POLISHING OF MOLTEN SILICA USING COLLOID

    公开(公告)号:JP2001077065A

    公开(公告)日:2001-03-23

    申请号:JP2000228833

    申请日:2000-07-28

    Applicant: CORNING INC

    Abstract: PROBLEM TO BE SOLVED: To make smooth the surface of a silica substrate in a method to finally polish the silica substrate. SOLUTION: The method to finally polish a silica substrate comprises a process to provide the silica substrate, a process wherein first the surface of the substrate is polished using an aqueous solution containing at least one kind of a metallic oxide polishing agent and the surface roughness Ra of the substrate is set in the range of about 6 to 10 Å, and moreover, a process wherein the surface of the substrate is polished using an alkailne aqueous solution containing a colloidal silica of a particle diameter of 500 nm or shorter to set the surface roughness Ra in the range of 5 Å or shorter.

    METHOD AND APPARATUS FOR FINISHING A GLASS SHEET
    7.
    发明申请
    METHOD AND APPARATUS FOR FINISHING A GLASS SHEET 审中-公开
    用于装饰玻璃板的方法和设备

    公开(公告)号:WO2007078575A3

    公开(公告)日:2007-12-13

    申请号:PCT/US2006046813

    申请日:2006-12-07

    CPC classification number: B24B9/10 B24B41/06

    Abstract: An apparatus for finishing a glass sheet comprising a pair of fluid bearings having bearing surfaces in opposing relation, the bearing surfaces spaced apart to define a channel for receiving the glass sheet, each bearing surface having a plurality of pores through which jets are introduced into the channel, the pores positioned on the bearing surface such that the jets produce a uniform fluid pressure across the bearing surface.

    Abstract translation: 一种精加工玻璃板的设备,包括一对具有相对关系的支承表面的流体轴承,支承表面间隔开以限定用于接收玻璃板的通道,每个支承表面具有多个孔,通过孔将射流引入 通道,定位在支承表面上的孔使得射流在支承表面上产生均匀的流体压力。

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