公开(公告)号：SG11201810119PA

公开(公告)日：2018-12-28

申请号：SG11201810119P

申请日：2017-05-31

Applicant: BASF SE

Inventor： DAESCHLEIN CHRISTIAN ,  SIEBERT MAX ,  LAUTER MICHAEL ,  LEUNISSEN LEONARDUS ,  GARCIA ROMERO IVAN ,  GUEVENC HACI OSMAN ,  PRZYBYLSKI PETER ,  PROELSS JULIAN ,  KLIPP ANDREAS

IPC: C11D1/72 ,  C11D1/722 ,  C11D3/37 ,  C11D11/00 ,  H01L21/02

Abstract: Described is a post chemical-mechanical-polishing (post-CMP) cleaning composition comprising or consisting of: (A) one or more water-soluble nonionic copolymers of the general formula (I) and mixtures thereof, formula (I) wherein R1 and R3 are idependently from each other hydrogen, methyl, ethyl, n-propyl, isopropyl, n-butyl, iso-Butyl, or sec-butyl, R2 is methyl and x and y are an integer,1 (B)poly(acrylic acid) (PAA) oracrylic acid-maleic acid copolymer with a mass average molar mass (Mw) of up to 10,000 g/mol, and (C)water, wherein the pH of the composition is in the range of from 7.0 to 10.5.