公开(公告)号：EP1497699A4

公开(公告)日：2008-07-09

申请号：EP03716998

申请日：2003-04-07

Applicant: IBM

Inventor： ANGELOPOULOS MARIE ,  BABICH KATHERINA ,  CHEY S JAY ,  HIBBS MICHAEL STRAIGHT ,  LANG ROBERT N ,  MAHOROWALA ARPAN PRAVIN ,  RACETTE KENNETH CHRISTOPHER

IPC: G03F1/32 ,  C23C14/06 ,  C23C14/08 ,  H01L21/027 ,  G03F9/00 ,  C23C14/00 ,  C23C14/32 ,  G03C5/00 ,  G03F1/08

CPC classification number: G03F1/32 ,  C23C14/0676 ,  C23C14/08

Abstract: An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen and oxygen. An etch stop layer is added to improve the etch selectivity of the phase shifting layer. A wide range of optical transmission (0.001 % up to 15 % at 157 nm) is obtained by this process.

公开(公告)号：WO02069037A2

公开(公告)日：2002-09-06

申请号：PCT/GB0200450

申请日：2002-02-01

Applicant: IBM ,  IBM UK

Inventor： ANGELOPOULOS MARIE ,  BABICH KATHERINA ,  BROOKS CAMERON JAMES ,  CHEY JAY ,  GUARNIERI RICHARD ,  HIBBS MICHAEL STRAIGHT ,  RACETTE KENNETH CHRISTOPHER

IPC: G03F1/32 ,  C23C14/06 ,  C23C14/35 ,  G03F7/16 ,  G03F1/00 ,  G03F1/08

CPC classification number: G03F1/32 ,  C23C14/0641 ,  C23C14/0676 ,  C23C14/352 ,  G03F7/16 ,  Y10T428/265

Abstract: An attenuating embedded phase shift photomask blank that produce s a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen or metal, silicon, nitrogen and oxygen. A wide range of optical transmission (0.001 % up to 20 % at 193 nm) is obtained by this process. A post deposition process is implemented to obtain the desired properties (stability of optical properties with respect to laser irradiation and acid treatment) for use in industry. A special fabrication process for the sputter target is implemented to lower the defects of the film.

Abstract translation: 使用由金属，硅，氮或金属，硅，氮和氧制成的光学半透明的膜形成产生透射光的相移的衰减的嵌入式相移光掩模坯料。 通过该方法获得宽范围的光学透射（0.001nm至高达193nm的20％）。 实现后沉积工艺以获得用于工业中的所需性能（相对于激光照射和酸处理的光学性质的稳定性）。 实现用于溅射靶的特殊制造工艺以降低膜的缺陷。

公开(公告)号：JP2007226224A

公开(公告)日：2007-09-06

申请号：JP2007036142

申请日：2007-02-16

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： TIMOTHY ARAN BRANNER ,  HIBBS MICHAEL STRAIGHT

IPC: G03F1/08 ,  G01J9/00

CPC classification number: G03F1/84 ,  G03F1/32

Abstract: PROBLEM TO BE SOLVED: To provide a phase metrology pattern for an attenuating phase mask. SOLUTION: The phase error of this pattern can be determined to high accuracy by aerial image measurements. This pattern can be used to create an optical phase standard for calibrating phase metrology equipment for attenuated phase masks or as a witness pattern on a product mask, to verify the phase accuracy of that mask. The pattern includes an effective line to space ratio and can be tested, by using a microscope or a stepper system, or can be measured directly using a detector for the zeroth-order diffraction measurement. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供衰减相位掩模的相位计量模式。

解决方案：通过空间图像测量，可以将该图案的相位误差确定为高精度。 该模式可用于创建光学相位标准，用于校准衰减相位掩模的相位计量设备或产品掩模上的见证图案，以验证该掩模的相位精度。 该图案包括有效的线间距比，并且可以通过使用显微镜或步进系统进行测试，或者可以使用用于零阶衍射测量的检测器直接测量。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2004046177A

公开(公告)日：2004-02-12

申请号：JP2003183500

申请日：2003-06-26

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： HIBBS MICHAEL STRAIGHT

IPC: G03F1/62 ,  G03F1/84 ,  H01L21/027 ,  G03F1/14

CPC classification number: G03F1/84 ,  G03F1/62

Abstract: PROBLEM TO BE SOLVED: To provide a mask structure and method in which deterioration of a pellicle is quantitatively measured, in the manufacture of a photomask, by measuring superposition in the test structure on the mask.
SOLUTION: The structure is situated in a high transmission region in which the structure is close to a transition region between a low and high transmission regions of the mask such that deterioration of the pellicle affects the print of an object. A second structure is situated in a low transmission region so that the print of the second structure is superposed on the first structure, and gives a yardstick of the deterioration of the pellicle.
COPYRIGHT: (C)2004,JPO

Abstract translation: 要解决的问题：为了提供掩模结构和方法，其中通过测量掩模上的测试结构中的叠加来定量测量防护薄膜的劣化，在光掩模的制造中。 解决方案：结构位于高透射区域，其中结构接近掩模的低透射区域和高透射区域之间的过渡区域，使得防护薄膜的劣化影响物体的印刷。 第二结构位于低透射区域中，使得第二结构的印刷物重叠在第一结构上，并给出防护薄膜的劣化的标准。 版权所有（C）2004，JPO