公开(公告)号：EP1497699A4

公开(公告)日：2008-07-09

申请号：EP03716998

申请日：2003-04-07

Applicant: IBM

Inventor： ANGELOPOULOS MARIE ,  BABICH KATHERINA ,  CHEY S JAY ,  HIBBS MICHAEL STRAIGHT ,  LANG ROBERT N ,  MAHOROWALA ARPAN PRAVIN ,  RACETTE KENNETH CHRISTOPHER

IPC: G03F1/32 ,  C23C14/06 ,  C23C14/08 ,  H01L21/027 ,  G03F9/00 ,  C23C14/00 ,  C23C14/32 ,  G03C5/00 ,  G03F1/08

CPC classification number: G03F1/32 ,  C23C14/0676 ,  C23C14/08

Abstract: An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen and oxygen. An etch stop layer is added to improve the etch selectivity of the phase shifting layer. A wide range of optical transmission (0.001 % up to 15 % at 157 nm) is obtained by this process.