公开(公告)号：NL2005690A

公开(公告)日：2011-06-23

申请号：NL2005690

申请日：2010-11-15

Applicant: ASML NETHERLANDS BV

Inventor： GIJZEN RONALD ,  HOOGENDAM CHRISTIAAN ,  FRANKEN SANDER ,  BOERHOF RENE

IPC: G03F7/20

Abstract: A container is provided for use within a lithographic apparatus. The container is configured to house at least one component of the lithographic apparatus within an internal space which is at least partially filled with a packing material that includes a plurality of gas cells.

公开(公告)号：NL2007451A

公开(公告)日：2012-05-01

申请号：NL2007451

申请日：2011-09-21

Applicant: ASML NETHERLANDS BV

Inventor： HOOGENDAM CHRISTIAAN ,  CUIJPERS MARTINUS ,  RIEDSTRA BART ,  GIJZEN RONALD ,  BRUIN MAIKEL

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/68

公开(公告)号：NL2007279A

公开(公告)日：2012-03-29

申请号：NL2007279

申请日：2011-08-19

Applicant: ASML NETHERLANDS BV

Inventor： KNIJN PAULUS JOHANNES ,  CUIJPERS MARTINUS ,  HOOGENDAM CHRISTIAAN ,  LEVASIER LEON ,  BLOK ROLAND ,  SMEETS MARTIN

IPC: G03F7/20 ,  H01L21/68

Abstract: A method is used to calibrate a target surface of a position measurement system configured to measure a position of a movable object. The position measurement system includes the target surface mounted on the movable object, a stationary sensor system, and a processing device to calculate a position of the movable object on the basis of at least one measurement signal of the sensor system. The processing device includes a correction map of the target surface to correct for irregularities of the target surface. The method includes recalibrating the correction map of the target surface by measuring the target surface and determining a recalibrated correction map of the complete target surface on the basis of the measured target surface and one or more deformation modes of the target surface and/or physical objects affecting the target surface.