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公开(公告)号：US20240337956A1
公开(公告)日：2024-10-10
申请号：US18578780
申请日：2022-07-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Lucas Christiaan Johan HEIJMANS , Imre Rudolf Richard DEHNER , Raymond Wilhelmus Louis LAFARRE , Cornelis Christiaan OTTENS , Marcus Adrianus VAN DE KERKHOF , Andrey NIKIPELOV , Dennis VANOTTERDIJK , Edwin Johannes Theodorus SMULDERS , Andrei Mikhailovich YAKUNIN , Guido SALMASO , Luc VOORDECKERS , Chaitanya Krishna ANDE , Martinus Jacobus Johannes COENEN
CPC classification number: G03F7/70925 , G03F7/70708 , G03F7/7085 , G03F7/70875 , G03F1/62
Abstract: An apparatus for cleaning a component for use in a lithographic apparatus, the apparatus including at least one cleaning module or a plurality of cleaning modules, wherein the at least one cleaning module or the plurality of cleaning modules include a plurality of cleaning mechanisms, and wherein the plurality of cleaning mechanisms include: at least one preparing mechanism for reducing adhesion of the particles to the component and at least one removing mechanism for removing particles from the component, or a plurality of removing mechanisms for removing particles from the component.
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公开(公告)号：US20240310742A1
公开(公告)日：2024-09-19
申请号：US18260878
申请日：2021-12-15
Applicant: ASML Netherlands B.V.
Inventor： Vladimir KVON , Andrei Mikhailovich YAKUNIN , Marcus Adrianus VAN DE KERKHOF , Dmitry Igorevich ASTAKHOV
IPC: G03F7/00
CPC classification number: G03F7/70916 , G03F7/70716 , G03F7/70033
Abstract: A contamination reduction system for reducing contamination of a patterning system in a plasma environment, comprising: a support arranged to hold a patterning system in a radiation beam; a shutter configured to shield a portion of the radiation beam from the patterning system; and an electrode positioned between the shutter and the support, the electrode connected to a voltage source and configured to generate an electric field between the electrode and the patterning system held by the support.
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公开(公告)号：US20180259846A1
公开(公告)日：2018-09-13
申请号：US15974661
申请日：2018-05-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrei Mikhailovich YAKUNIN , Vadim Yevgenyevich BANINE , Erik Roelof LOOPSTRA , Harmen Klaas VAN DER SCHOOT , Lucas Henricus Johannes STEVENS , Maarten VAN KAMPEN
IPC: G03F1/64 , G03B27/54 , G02B5/20 , G02B27/00 , C01B32/20 , G03F7/20 , H01B1/24 , H01B1/04 , G21K1/06 , G03F1/24 , G02B5/08 , B82Y40/00 , B82Y10/00 , G03F1/62
CPC classification number: G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
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Patent Agency Ranking
公开(公告)号：US20240094647A1
公开(公告)日：2024-03-21
申请号：US17768881
申请日：2020-09-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcus Adrianus VAN DE KERKHOF , Ferdinandus Martinus Jozef Henricus VAN DE WETERING , Andrei Mikhailovich YAKUNIN
IPC: G03F7/00
CPC classification number: G03F7/70933 , G03F7/70725 , G03F7/70825 , G03F7/70833 , G03F7/70916
Abstract: A reticle conditioning system includes: a support structure to support a reticle; a gas supply module to provide a flow of gas adjacent to the reticle; and a biasing module to control an electrical potential of the reticle. The biasing module includes a first electrode, a second electrode and a voltage supply. The first and second electrodes are each spaced apart from and facing the reticle, when the reticle is supported by the support structure, so as to at least partially overlap with the reticle. The voltage supply is arranged to maintain the first electrode at a positive voltage, and the second electrode at a negative voltage, these voltages being such that the voltage of the reticle is negative. The second electrode is disposed such that, when the reticle is supported by the support structure, it does not overlap an image forming portion of the reticle.
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公开(公告)号：US20170052456A1
公开(公告)日：2017-02-23
申请号：US15119100
申请日：2015-01-23
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70433 , G03F7/70033 , G03F7/70066 , G03F7/70091 , G03F7/70241 , G03F7/7025 , G03F7/70425 , G03F7/70483 , H05G2/005 , H05G2/008
Abstract: A lithographic system including a lithographic apparatus with an anamorphic projection system, and a radiation source configured to generate an EUV radiation emitting plasma at a plasma formation location, the EUV radiation emitting plasma having an elongate form in a plane substantially perpendicular to an optical axis of the radiation source.
Abstract translation: 一种光刻系统，包括具有变形投影系统的光刻设备和被配置为在等离子体形成位置处产生EUV辐射等离子体的辐射源，所述EUV辐射发射等离子体在基本垂直于等离子体形成位置的光轴的平面中具有细长形式 辐射源。
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公开(公告)号：US20250102902A1
公开(公告)日：2025-03-27
申请号：US18727598
申请日：2023-01-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Tim Willem Johan VAN DE GOOR , Ernst GALUTSCHEK , Andrei Mikhailovich YAKUNIN , Paul JANSEN , Abraham Jan WOLF , Paul Alexander VERMEULEN , Zomer Silvester HOUWELING , Lucas Christiaan Johan HEIJMANS , Andrey NIKIPELOV
Abstract: An assembly for a lithographic apparatus, wherein the assembly is configured to heat a pellicle membrane by one of or a combination selected from: i) provision of heated gas, ii) radiative heating, iii) resistive heating, and/or iv) inductive heating, and/or by illuminating the pellicle membrane with light having a wavelength of from around 91 nm to around 590 nm. Also a method of extending the operative lifespan of a pellicle membrane, the method including heating at least a portion of a pellicle membrane when illuminated by EUV by one of or a combination selected from: i) providing heated gas, ii) radiative heating, iii) resistive heating, and/or iv) inductive heating to effect heating of the at least one portion of the pellicle membrane, and/or by illuminating the pellicle membrane with light having a wavelength of from around 91 nm to around 590 nm.
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7.发明申请公开(公告)号：US20170205704A1
公开(公告)日：2017-07-20
申请号：US15320749
申请日：2015-07-02
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich NIKIPELOV , Vadim Yevgenyevich BANINE , Jozef Petrus Henricus BENSCHOP , Arjen BOOGAARD , Florian Didier Albin DHALLUIN , Alexey Sergeevich KUZNETSOV , Mária PÉTER , Luigi SCACCABAROZZI , Willem Joan VAN DER ZANDE , Pieter-Jan VAN ZWOL , Andrei Mikhailovich YAKUNIN
CPC classification number: G03F1/62 , G02B5/1838 , G02B5/208 , G03F1/24 , G03F1/38 , G03F7/70191 , G03F7/70316 , G03F7/70575 , G03F7/70891 , G03F7/70916 , G03F7/70958 , G03F7/70983
Abstract: A membrane transmissive to EUV radiation, which may be used as a pellicle or spectral filter in a lithographic apparatus. The membrane includes one or more high doped regions wherein the membrane is doped with a dopant concentration greater than 1017 cm−3, and one or more regions with low (or no) doping. The membrane may have a main substrate having low doping and one or more additional layers, wherein the high doped regions are comprised within some or all of the additional layers.
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公开(公告)号：US20170017150A1
公开(公告)日：2017-01-19
申请号：US15281056
申请日：2016-09-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrei Mikhailovich YAKUNIN , Vadim Yevgenyevich BANINE , Erik Roelof LOOPSTRA , Harmen Klaas VAN DER SCHOOT , Lucas Henricus Johannes STEVENS , Maarten VAN KAMPEN
CPC classification number: G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
Abstract: A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
Abstract translation: 包括石墨烯的防护薄膜组件被构造并布置成用于EUV掩模版。 多层反射镜包括石墨烯作为最外层。
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