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    Duv optical elements
    2.
    发明专利
    Duv optical elements 有权
    DUV光学元件

    公开(公告)号：JP2013257571A

    公开(公告)日：2013-12-26

    申请号：JP2013143334

    申请日：2013-07-09

    Applicant: Corning Inc ,  コーニング インコーポレイテッド

    Inventor： MICHEAL J CANGEMI ,  JIEN WEI FON ,  CINDY J HAYDEN ,  SABIA ROBERT ,  SCHREIBER HORST ,  WANG JUE

    IPC: G02B1/02 ,  B08B3/12 ,  B08B7/00 ,  G02B1/10

    CPC classification number: B08B3/12 ,  B08B7/0035 ,  B08B7/028 ,  B08B2203/005 ,  G02B1/02 ,  G02B1/105 ,  G02B1/14

    Abstract: PROBLEM TO BE SOLVED: To provide a method of preparing an optical material with improved durability to withstand excimer lasers.SOLUTION: The invention is directed to a method for cleaning surfaces of an optical element made of a single crystal metal fluoride of chemical formula MF, where M is calcium, barium, magnesium, strontium or mixtures thereof, prior to a process of coating the elements with films of protective materials. The method has at least the steps of: (a) immersing the optical element of the single crystal MFin at least one selected liquid, utilizing sonication at megasonic frequencies to remove particulates, and polishing slurry residue and the damaged top layer of the optical element; (b) cleaning in a gas phase cleaning process to remove hydrocarbons from the surface of the optical element using UV/ozone cleaning; and (c) exposing, in a gas phase process, of the surface of the optical element to low-energy plasma containing argon and oxygen in a vacuum environment.

    Abstract translation: 要解决的问题：提供一种制备具有耐受准分子激光器的耐久性的光学材料的方法。解决方案：本发明涉及一种清洁由化学式MF的单晶金属氟化物制成的光学元件的表面的方法， 在用保护材料的膜涂覆元件之前，其中M是钙，钡，镁，锶或其混合物。 该方法至少具有以下步骤：（a）使用超声波以超声波频率将单晶MFin的光学元件浸入至少一种选定的液体中以除去微粒，并抛光浆料残留物和损伤的光学元件的顶层; （b）使用UV /臭氧清洗在气相清洗过程中清洗从光学元件的表面除去碳氢化合物; 和（c）在气相工艺中，在真空环境中将光学元件的表面暴露于含有氩和氧的低能量等离子体。

    GLAZING ABRASIVE FOR COLLOIDAL SILLICA
    3.
    发明专利
    GLAZING ABRASIVE FOR COLLOIDAL SILLICA 失效

    公开(公告)号：JP2001085371A

    公开(公告)日：2001-03-30

    申请号：JP2000228832

    申请日：2000-07-28

    Applicant: CORNING INC

    Inventor： SABIA ROBERT ,  STEVENS HARRIE JAMES

    IPC: B24B37/00 ,  C03C19/00 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304

    Abstract: PROBLEM TO BE SOLVED: To accelerate removing speed by reducing damages on a surface to be polished, in a method for finish polishing a silica substrate. SOLUTION: A method for finish polishing a silica substrate comprises a step of providing the substrate, a step of first polishing the surface of the substrate to a range of surface roughness Ra to 6 to 10 Å by using an aqueous solution containing at least one type of metal oxide abrasive, and a step of further grinding the surface of the substrate to the roughness Ra to about 5 Åor less, by using the aqueous solution containing a colloidal silica soot having a mean particle size of 50 to 500 nm.

    Colloidal silica finishing of metal fluoride optical components
    4.
    发明专利
    Colloidal silica finishing of metal fluoride optical components 审中-公开
    金属氟化物光学组件的胶体二氧化硅修饰

    公开(公告)号：JP2014102507A

    公开(公告)日：2014-06-05

    申请号：JP2013256893

    申请日：2013-12-12

    Applicant: Corning Inc ,  コーニング インコーポレイテッド

    Inventor： FENG JIANGWEI ,  PHUNG MAI ,  SABIA ROBERT

    IPC: G02B1/02 ,  C30B29/12

    CPC classification number: B24B13/00 ,  G02B1/02 ,  G02B27/0006 ,  Y10T428/268

    Abstract: PROBLEM TO BE SOLVED: To provide an optical component that eliminates a degradation problem or greatly enhances the durability to extend the period of service.SOLUTION: An alkaline earth metal fluoride single crystal optic comprises a single crystal optic made of an alkaline earth metal fluoride selected from the group consisting of MgF, CaF, BaFand SrF, and mixtures thereof. The optic has a polished but unetched surface roughness of less than 0.5 nm rms and a polished and etched surface roughness of less than 0.5 nm rms, where the polished but unetched surface is substantially free of a precipitated Bielby layer.

    Abstract translation: 要解决的问题：提供消除劣化问题的光学部件或大大提高耐久性以延长使用寿命。解决方案：碱土金属氟化物单晶光学器件包括由选择的碱土金属氟化物制成的单晶光学器件 由MgF，CaF，BaF和SrF组成的组及其混合物。 光学元件具有小于0.5nm均方根的抛光但未蚀刻的表面粗糙度以及小于0.5nm均方根的抛光和蚀刻表面粗糙度，其中抛光但未蚀刻的表面基本上不含沉淀的Bielby层。

    Method of manufacturing silica and titania extreme ultraviolet ray optical element
    5.
    发明专利
    Method of manufacturing silica and titania extreme ultraviolet ray optical element 审中-公开
    制造二氧化硅和钛金刚石超紫外线光学元件的方法

    公开(公告)号：JP2004131373A

    公开(公告)日：2004-04-30

    申请号：JP2003311023

    申请日：2003-09-03

    Applicant: Corning Inc ,  コーニング・インコーポレーテッド

    Inventor： HRDINA KENNETH E ,  SABIA ROBERT

    IPC: G02B1/00 ,  C03B8/02 ,  C03B19/10 ,  C03B19/12 ,  C03B20/00 ,  C03C3/06

    CPC classification number: C03C3/06 ,  C03B19/106 ,  C03B19/12 ,  C03B2201/42

    Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing an ultra-low thermal expansion extreme ultraviolet ray element formed from glass containing silica and titania. SOLUTION: The ultra-low thermal expansion extreme ultraviolet ray element is manufactured by a step for providing water-soluble sol containing a silica powder containing titania, a step for forming gel-like silica body containing titania from the sol, in which titania is uniformly distributed, a step for obtaining a dry silica body containing titania by drying the gel, and a step for forming a glass material by heating the dry silica body containing titania to a sufficient temperature. COPYRIGHT: (C)2004,JPO

    Abstract translation: 解决的问题：提供一种由含有二氧化硅和二氧化钛的玻璃制成的超低热膨胀极紫外线元件的制造方法。 解决方案：超低热膨胀极紫外线元件是通过提供含有二氧化钛的二氧化硅粉末的水溶性溶胶的步骤制造的，用于从溶胶中形成含有二氧化钛的凝胶状二氧化硅体的步骤，其中 二氧化钛均匀分布，通过干燥凝胶获得含有二氧化钛的干燥二氧化硅体的步骤，以及通过将含有二氧化钛的干燥二氧化硅体加热到足够的温度来形成玻璃材料的步骤。 版权所有（C）2004，JPO

    POLISHING OF MOLTEN SILICA USING COLLOID
    6.
    发明专利
    POLISHING OF MOLTEN SILICA USING COLLOID 失效

    公开(公告)号：JP2001077065A

    公开(公告)日：2001-03-23

    申请号：JP2000228833

    申请日：2000-07-28

    Applicant: CORNING INC

    Inventor： DARCANGELO CHARLES M ,  SABIA ROBERT ,  STEVENS HARRIE JAMES

    IPC: B24B37/00 ,  C09K3/14 ,  H01L21/302 ,  H01L21/304

    Abstract: PROBLEM TO BE SOLVED: To make smooth the surface of a silica substrate in a method to finally polish the silica substrate. SOLUTION: The method to finally polish a silica substrate comprises a process to provide the silica substrate, a process wherein first the surface of the substrate is polished using an aqueous solution containing at least one kind of a metallic oxide polishing agent and the surface roughness Ra of the substrate is set in the range of about 6 to 10 Å, and moreover, a process wherein the surface of the substrate is polished using an alkailne aqueous solution containing a colloidal silica of a particle diameter of 500 nm or shorter to set the surface roughness Ra in the range of 5 Å or shorter.

    Colloidal silica finishing for metal fluoride optical component
    7.
    发明专利
    Colloidal silica finishing for metal fluoride optical component 有权
    金属氟化物光学部件的胶体二氧化硅涂层

    公开(公告)号：JP2010089251A

    公开(公告)日：2010-04-22

    申请号：JP2009196686

    申请日：2009-08-27

    Applicant: Corning Inc ,  コーニング インコーポレイテッド

    Inventor： FENG JIANGWEI ,  PHUNG MAI ,  SABIA ROBERT

    IPC: B24B37/00 ,  B08B3/08 ,  B08B3/12 ,  G02B1/02 ,  G02B3/00

    CPC classification number: B24B13/00 ,  G02B1/02 ,  G02B27/0006 ,  Y10T428/268

    Abstract: PROBLEM TO BE SOLVED: To considerably improve durability of an optical component so as to solve a deterioration problem of an optical component or to extend its use period. SOLUTION: A finishing method for an optical component made of alkaline earth metal fluoride and the optical component made of alkaline earth manufactured by using the finishing method are provided. The finishing method used for the last polishing process uses polishing slurry made of colloidal silica including silica particles with a particle size of 500 nm or below in particular. Further, this finishing method can remove the whole silica residue on the polished optical component by using a megasonic cleaning process using a high PH-detergent cleaning solution after colloidal silica polishing. Surface roughness of the optical component polished by using the finishing method but is not etched yet is less than 0.5 nm, the surface roughness after polishing and etching is less than 0.6 nm, and step height of the surface roughness is less than 6 nm. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：为了显着提高光学部件的耐久性，以解决光学部件的劣化问题或延长其使用周期。 解决方案：提供了一种由碱土金属氟化物制成的光学部件的精加工方法和通过使用精加工方法制造的由碱土制成的光学部件。 用于最后抛光工艺的精加工方法使用由胶体二氧化硅制成的抛光浆料，其特别包括粒度为500nm以下的二氧化硅颗粒。 此外，这种整理方法可以通过使用在胶体二氧化硅抛光后使用高PH洗涤剂清洁溶液的超声波清洗方法来除去抛光的光学部件上的全部二氧化硅残留物。 使用精加工方法抛光但未被蚀刻的光学部件的表面粗糙度小于0.5nm，抛光和蚀刻后的表面粗糙度小于0.6nm，表面粗糙度的台阶高度小于6nm。 版权所有（C）2010，JPO＆INPIT

    Low expansion coefficient glass with reduced striae and element, and their manufacturing method
    9.
    发明专利
    Low expansion coefficient glass with reduced striae and element, and their manufacturing method 有权
    具有减少结构和元素的低膨胀系数玻璃及其制造方法

    公开(公告)号：JP2007186412A

    公开(公告)日：2007-07-26

    申请号：JP2006344018

    申请日：2006-12-21

    Applicant: Corning Inc ,  コーニング インコーポレイテッド

    Inventor： BEALL LORRIE F ,  MAXON JOHN E ,  ROSCH WILLIAM R ,  SABIA ROBERT

    IPC: C03B20/00 ,  C03B8/04 ,  C03C3/06 ,  G03F7/20 ,  H01L21/027

    CPC classification number: C03B19/1453 ,  C03B2201/42 ,  C03C3/06

    Abstract: PROBLEM TO BE SOLVED: To provide ultra-low expansion coefficient silica/titania glass having reduced striae. SOLUTION: In this method, glass is heat-treated at a temperature over 1,600°C for 72-288 hours. In an example of this method, glass is heat-treated without flowing nor moving. By this method, the size of the striae in the ultra-low expansion coefficient glass is reduced by 500%, especially the striae at a high frequency can be reduced for the most part. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供具有减少条纹的超低膨胀系数二氧化硅/二氧化钛玻璃。

    解决方案：在该方法中，将玻璃在1600℃以上的温度下热处理72-288小时。 在该方法的实例中，玻璃被热处理而不流动或移动。 通过这种方法，超低膨胀系数玻璃中的条纹的尺寸减少了500％，特别是大部分可以降低高频条纹。 版权所有（C）2007，JPO＆INPIT

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