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1.发明专利
公开(公告)号：AU4646189A
公开(公告)日：1990-05-28
申请号：AU4646189
申请日：1989-11-07
Applicant: BREWER SCIENCE INC
Inventor： BREWER TERRY , MOSS MARY , CUZMAR RUTH , HAWLEY DAN , FLAIM TONY
IPC: G03F7/039 , H01L21/312 , H01L23/532 , H01L29/00 , G03C1/60 , G03F7/26
Abstract: Positive working polyamic acid photoresist compositions are disclosed having improved high resolution upon image development and exhibiting stable photosensitivity and superior dielectric performance. The compositions comprise polyamic acid condensation products of an aromatic dianhydride and an aromatic di-primary amine wherein a percentage of the diamine comprises special dissolution inhibiting monomers. The compositions may be further improved by the presence of particular supplemental additives.
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公开(公告)号：DE3856007D1
公开(公告)日：1997-10-02
申请号：DE3856007
申请日：1988-01-12
Applicant: BREWER SCIENCE INC
Inventor： BREWER TERRY , HAWLEY DAN , LAMB JAMES , LATHAM WILLIAM , STICHNOTE LYNN
Abstract: Filters (10, 15) suitable for microelectronic uses and the like may be prepared directly on substrates (250) either as monolithically integrated filters (10) or as hybrid filters (50) using a soluble dye material in a resin (252). The resin (252) may be applied to microelectronic substrates (250) and patterned by conventional microphotolitho-graphic processes.
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公开(公告)号：DE3856007T2
公开(公告)日：1998-02-05
申请号：DE3856007
申请日：1988-01-12
Applicant: BREWER SCIENCE INC
Inventor： BREWER TERRY , HAWLEY DAN , LAMB JAMES , LATHAM WILLIAM , STICHNOTE LYNN
Abstract: Filters (10, 15) suitable for microelectronic uses and the like may be prepared directly on substrates (250) either as monolithically integrated filters (10) or as hybrid filters (50) using a soluble dye material in a resin (252). The resin (252) may be applied to microelectronic substrates (250) and patterned by conventional microphotolitho-graphic processes.
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