公开(公告)号：JP2002241340A

公开(公告)日：2002-08-28

申请号：JP2002030768

申请日：2002-02-07

Applicant: BASF AG

Inventor： KLEIN DANIELA ,  ERNST HANSGEORG ,  KOPPENHOFER JURGEN

IPC: C07B61/00 ,  C07C51/09 ,  C07C57/03 ,  C07C67/343

Abstract: PROBLEM TO BE SOLVED: To provide a new method for producing cis-6-hexadecenoic acid, progressing with high Z/E selectivity, and having no defect concerning safety, possessed by a conventional well-known process. SOLUTION: This method for producing the cis-6-hexadecenoic acid represented by formula I comprises (a1) reacting a triphenylphosphonium salt represented by formula II with decanal represented by formula III, or (a2) reacting a triphenylphosphonium salt represented by formula IV with an aldehyde represented by formula V by a Witting reaction, and (b) saponifying the ester produced in the steps (a1) or (a2) and represented by formula VI. (In the formulas, substituents R1, R2 and X- are same as those defined in the specification).

公开(公告)号：ES2181613T3

公开(公告)日：2003-03-01

申请号：ES00100058

申请日：2000-01-05

Applicant: BASF AG

Inventor： STREICHER HARALD DR ,  BURST WOLFRAM ,  DAUWEL JURGEN ,  KOPPENHOFER JURGEN

IPC: C07C29/80 ,  C07C31/22

Abstract: Production of highly pure phytantriol (I) comprises rectification of (I) in a fine vacuum in columns with ordered metal fabric packing and duct distributors with ≥ 500 dripping points/m at an angle of 90 degrees to the layer of fabric just below them. There are 2 or more, 20-100 mm high packing elements with layers of fabric at 90 degrees to one another. Strictly adiabatic rectification with absolute exclusion of air is used. Production of highly pure phytantriol (I) comprises rectification of (I) contaminated with lower and/or higher boiling by-products in a fine vacuum in columns containing metal fabric packing with ordered structure. The liquid is distributed with duct distributors with ≥ 500 dripping points/m . The ducts are at an angle of 90 degrees to the layer of fabric directly below them in the packing. There are 2 or more packing elements with a height of 20-100 mm and layers of fabric at 90 degrees to one another, below the distributor. The process is operated with absolute exclusion of air. Strictly adiabatic rectification is used.

公开(公告)号：AU2003229621A1

公开(公告)日：2003-10-20

申请号：AU2003229621

申请日：2003-04-08

Applicant: BASF AG

Inventor： ERNST HANSGEORG ,  KOPPENHOFER JURGEN ,  KLEIN DANIELA

IPC: C07D233/34 ,  C07B53/00 ,  C07B61/00 ,  C07D233/00

Abstract: The invention relates to a process for preparing chiral imidazolidin-2-ones of the formula I in which R 1 is C 1 -C 8 -alkyl, cyclohexyl, phenyl, a C 1 -C 6 -alkyl-, halo-, nitro-, C 1 -C 6 -alkoxy-, C 1 -C 6 -alkylmercapto- or CF 3 -substituted phenyl radical, naphthyl or a C 1 -C 6 -alkyl-, halo-, nitro-, C 1 -C 6 -alkoxy- or CF 3 -substituted naphthyl radical, R 2 is C 1 -C 8 -alkyl, C 2 -C 8 -alkenyl, cyclohexyl, phenyl or a phenyl-C 1 -C 6 -alkyl radical which may be substituted by a nitro, C 1 -C 6 -alkoxy, methylenedioxy or CF 3 radical, and R 3 is C 1 -C 12 -alkyl, C 2 -C 8 -alkenyl, cyclohexyl, phenyl or a C 1 -C 6 -alkyl-, halo-, nitro-, C 1 -C 6 -alkoxy-, methylenedioxy-, dialkylamino- or CF 3 -substituted phenyl radical, by reacting a compound of the formula II or the salt thereof in which R 1 , R 2 and R 3 have the abovementioned meaning, with urea in the presence of an involatile ammonium salt, wherein the reaction is carried out in the presence of an aprotic polar organic solvent.

公开(公告)号：AU2003229621A8

公开(公告)日：2003-10-20

申请号：AU2003229621

申请日：2003-04-08

Applicant: BASF AG

Inventor： ERNST HANSGEORG ,  KLEIN DANIELA ,  KOPPENHOFER JURGEN

IPC: C07D233/34 ,  C07B53/00 ,  C07B61/00 ,  C07D233/00 ,  C07D233/32

Abstract: The invention relates to a process for preparing chiral imidazolidin-2-ones of the formula I in which R 1 is C 1 -C 8 -alkyl, cyclohexyl, phenyl, a C 1 -C 6 -alkyl-, halo-, nitro-, C 1 -C 6 -alkoxy-, C 1 -C 6 -alkylmercapto- or CF 3 -substituted phenyl radical, naphthyl or a C 1 -C 6 -alkyl-, halo-, nitro-, C 1 -C 6 -alkoxy- or CF 3 -substituted naphthyl radical, R 2 is C 1 -C 8 -alkyl, C 2 -C 8 -alkenyl, cyclohexyl, phenyl or a phenyl-C 1 -C 6 -alkyl radical which may be substituted by a nitro, C 1 -C 6 -alkoxy, methylenedioxy or CF 3 radical, and R 3 is C 1 -C 12 -alkyl, C 2 -C 8 -alkenyl, cyclohexyl, phenyl or a C 1 -C 6 -alkyl-, halo-, nitro-, C 1 -C 6 -alkoxy-, methylenedioxy-, dialkylamino- or CF 3 -substituted phenyl radical, by reacting a compound of the formula II or the salt thereof in which R 1 , R 2 and R 3 have the abovementioned meaning, with urea in the presence of an involatile ammonium salt, wherein the reaction is carried out in the presence of an aprotic polar organic solvent.