公开(公告)号：CA2462347A1

公开(公告)日：2003-04-17

申请号：CA2462347

申请日：2002-10-10

Applicant: BREWER SCIENCE INC

Inventor： SHIH WU-SHENG ,  DAFFRON MARK G ,  LAMB JAMES E III

IPC: B29C33/40 ,  B29C33/38 ,  B29C33/42 ,  B29C33/62 ,  B29C59/02 ,  B29K27/12 ,  B81C1/00 ,  G03F7/00 ,  G11B5/855 ,  H01L21/027 ,  B44B5/00

Abstract: Nonstick molds (16) and method of forming and using such molds are provided. The molds are formed of a nonstick material such as those selected from the group consisting of fluoropolymers, fluorinated siloxane polymers, silicones , and mixtures thereof. The nonstick mold is imprinted with a negative image o f a master mold, where the master mold is designed to have a topography patter n corresponding to that desired surface on the surface of a microelectronic substrate. The nonstick mold (16) is then used to transfer the pattern or image (18) to a flowable film (20) on the substrate (22) surface. This film is subsequently cured or hardened, resulting in the desired pattern (26) ready for further processing.

公开(公告)号：AU2003223582A8

公开(公告)日：2003-10-27

申请号：AU2003223582

申请日：2003-04-11

Applicant: BREWER SCIENCE INC

Inventor： SHIH WU-SHENG ,  SABNIS RAM W

IPC: C23C14/12 ,  G02B1/11 ,  G03F7/09 ,  H01L21/027 ,  G03F7/30

Abstract: An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The most preferred starting monomers are 4-fluorostyrene, 2,3,4,5,6-pentafluorostyrene, and allylpentafluorobenzene. The PECVD processes comprise subjecting the monomers to sufficient electric current and pressure so as to cause the monomers to sublime to form a vapor which is then changed to the plasma state by application of an electric current. The vaporized monomers are subsequently polymerized onto a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 mum or smaller) features. The process provides a much faster deposition rate than conventional chemical vapor deposition (CVD) methods, is environmentally friendly, and is economical.

公开(公告)号：AU2003217804A8

公开(公告)日：2003-09-09

申请号：AU2003217804

申请日：2003-02-25

Applicant: BREWER SCIENCE INC

Inventor： DAFFRON MARK G ,  SHIH WU-SHENG ,  SNOOK JULIET ANN MINZEY ,  LAMB JAMES E

IPC: G03F7/11 ,  B81C1/00 ,  G03F7/00 ,  G03F7/09 ,  G03F7/095 ,  H01L21/027 ,  H01L21/308 ,  H01L21/3105 ,  H01L21/311 ,  H01L21/3205 ,  H01L21/44

公开(公告)号：DE60334980D1

公开(公告)日：2010-12-30

申请号：DE60334980

申请日：2003-04-11

Applicant: BREWER SCIENCE INC

Inventor： SABNIS RAM W ,  SHIH WU-SHENG

IPC: G03F7/30

公开(公告)号：CA2462613A1

公开(公告)日：2003-05-08

申请号：CA2462613

申请日：2002-10-29

Applicant: BREWER SCIENCE INC

Inventor： SHIH WU-SHENG ,  LAMB JAMES E III

IPC: H05K3/22 ,  B81C1/00 ,  C08G59/68 ,  C08L63/00 ,  H01L21/027 ,  H01L21/3105 ,  H01L21/312 ,  H01L21/4763

Abstract: The present invention is directed towards planarization materials that produ ce little or no volatile byproducts during the hardening process when used in contact planarization process. The materials can be hardened by photo- orradiation or by heat during the planirization process, and they include on e or more types of monomers, oligomers, or mixtures thereof, an optional cross - linker, and an optional organic reactive solvents. The solvent, if used, is chemically reacted with the monomers or oligomers and thus becomes part of t he polymer matrix during the curing process. These materials can be used for damascene, dual damascene, bi-layer, and multi-layer applications, microelectromechanical system (MEMS), packaging, optical devices, photonics, optoelectronics, microelectronics, and sensor devices fabrication.

公开(公告)号：AT488784T

公开(公告)日：2010-12-15

申请号：AT03719720

申请日：2003-04-11

Applicant: BREWER SCIENCE INC

Inventor： SABNIS RAM ,  SHIH WU-SHENG

IPC: G03F7/30

公开(公告)号：AU2003223582A1

公开(公告)日：2003-10-27

申请号：AU2003223582

申请日：2003-04-11

Applicant: BREWER SCIENCE INC

Inventor： SABNIS RAM W ,  SHIH WU-SHENG

IPC: C23C14/12 ,  G02B1/11 ,  G03F7/09 ,  H01L21/027

Abstract: An improved method for applying polymeric antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise plasma enhanced chemical vapor depositing (PECVD) a polymer on the substrate surfaces. The most preferred starting monomers are 4-fluorostyrene, 2,3,4,5,6-pentafluorostyrene, and allylpentafluorobenzene. The PECVD processes comprise subjecting the monomers to sufficient electric current and pressure so as to cause the monomers to sublime to form a vapor which is then changed to the plasma state by application of an electric current. The vaporized monomers are subsequently polymerized onto a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large surface substrates having super submicron (0.25 mum or smaller) features. The process provides a much faster deposition rate than conventional chemical vapor deposition (CVD) methods, is environmentally friendly, and is economical.

公开(公告)号：AU2003217804A1

公开(公告)日：2003-09-09

申请号：AU2003217804

申请日：2003-02-25

Applicant: BREWER SCIENCE INC

Inventor： SNOOK JULIET ANN MINZEY ,  SHIH WU-SHENG ,  LAMB JAMES E ,  DAFFRON MARK G

IPC: G03F7/11 ,  B81C1/00 ,  G03F7/00 ,  G03F7/09 ,  G03F7/095 ,  H01L21/027 ,  H01L21/308 ,  H01L21/3105 ,  H01L21/311 ,  H01L21/3205

公开(公告)号：AU2002347880A1

公开(公告)日：2003-04-22

申请号：AU2002347880

申请日：2002-10-10

Applicant: BREWER SCIENCE INC

Inventor： LAMB JAMES E III ,  SHIH WU-SHENG ,  DAFFRON MARK

IPC: B29C33/40 ,  B29C33/38 ,  B29C33/42 ,  B29C33/62 ,  B29C59/02 ,  B29K27/12 ,  B81C1/00 ,  G03F7/00 ,  G11B5/855 ,  H01L21/027 ,  B44B5/00

Abstract: Novel nonstick molds and methods of forming and using such molds are provided. The molds are formed of a nonstick material such as those selected from the group consisting of fluoropolymers, fluorinated siloxane polymers, silicones, and mixtures thereof. The nonstick mold is imprinted with a negative image of a master mold, where the master mold is designed to have a topography pattern corresponding to that desired on the surface of a microelectronic substrate. The nonstick mold is then used to transfer the pattern or image to a flowable film on the substrate surface. This film is subsequently cured or hardened, resulting in the desired pattern ready for further processing.

公开(公告)号：WO03031096A3

公开(公告)日：2003-07-03

申请号：PCT/US0232655

申请日：2002-10-10

Applicant: BREWER SCIENCE INC

Inventor： SHIH WU-SHENG ,  LAMB JAMES E III ,  DAFFRON MARK

IPC: B29C33/40 ,  B29C33/38 ,  B29C33/42 ,  B29C33/62 ,  B29C59/02 ,  B29K27/12 ,  B81C1/00 ,  G03F7/00 ,  G11B5/855 ,  H01L21/027 ,  B44B5/00

CPC classification number: B82Y10/00 ,  B29C33/3857 ,  B29C33/62 ,  B81C99/009 ,  B81C2201/034 ,  B82Y40/00 ,  G03F7/0002

Abstract: Nonstick molds (16) and method of forming and using such molds are provided. The molds are formed of a nonstick material such as those selected from the group consisting of fluoropolymers, fluorinated siloxane polymers, silicones, and mixtures thereof. The nonstick mold is imprinted with a negative image of a master mold, where the master mold is designed to have a topography pattern corresponding to that desired surface on the surface of a microelectronic substrate. The nonstick mold (16) is then used to transfer the pattern or image (18) to a flowable film (20) on the substrate (22) surface. This film is subsequently cured or hardened, resulting in the desired pattern (26) ready for further processing.

Abstract translation: 提供了不粘模具（16）以及成型和使用这种模具的方法。 模具由不粘材料形成，例如选自含氟聚合物，氟化硅氧烷聚合物，聚硅氧烷及其混合物的那些材料。 不粘模具印有母模的负像，其中母模被设计成具有对应于微电子衬底表面上的所需表面的形貌图案。 然后使用不粘模具（16）将图案或图像（18）转印到基材（22）表面上的可流动膜（20）。 随后将该膜固化或硬化，导致所需图案（26）准备好进一步处理。