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公开(公告)号:NL2009689A
公开(公告)日:2013-06-05
申请号:NL2009689
申请日:2012-10-24
Applicant: ASML NETHERLANDS BV
Inventor: GILISSEN NOUD , CUIJPERS MARTINUS , FIEN MENNO , SIJBEN ANKO , SMEETS MARTIN
IPC: G03F7/20 , H01L21/683
Abstract: A support for an object having a support surface configured to support the object; wherein the support surface includes a main part and a moveable part, the moveable part of the support surface being moveable between a retracted position in which the moveable part of the support surface is adapted to be substantially in the same plane as the main part of the support surface and an extended position in which the moveable part of the support surface protrudes from the plane of the main part of the support surface.
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公开(公告)号:NL2008250A
公开(公告)日:2012-09-11
申请号:NL2008250
申请日:2012-02-07
Applicant: ASML NETHERLANDS BV
Inventor: NIENHUYS HAN-KWANG , CUIJPERS MARTINUS , LEVASIER LEON , SCHOOT JAN , VIJVER YURI , VOZNYI OLEG , JANSSEN FRANCISCUS , PHILIPS DANNY , MIRANDA MARCIO , GALAKTIONOV OLEKSIY , BAL KURSAT , SCHMITZ ROGER , LEROUX ALAIN , RANJAN MANISH , RIJPMA ALBERT
IPC: G03F7/20
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公开(公告)号:NL2011652A
公开(公告)日:2014-06-04
申请号:NL2011652
申请日:2013-10-21
Applicant: ASML NETHERLANDS BV
Inventor: CUIJPERS MARTINUS , VISSER RAIMOND
IPC: G03F7/20 , H01L21/687
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公开(公告)号:NL2007451A
公开(公告)日:2012-05-01
申请号:NL2007451
申请日:2011-09-21
Applicant: ASML NETHERLANDS BV
Inventor: HOOGENDAM CHRISTIAAN , CUIJPERS MARTINUS , RIEDSTRA BART , GIJZEN RONALD , BRUIN MAIKEL
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公开(公告)号:NL2007279A
公开(公告)日:2012-03-29
申请号:NL2007279
申请日:2011-08-19
Applicant: ASML NETHERLANDS BV
Inventor: KNIJN PAULUS JOHANNES , CUIJPERS MARTINUS , HOOGENDAM CHRISTIAAN , LEVASIER LEON , BLOK ROLAND , SMEETS MARTIN
Abstract: A method is used to calibrate a target surface of a position measurement system configured to measure a position of a movable object. The position measurement system includes the target surface mounted on the movable object, a stationary sensor system, and a processing device to calculate a position of the movable object on the basis of at least one measurement signal of the sensor system. The processing device includes a correction map of the target surface to correct for irregularities of the target surface. The method includes recalibrating the correction map of the target surface by measuring the target surface and determining a recalibrated correction map of the complete target surface on the basis of the measured target surface and one or more deformation modes of the target surface and/or physical objects affecting the target surface.
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