公开(公告)号：EP1497699A4

公开(公告)日：2008-07-09

申请号：EP03716998

申请日：2003-04-07

Applicant: IBM

Inventor： ANGELOPOULOS MARIE ,  BABICH KATHERINA ,  CHEY S JAY ,  HIBBS MICHAEL STRAIGHT ,  LANG ROBERT N ,  MAHOROWALA ARPAN PRAVIN ,  RACETTE KENNETH CHRISTOPHER

IPC: G03F1/32 ,  C23C14/06 ,  C23C14/08 ,  H01L21/027 ,  G03F9/00 ,  C23C14/00 ,  C23C14/32 ,  G03C5/00 ,  G03F1/08

CPC classification number: G03F1/32 ,  C23C14/0676 ,  C23C14/08

Abstract: An attenuating embedded phase shift photomask blank that produces a phase shift of the transmitted light is formed with an optically translucent film made of metal, silicon, nitrogen and oxygen. An etch stop layer is added to improve the etch selectivity of the phase shifting layer. A wide range of optical transmission (0.001 % up to 15 % at 157 nm) is obtained by this process.

公开(公告)号：JP2007219545A

公开(公告)日：2007-08-30

申请号：JP2007116438

申请日：2007-04-26

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： HUANG WU-SONG ,  LI WENJIE ,  MOREAU WAYNE ,  MEDEIROS DAVID E ,  PETRILLO KAREN E ,  LANG ROBERT N ,  ANGELOPOULOS MARIE

IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a resist composition comprising an acid-sensitive imaging polymer and a radiation-sensitive acid generator component.
SOLUTION: The resist composition contains (i) a first radiation-sensitive acid generator selected from the group consisting of dissolution inhibiting acid generators and (ii) a second radiation-sensitive acid generator selected from the group consisting of unprotected acidic group-functionalized acid generators and acid labile group protected acidic group-functionalized radiation-sensitive acid generators, and enables formation of a highly sensitive resist suitable for use in EPL or EUV, soft X-ray and another low energy intensity lithographic imaging applications. The resist composition is useful in other lithography processes as well.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供包含酸敏感成像聚合物和辐射敏感酸产生剂组分的抗蚀剂组合物。 抗蚀剂组合物包含（i）选自溶解抑制酸发生剂的第一辐射敏感性酸产生剂和（ii）选自下组的第二辐射敏感性酸产生剂：未保护的酸性基团 - 官能化酸产生剂和酸不稳定基团保护的酸性官能化辐射敏感酸发生剂，并且能够形成适用于EPL或EUV，软X射线和另一种低能量光刻成像应用的高灵敏度抗蚀剂。 抗蚀剂组合物也用于其它光刻工艺。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：CA2090039A1

公开(公告)日：1992-03-19

申请号：CA2090039

申请日：1990-12-21

Applicant: IBM

Inventor： CONLEY WILLARD E ,  KWONG RANEE W ,  KVITEK RICHARD J ,  LANG ROBERT N ,  LYONS CHRISTOPHER F ,  MIURA STEVE S ,  MOREAU WAYNE M ,  SACHDEV HARBANS S ,  WOOD ROBERT L

IPC: G03F7/039 ,  G03F7/09 ,  G03F7/11 ,  H01L21/027 ,  G03F7/16

Abstract: 2090039 9205474 PCTABS00011 A protective material for use as an overcoating film for acid catalyzed resist compositions comprising a polymeric film forming compound, the films of which are impermeable to vapors of organic and inorganic bases.