group consisting of Au, Ag, Cu, Pt, Zn, Ni, Co, Mo, Mn, W, Ca, Ge, Se, Fe, Al, Ti, Pd, In, Sn and Pb. The electronic beam is radiated directly onto the organic-inorganic polymer compound or onto the organic-inorganic mixture depending on the selected method with varing the energy strength and radiation time.
Abstract translation: 提供通过辐射电子束的纳米材料的制造方法，以批量生产具有均匀粒度分布或具有不同形式的纳米材料。 纳米材料的制备方法包括将电子束辐射到由以下结构式表示的有机 - 无机单体化合物的步骤：其中M是金属元素，X选自S，P，O和N，R 是取代或未取代的烷基。 通过使金属盐或至少两种金属盐化合物与具有至少一个官能团的烃聚合来制备有机 - 无机化合物。 纳米材料的其他制造方法包括将电子束辐射到有机 - 无机混合物上的步骤，该有机 - 无机混合物是通过混合金属盐或至少两种金属盐和被至少一个选自S， P，O和N.具有至少一个官能团的烃和被至少一个官能团取代的其它烃选自由具有-SH基团的C1-C20链烷硫醇，烷烃硫醇衍生物和二硫醇组成的组，以及 或由具有至少一个选自-OH，-C 6 H 5，-NO 2，-COOH，-H 3 PO 4的官能团的C 1 -C 20烷基的化合物组成的组中。 金属选自Au，Ag，Cu，Pt，Zn，Ni，Co，Mo，Mn，W，Ca，Ge，Se，Fe，Al，Ti，Pd，In，Sn和Pb。 电子束根据所选择的方法直接照射到有机 - 无机高分子化合物或有机 - 无机混合物上，具有改变能量强度和辐射时间。
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公开(公告)号：KR1020090123552A
公开(公告)日：2009-12-02
申请号：KR1020080049694
申请日：2008-05-28
Applicant: 재단법인서울대학교산학협력재단
IPC: C08F30/04 , C08F230/04 , C08F236/04 , C08J5/22
CPC classification number: C08F30/04 , C08F2/46 , C08F230/04 , C08F236/04 , C08J5/18
Abstract: PURPOSE: A copper-containing polymer is provided to form a copper-containing thin film with uniform surface through processes such as spray or wet coating, and micropattern by photolithography, and to be applied to a electromagnetic shielding film. CONSTITUTION: A copper-containing polymer comprises a repeating unit represented by chemical formula 1. In chemical formula 1, R1 shows hydrogen atom or C1-C10 alkyl group; R2 is an electron donating group or an aliphatic or aromatic hydrocarbon chain having the electron donating group at an end; Z shows a ligand bond functional group coordinating copper or a ligand bond compound; and n is an integer of 1-10,000.
Abstract translation: 目的：提供含铜聚合物以通过诸如喷雾或湿涂层的方法形成具有均匀表面的含铜薄膜，并且通过光刻法形成微图案，并且应用于电磁屏蔽膜。 构成：含铜聚合物包含由化学式1表示的重复单元。在化学式1中，R 1表示氢原子或C 1 -C 10烷基; R2是末端具有给电子基团的给电子基团或脂肪族或芳香族烃链; Z表示配位键官能团，配位铜或配体键合化合物; n为1-10,000的整数。
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公开(公告)号：KR100918807B1
公开(公告)日：2009-09-25
申请号：KR1020080049702
申请日：2008-05-28
Applicant: 재단법인서울대학교산학협력재단
Abstract: PURPOSE: An antibacterial polymer composition is provided to ensure strong sterilizing power or antibacterial activity by reducing copper contained in a polymer. CONSTITUTION: An antibacterial polymer composition includes a copper-containing polymer and organic solvent. The antibacterial polymer composition has antibacterial activity for microorganism through reduction processing. The copper-containing polymer has a repeating unit represented by formula 1. A method for forming an antibacterial polymer film comprises the steps of: forming a copper-containing polymer film on a substance by applying the polymer composition; and imparting an antibacterial property for microorganism to the copper-containing polymer film by reducing the copper-containing polymer film using a reducing agent through chemical reduction, thermal reduction, and photo reduction.
Abstract translation: 目的：提供抗菌聚合物组合物，以通过减少聚合物中所含的铜来确保强的灭菌力或抗菌活性。 构成：抗菌聚合物组合物包括含铜聚合物和有机溶剂。 抗菌聚合物组合物通过还原处理对微生物具有抗菌活性。 含铜聚合物具有由式1表示的重复单元。抗菌聚合物膜的形成方法包括以下步骤：通过施加聚合物组合物在物质上形成含铜聚合物膜; 并通过化学还原，热还原和光还原使用还原剂还原含铜聚合物膜，将微生物的抗菌性赋予含铜聚合物膜。
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公开(公告)号：KR100703007B1
公开(公告)日：2007-04-06
申请号：KR1020050110044
申请日：2005-11-17
Applicant: 삼성전자주식회사 , 재단법인서울대학교산학협력재단
IPC: G03F7/027
Abstract: 감광성 유기 반사 방지막 형성용 조성물 및 이를 이용한 패턴 형성방법에서, 폴리머막 형성용 조성물은 에폭시기와 산 발생제(PGA)에 의해 분해가 일어나는 산 분해형 열 가교제 0.5 내지 5중량%와 안트라센을 함유하는 아크릴레이트 단량체 또는 안트라센을 함유하는 메타 아크릴레이트 단량체를 포함하는 공중합체 수지 10 내지 22중량%와 광산 발생제 0.1 내지 1중량% 및 여분의 용매를 포함하는 조성을 갖는다. 상기 폴리머막을 식각하여 폴리머막 패턴을 형성한다. 상기한 조성물은 포토레지스트 패턴을 형성하기 위한 현상공정을 수행할 때 함께 현상되는 감광성 유기 반사 방지막을 형성할 수 있다.
Abstract translation: 在组合物中的光敏有机防反射膜，并使用相同的用于形成聚合物层的形成，它包含0.5％至5％的酸可分解的热交联剂（重量）蒽的发生通过与环氧基如权利要求所产生的酸分解的丙烯酸类的组合物的图案形成方法（PGA） 它具有包括单体或甲基丙烯酸酯单体的共聚物树脂10〜22％（重量），0.1至1％（重量）的光酸产生剂和包含含有蒽多余的溶剂的组合物。 聚合物膜被蚀刻以形成聚合物膜图案。 上述组合物可形成光敏有机防反射膜，当进行形成光致抗蚀剂图案的显影工艺时，光敏有机防反射膜与光致抗蚀剂图案一起显影。
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