Abstract:
THE NOVEL COMPOUNDS BIS-(P-AZIDOPHENYL) ARSENIC ACID AND P-ARSENO (P-AZIDOBENZYLIDENE) ANILINE HAVE BEEN PREPARED AND FOUND USEFUL AS NEGATIVE PHOTOREISTS WHICH LEAVE METALLIC ARSENIC DEPOSITED ON THE SUBSTRATE AFTER DEVELOPMENT.
Abstract:
Conjugated nitro amines having the formula:
WHEREIN X IS N=N, N=CH, CH=CH-CH=N, or CH=CH, y is CH=CH, CH=N, N=CH-CH=CH, or NH and N IS 0, 1 OR 2 HAVE BEEN PREPARED AND FOUND USEFUL AS DICHROIC PHOTOCONDUCTORS.
Abstract:
LIGHT SENSITIVE PHOTORESIST COMPOSITIONS PARTICULARLY USEFUL FOR PROJECTION EXPOSURE APPLICATIONS INCLUDE A PHOTOCROSSLINKABLE POLYMER AND NOVEL SENSITIZERS WHICH ARE BISP-AZIDO CINNAMYLIDENE DERIVATIVES OF CYCLIC AND LINEAR KETONES.
Abstract:
The light sensitivity and adhesion of photoresist compositions is improved by incorporating in them a sensitizer which is cyanine dye, said dye having at least one azido group substituted on an aromatic ring.
Abstract:
ANTHRAQUINONES HAVING AT THE 2 AND THE 6 POSITIONS SUBSTITUENTS SELECTED FROM THE GROUP CONSISTING OF
R-N(-R)-(1,4-PHENYLENE)-CH=N- AND
R-N(-R)-(1,4-PHENYLENE-CH=CH=N-
WHEREIN R IS LOWER ALKYL. THE COMPOUNDS ARE USEFUL AS DICHROIC PHOTOCONDUCTORS AND AS PHOTOSENSITIZERS FOR PHOTOCONDUCTIVE POLYMERS SUCH AS POLYVINYLCARBAZOLE.