SUBMICRON CIRCUIT STRUCTURES AND METHODS OF FORMATION

    公开(公告)号:CA1204882A

    公开(公告)日:1986-05-20

    申请号:CA412957

    申请日:1982-10-06

    Applicant: IBM

    Abstract: SUBMICRON CIRCUIT STRUCTURES AND METHOD OF FORMATION Double sided lithography is disclosed for fabricating ultra-small multilayer microcircuit structures without need for any intermediate realignment and without need for any intermediate layer deposition involving reestablishment of surface planarity. Microcircuit patterns are defined on opposite sides of a thin substrate by an exposure tool without intermediate removal of the substrate from the exposure tool, the microcircuit pattern on one side being defined by incident patterning radiation and the microcircuit pattern on the other side being defined by patterning radiation which has passed through the thin substrate.

    DEVICES USING HIGH T -SUPERCONDUCTORS AND METHOD FOR MAKING THE SAME

    公开(公告)号:CA1312147C

    公开(公告)日:1992-12-29

    申请号:CA563566

    申请日:1988-04-07

    Applicant: IBM

    Abstract: YO987-028 DEVICES USING HIGH Tc SUPERCONDUCTORS AND METHOD FOR MAKING THE SAME A superconducting device operable at temperatures in excess of 30.degree.K and a method for making the device are described. A representative device is an essentially coplanar SQUID device formed in a single layer of high Tc superconducting material, the SQUID device being operable at temperatures in excess of 60.degree.K. High energy beams, for example ion beams, are used to convert selected portions of the high Tc superconductor to nonsuperconducting properties so that the material now has both superconducting regions and nonsuperconducting regions. In this manner a superconducting loop having superconducting weak links can be formed to comprise the SQUID device.

    SELF-HEALING ELECTRODE FOR UNIFORM NEGATIVE CORONA

    公开(公告)号:CA1087241A

    公开(公告)日:1980-10-07

    申请号:CA185521

    申请日:1973-11-09

    Applicant: IBM

    Abstract: SELF-HEALING ELECTRODE FOR UNIFORM NEGATIVE CORONA The present invention relates to electrodes used for charging electrophotographic image surfaces in copying machines. More particularly, the disclosure is directed to the negative corona discharge electrodes which produce a negative charge that is applied to the photoconductive surface exposed to the corona discharge. In the present invention, the electrode structure includes a combination of a wire of valve metal with a high resistivity coating spread uniformly over the surface of the wire. The valve metal, one example being tantalum, may serve as the electrode wire itself or may surround an inner wire such as stainless steel. By providing an electrode for corona discharge having a uniform high resistive coating, the plasma glow produced will spread uniformly along the length of the wire. By using a valve metal, which form a hard oxide under the high resistivity coating, the electrode is self-healing in that if cracks or imperfections occur in the coating, the exposed valve metal will oxidize and fill in the cracks and imperfections.

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