公开(公告)号：AU2003217804A8

公开(公告)日：2003-09-09

申请号：AU2003217804

申请日：2003-02-25

Applicant: BREWER SCIENCE INC

Inventor： DAFFRON MARK G ,  SHIH WU-SHENG ,  SNOOK JULIET ANN MINZEY ,  LAMB JAMES E

IPC: G03F7/11 ,  B81C1/00 ,  G03F7/00 ,  G03F7/09 ,  G03F7/095 ,  H01L21/027 ,  H01L21/308 ,  H01L21/3105 ,  H01L21/311 ,  H01L21/3205 ,  H01L21/44

公开(公告)号：AU2003294563A1

公开(公告)日：2004-06-23

申请号：AU2003294563

申请日：2003-12-02

Applicant: BREWER SCIENCE INC

Inventor： PULIGADDA RAMA ,  LAMB JAMES E ,  FLAIM TONY D

IPC: H01L21/312 ,  B05D3/02 ,  B32B17/10 ,  C08F20/26 ,  C08F20/32 ,  C08F220/28 ,  C08G59/32 ,  C08J7/04 ,  C09D163/00 ,  G03F7/09 ,  G03F7/11 ,  H01L20060101 ,  H01L21/027 ,  H01L21/311

Abstract: Anti-reflective compositions and methods of using those compositions with low dielectric constant materials are provided. In one embodiment, the compositions include polymers comprising recurring monomers having unreacted ring members. In another embodiment, the polymers further comprise recurring monomers comprising ring members reacted with a light attenuating compound so as to open the ring. The compositions can be applied to dielectric layers so as to minimize or prevent reflection during the dual damascene process while simultaneously blocking via or photoresist poisoning which commonly occurs when organic anti-reflective coatings are applied to low dielectric constant layers.

公开(公告)号：AU2003294563A8

公开(公告)日：2004-06-23

申请号：AU2003294563

申请日：2003-12-02

Applicant: BREWER SCIENCE INC

Inventor： PULIGADDA RAMA ,  LAMB JAMES E ,  FLAIM TONY D

IPC: H01L21/312 ,  B05D3/02 ,  B32B17/10 ,  C08F20/26 ,  C08F20/32 ,  C08F220/28 ,  C08G59/32 ,  C08J7/04 ,  C09D163/00 ,  G03F7/09 ,  G03F7/11 ,  H01L20060101 ,  H01L21/027 ,  H01L21/311

Abstract: Anti-reflective compositions and methods of using those compositions with low dielectric constant materials are provided. In one embodiment, the compositions include polymers comprising recurring monomers having unreacted ring members. In another embodiment, the polymers further comprise recurring monomers comprising ring members reacted with a light attenuating compound so as to open the ring. The compositions can be applied to dielectric layers so as to minimize or prevent reflection during the dual damascene process while simultaneously blocking via or photoresist poisoning which commonly occurs when organic anti-reflective coatings are applied to low dielectric constant layers.

公开(公告)号：AU2003217896A1

公开(公告)日：2003-09-22

申请号：AU2003217896

申请日：2003-03-04

Applicant: BREWER SCIENCE INC

Inventor： SABNIS RAM ,  LAMB JAMES E

IPC: H01L21/28 ,  B32B3/10 ,  G03C5/00 ,  G03F7/00 ,  G03F7/16 ,  G03F7/40 ,  H01L21/00 ,  H01L21/027 ,  H01L21/312 ,  H01L21/768

公开(公告)号：AU2003217804A1

公开(公告)日：2003-09-09

申请号：AU2003217804

申请日：2003-02-25

Applicant: BREWER SCIENCE INC

Inventor： SNOOK JULIET ANN MINZEY ,  SHIH WU-SHENG ,  LAMB JAMES E ,  DAFFRON MARK G

IPC: G03F7/11 ,  B81C1/00 ,  G03F7/00 ,  G03F7/09 ,  G03F7/095 ,  H01L21/027 ,  H01L21/308 ,  H01L21/3105 ,  H01L21/311 ,  H01L21/3205

公开(公告)号：AT157465T

公开(公告)日：1997-09-15

申请号：AT88901669

申请日：1988-01-12

Applicant: BREWER SCIENCE INC

Inventor： BREWER TERRY L ,  HAWLEY DAN W ,  LAMB JAMES E ,  LATHAM WILLIAM J ,  STICHNOTE LYNN K

IPC: G02B5/20 ,  G03F7/00 ,  G09F9/00 ,  G09F9/30 ,  H01L31/0216 ,  G03F9/00 ,  G03C5/00

Abstract: Filters (10, 15) suitable for microelectronic uses and the like may be prepared directly on substrates (250) either as monolithically integrated filters (10) or as hybrid filters (50) using a soluble dye material in a resin (252). The resin (252) may be applied to microelectronic substrates (250) and patterned by conventional microphotolitho-graphic processes.

公开(公告)号：WO2004051706A3

公开(公告)日：2004-09-02

申请号：PCT/US0338363

申请日：2003-12-02

Applicant: BREWER SCIENCE INC

Inventor： PULIGADDA RAMA ,  LAMB JAMES E ,  FLAIM TONY D

IPC: H01L21/312 ,  B05D3/02 ,  B32B17/10 ,  C08F20/26 ,  C08F20/32 ,  C08F220/28 ,  C08G59/32 ,  C08J7/04 ,  C09D163/00 ,  G03F7/09 ,  G03F7/11 ,  H01L20060101 ,  H01L21/027 ,  H01L21/311

CPC classification number: G03F7/091 ,  C08F220/28 ,  C08G59/3218 ,  C08J7/047 ,  C08J2425/00 ,  C08J2433/00 ,  C08J2471/00 ,  C09D163/00 ,  H01L21/0276 ,  H01L21/31144 ,  C08L2666/16

Abstract: Anti-reflective or fill composition which inhibits or blocks via or photoresist poisoning, a method of coating a substrate and curing it, and a cured protective layer derived therefrom comprises a polymer prepared from a first set of recurring monomers containing a ring member reacted with a light attenuating compound, and a second set of recurring monomers having an unreacted ring member.

Abstract translation: 抑制或阻断通路或光致抗蚀剂中毒的抗反射或填充组合物，涂覆基底并固化的方法以及由其衍生的固化保护层包括由第一组含有环成员的重复单体制备的聚合物， 光减弱化合物和具有未反应的环成员的第二组重复单体。

公开(公告)号：EP1567288A4

公开(公告)日：2006-06-07

申请号：EP03787250

申请日：2003-12-02

Applicant: BREWER SCIENCE INC

Inventor： PULIGADDA RAMA ,  LAMB JAMES E ,  FLAIM TONY D

IPC: H01L21/312 ,  B05D3/02 ,  B32B17/10 ,  C08F20/26 ,  C08F20/32 ,  C08F220/28 ,  C08G59/32 ,  C08J7/04 ,  C09D163/00 ,  G03F7/09 ,  G03F7/11 ,  H01L20060101 ,  H01L21/027 ,  H01L21/311 ,  B05D1/00

CPC classification number: G03F7/091 ,  C08F220/28 ,  C08G59/3218 ,  C08J7/047 ,  C08J2425/00 ,  C08J2433/00 ,  C08J2471/00 ,  C09D163/00 ,  H01L21/0276 ,  H01L21/31144 ,  C08L2666/16

Abstract: Anti-reflective or fill composition which inhibits or blocks via or photoresist poisoning, a method of coating a substrate and curing it, and a cured protective layer derived therefrom comprises a polymer prepared from a first set of recurring monomers containing a ring member reacted with a light attenuating compound, and a second set of recurring monomers having an unreacted ring member.

公开(公告)号：EP0298116A4

公开(公告)日：1990-06-26

申请号：EP88901669

申请日：1988-01-12

Applicant: BREWER SCIENCE INC

Inventor： BREWER TERRY L ,  HAWLEY DAN W ,  LAMB JAMES E ,  LATHAM WILLIAM J ,  STICHNOTE LYNN K

IPC: G02B5/20 ,  G03F7/00 ,  G09F9/00 ,  G09F9/30 ,  H01L31/0216 ,  G03F9/00 ,  G03C5/00

CPC classification number: G03F7/0007 ,  H01L31/02162

Abstract: Filters (10, 15) suitable for microelectronic uses and the like may be prepared directly on substrates (250) either as monolithically integrated filters (10) or as hybrid filters (50) using a soluble dye material in a resin (252). The resin (252) may be applied to microelectronic substrates (250) and patterned by conventional microphotolitho-graphic processes.