公开(公告)号：DE3162439D1

公开(公告)日：1984-04-05

申请号：DE3162439

申请日：1981-09-23

Applicant: IBM

Inventor： LANGNER GUENTHER OTTO ,  PFEIFFER HANS CHRISTIAN ,  STURANS MARIS ANDRIS

IPC: H01J37/141 ,  H01J37/147 ,  H01J37/153 ,  H01J37/30 ,  H01J37/317 ,  H01J29/00

Abstract: The electron beam projection system includes means for producing an electron beam, means (43, 45) for deflecting the beam (39), a magnetic projection lens (33) having rotational symmetry for focusing the deflected beam and a pair of magnetic compensation yokes (55, 57) positioned within the bore of the projection lens means (33). The pair of compensation yokes (55, 57) has coil dimensions such that, in combination, they produce a magnetic compensation field proportional to the first derivative of the axial magnetic field strength distribution curve of the projection lens (33). Upon application of current to the pair of compensation yokes (55, 57) the electron optical axis of the projection lens (33) shifts to the position of the deflected beam so that the electron beam (39) remains coincident with the shifted electron optical axis and lands perpendicular to a target (59).

公开(公告)号：DE3269891D1

公开(公告)日：1986-04-17

申请号：DE3269891

申请日：1982-11-23

Applicant: IBM

Inventor： BLAIR WILLIAM WOLF ,  DORAN SAMUEL KAY ,  LANGNER GUENTHER OTTO

IPC: H01J37/21 ,  G02B7/28 ,  H01J37/22 ,  H01J37/304 ,  H01J37/305 ,  H01L21/027 ,  G03B41/00 ,  G02B7/11