公开(公告)号：SG11202005972UA

公开(公告)日：2020-11-27

申请号：SG11202005972U

申请日：2019-04-05

Applicant: KLA TENCOR CORP

Inventor： HILL ANDREW V ,  BACHAR OHAD ,  ABRAMOV AVI ,  PASKOVER YURI ,  PERRY DOR

IPC: G06T7/33 ,  G01B11/00 ,  G06T5/50 ,  G06T7/73

Abstract: An overlay metrology tool providing site-by-site alignment includes a controller coupled to a telecentric imaging system. The controller may receive two or more alignment images of an overlay target on a sample captured at two or more focal positions by the imaging system, generate alignment data indicative of an alignment of the overlay target within the imaging system based on the alignment images, set the alignment images as measurement images when the alignment of the overlay target is within selected alignment tolerances, direct the imaging system to adjust the alignment of the overlay target in the imaging system and further receive one or more measurement images from the imaging system when the alignment of the overlay target is outside the selected alignment tolerances, and determine overlay between two or more layers of the sample based on at least one of the measurement images.

公开(公告)号：EP2959503A4

公开(公告)日：2016-10-26

申请号：EP14753960

申请日：2014-02-21

Applicant: KLA TENCOR CORP

Inventor： BRADY GREGORY ,  SHCHEGROV ANDREI V ,  ROTTER LAWRENCE D ,  SHAUGHNESSY DERRICK ,  SHCEMELININ ANATOLY ,  BEZEL ILYA ,  ARAIN MUZAMMIL ,  VASILIEV ANATOLY ,  ALLEN JAMES ,  SHULEPOV OLEG ,  HILL ANDREW ,  BACHAR OHAD ,  MARKOWITZ MOSHE ,  ISH-SHALOM YARON ,  SELA ILAN ,  MANASSEN AMNON ,  SVIZHER ALEXANDER ,  KHOKHLOV MAXIM ,  ABRAMOV AVI ,  TSIBULEVSKY OLEG ,  KANDEL DANIEL ,  GHINOVKER MARK

IPC: H01L21/66 ,  F21V13/00 ,  F21V13/08 ,  F21V13/12 ,  G02B6/293 ,  G02B6/35

CPC classification number: G01J3/10 ,  F21V13/00 ,  F21V13/08 ,  F21V13/12 ,  G01J3/0218 ,  G01J3/12 ,  G02B6/29332 ,  G02B6/29362 ,  G02B6/29388 ,  G02B6/29395 ,  G02B6/3508 ,  G02B6/353 ,  H01J65/04

Abstract: The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.

Abstract translation: 用于向用于光学测量的测量头提供照明的系统被配置为组合来自多个照明源的照明光束以将一个或多个所选波长的照明传送到测量头。 控制传递到测量头的照明的强度和/或空间相干性。 在一个或多个所选波长的照明从配置成在连续波长范围内提供照明的宽带照明源传送。