公开(公告)号：JP2000331634A

公开(公告)日：2000-11-30

申请号：JP2000109631

申请日：2000-04-11

Applicant: IBM

Inventor： PFEIFFER HANS C ,  SENESI JOSEPH S ,  STURANS MARIS ANDRIS

IPC: G03F7/20 ,  H01J37/141 ,  H01J37/21 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a magnetic lens having a dynamic focus coil. SOLUTION: A magnetic lens 60 having a lens opening for passing a particle beam includes a dynamic focus coil 22 placed outside the lens opening in magnetic pole pieces shaping a lens magnetic field. All magnetic flux lines from the dynamic focus coil form a closed circuit on the magnetic pole pieces of the lend, and the magnitude of the shape of the lens magnetic field between magnetic pole pieces is changed according to a current flowing through the dynamic focus coil. The shape of a magnetic field does not change, thereby changing a focal surface of the beam without moving laterally the beam with respect to a system axis 101.

公开(公告)号：DE3065272D1

公开(公告)日：1983-11-17

申请号：DE3065272

申请日：1980-06-18

Applicant: IBM

Inventor： PFEIFFER HANS CHRISTIAN ,  STURANS MARIS ANDRIS

IPC: H01J37/09 ,  H01J37/147 ,  H01J37/305 ,  H01L21/027

Abstract: A toroidal magnetic deflection coil for an electron beam lithography system which is compensated for deflection placement errors that normally result from eddy currents generated within the coil windings by deflection current inputs to the coil. The compensation is achieved through addition of passive conductive material along the outer periphery of the coil. The conductive material or layer is arranged close to the outer arms of the toroidal coil windings, and thereby compensates the eddy currents within the deflection coils generated by the deflection currents in the inner arms. The compensating material can be utilized to compensate for beam drag which results from the driving circuit settling time and the inductive or capacitive coupling as well, by adding more material of appropriate dimensions.

公开(公告)号：DE60039810D1

公开(公告)日：2008-09-25

申请号：DE60039810

申请日：2000-03-18

Applicant: IBM

Inventor： PFEIFFER HANS C ,  SENESI JOSEPH S ,  STURANS MARIS ANDRIS

IPC: G03F7/20 ,  H01J37/141 ,  H01J37/21 ,  H01L21/027

Abstract: A magnetic lens having a lens bore for the passage of a particle beam includes a dynamic focus coil that is positioned outside the lens bore and within the pole piece that shapes the lens field, so that the magnetic flux lines from the dynamic focus coil all end on the pole pieces of the lens and the shape of the lens field between the pole pieces has its magnitude changed by the current passing through the dynamic focus coil, but the field shape is not changed, thus changing the focal plane of the beam without moving the beam transversely with respect to the system axis.

公开(公告)号：DE3162439D1

公开(公告)日：1984-04-05

申请号：DE3162439

申请日：1981-09-23

Applicant: IBM

Inventor： LANGNER GUENTHER OTTO ,  PFEIFFER HANS CHRISTIAN ,  STURANS MARIS ANDRIS

IPC: H01J37/141 ,  H01J37/147 ,  H01J37/153 ,  H01J37/30 ,  H01J37/317 ,  H01J29/00

Abstract: The electron beam projection system includes means for producing an electron beam, means (43, 45) for deflecting the beam (39), a magnetic projection lens (33) having rotational symmetry for focusing the deflected beam and a pair of magnetic compensation yokes (55, 57) positioned within the bore of the projection lens means (33). The pair of compensation yokes (55, 57) has coil dimensions such that, in combination, they produce a magnetic compensation field proportional to the first derivative of the axial magnetic field strength distribution curve of the projection lens (33). Upon application of current to the pair of compensation yokes (55, 57) the electron optical axis of the projection lens (33) shifts to the position of the deflected beam so that the electron beam (39) remains coincident with the shifted electron optical axis and lands perpendicular to a target (59).

公开(公告)号：DE69023030T2

公开(公告)日：1996-05-30

申请号：DE69023030

申请日：1990-02-20

Applicant: IBM

Inventor： DAVIS DONALD EUGENE ,  HO CECIL TZECHOR ,  LIEBERMAN JON ERIK ,  PFEIFFER HANS ,  STURANS MARIS ANDRIS

IPC: H01L21/027 ,  H01J37/147 ,  H01J37/302 ,  H01J37/141 ,  H01J37/30

Abstract: A three-stage E-beam deflection system employs breaking the entire field to be scanned into clusters and sub-fields. The scanning provided by the first stage of deflection which scans within the entire field is rectilinear and discontinuous with the scan stopping in the center of each of the clusters where an exposure is to be made, and scanning is the same within each cluster from sub-field to sub-field. The scanning within a cluster by the second stage stops in the center of each sub-field where exposure is to be made. The third stage uses high speed electrostatic deflection to provide scanning with a vector scanning mode within the sub-field being scanned.

公开(公告)号：DE3852097T2

公开(公告)日：1995-05-24

申请号：DE3852097

申请日：1988-12-06

Applicant: IBM

Inventor： GROVES TIMOTHY ROBINSON ,  PFEIFFER HANS CHRISTIAN ,  STICKEL WERNER ,  STURANS MARIS ANDRIS

IPC: H01J37/04 ,  H01J37/141 ,  H01J37/147 ,  H01J37/305 ,  H01L21/027 ,  H01J37/317

Abstract: A two stage, electron beam projection system includes a target, a source of an electron beam and means for projecting an electron beam towards the target with its upper surface defining a target plane. A magnetic projection lens has a principal plane and a back focal plane located between said means for projecting and the target. The means for projecting provides an electron beam directed towards the target. First stage means provides deflection of the beam from area to area within a field. Second stage means provides for deflection of the beam for providing deflection of the beam within an area within a field. The beam crossing the back focal plane produces a telecentric condition of the beam in the image plane with the beam substantially normal to tghe target plane from the principal plane to the target plane. The magnetic projection lens includes a magnetic structure providing for magnetic compensation positioned within the bore of the projection lens, which produces a compensating magnetic field substantially proportional to the first derivative of the axial magnetic projection field. The axial magnetic projection field provides substantially a zero first derivative of the axial magnetic projection field in the vicinity of the target. The projection system projects on the target plane from the projection system as deflected by the upper and lower stages, at all times maintaining the telecentric condition of the electron beam at the target plane throughout the entire range of deflection of the beam, assuring minimum errors due to target height variations.

公开(公告)号：AT404990T

公开(公告)日：2008-08-15

申请号：AT00105805

申请日：2000-03-18

Applicant: IBM

Inventor： PFEIFFER HANS C ,  SENESI JOSEPH S ,  STURANS MARIS ANDRIS

IPC: G03F7/20 ,  H01J37/141 ,  H01J37/21 ,  H01L21/027

Abstract: A magnetic lens having a lens bore for the passage of a particle beam includes a dynamic focus coil that is positioned outside the lens bore and within the pole piece that shapes the lens field, so that the magnetic flux lines from the dynamic focus coil all end on the pole pieces of the lens and the shape of the lens field between the pole pieces has its magnitude changed by the current passing through the dynamic focus coil, but the field shape is not changed, thus changing the focal plane of the beam without moving the beam transversely with respect to the system axis.

公开(公告)号：DE69023030D1

公开(公告)日：1995-11-23

申请号：DE69023030

申请日：1990-02-20

Applicant: IBM

Inventor： DAVIS DONALD EUGENE ,  HO CECIL TZECHOR ,  LIEBERMAN JON ERIK ,  PFEIFFER HANS ,  STURANS MARIS ANDRIS

IPC: H01L21/027 ,  H01J37/147 ,  H01J37/302 ,  H01J37/141 ,  H01J37/30

Abstract: A three-stage E-beam deflection system employs breaking the entire field to be scanned into clusters and sub-fields. The scanning provided by the first stage of deflection which scans within the entire field is rectilinear and discontinuous with the scan stopping in the center of each of the clusters where an exposure is to be made, and scanning is the same within each cluster from sub-field to sub-field. The scanning within a cluster by the second stage stops in the center of each sub-field where exposure is to be made. The third stage uses high speed electrostatic deflection to provide scanning with a vector scanning mode within the sub-field being scanned.

公开(公告)号：DE3852097D1

公开(公告)日：1994-12-15

申请号：DE3852097

申请日：1988-12-06

Applicant: IBM

Inventor： GROVES TIMOTHY ROBINSON ,  PFEIFFER HANS CHRISTIAN ,  STICKEL WERNER ,  STURANS MARIS ANDRIS

IPC: H01J37/04 ,  H01J37/141 ,  H01J37/147 ,  H01J37/305 ,  H01L21/027 ,  H01J37/317

Abstract: A two stage, electron beam projection system includes a target, a source of an electron beam and means for projecting an electron beam towards the target with its upper surface defining a target plane. A magnetic projection lens has a principal plane and a back focal plane located between said means for projecting and the target. The means for projecting provides an electron beam directed towards the target. First stage means provides deflection of the beam from area to area within a field. Second stage means provides for deflection of the beam for providing deflection of the beam within an area within a field. The beam crossing the back focal plane produces a telecentric condition of the beam in the image plane with the beam substantially normal to tghe target plane from the principal plane to the target plane. The magnetic projection lens includes a magnetic structure providing for magnetic compensation positioned within the bore of the projection lens, which produces a compensating magnetic field substantially proportional to the first derivative of the axial magnetic projection field. The axial magnetic projection field provides substantially a zero first derivative of the axial magnetic projection field in the vicinity of the target. The projection system projects on the target plane from the projection system as deflected by the upper and lower stages, at all times maintaining the telecentric condition of the electron beam at the target plane throughout the entire range of deflection of the beam, assuring minimum errors due to target height variations.