Method for manufacturing microthrough-hole in circuit board and circuit board structure with microthrough-hole
    2.
    发明授权
    Method for manufacturing microthrough-hole in circuit board and circuit board structure with microthrough-hole 有权
    电路板微通孔制作方法及微通孔电路板结构

    公开(公告)号:US09301405B1

    公开(公告)日:2016-03-29

    申请号:US14604956

    申请日:2015-01-26

    Abstract: A method for manufacturing microthrough-hole includes electroplating a metal layer on a carrier plate, patterning the metal layer to form a first circuit having copper pads, covering the first circuit with a photoresist layer and not covering the copper window between two of the copper pads, etching the metal layer beneath the copper window and removing the photoresist layer, sequentially forming an insulation layer and a second circuit on the first circuit and the copper window, the second circuit layer having a stop pad corresponding to the copper window, removing the carrier plate, upward drilling through the insulation layer between the stop pad and the copper window to form a microthrough-hole beneath the stop pad, and forming a conductive layer in the microthrough-hole to form the microthrough-hole connecting the first and second circuits. The microthrough-hole and its occupied area is greatly reduced, thereby achieving high circuit density.

    Abstract translation: 一种用于制造微通孔的方法包括在载体板上电镀金属层,图案化金属层以形成具有铜焊盘的第一电路,用光致抗蚀剂层覆盖第一电路,并且不覆盖两个铜焊盘之间的铜窗 蚀刻铜窗下方的金属层并除去光致抗蚀剂层,在第一电路和铜窗上依次形成绝缘层和第二电路,第二电路层具有对应于铜窗的停止焊盘,移除载体 通过止动垫和铜窗之间的绝缘层向上钻孔,以在止动垫下方形成微通孔,并在微通孔中形成导电层,形成连接第一和第二电路的微通孔。 微通孔及其占用面积大大降低,从而实现高电路密度。

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