公开(公告)号：KR20180026582A

公开(公告)日：2018-03-12

申请号：KR20187006323

申请日：2011-07-28

Applicant: KLA TENCOR CORP

Inventor： KANDEL DANIEL ,  LEVINSKI VLADIMIR ,  COHEN GUY

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/70683

Abstract: 촬상기반계측에서사용하기위한다층오버레이타겟이개시된다. 오버레이타겟은 3개이상의타겟구조물을포함한복수의타겟구조물을포함하고, 각타겟구조물은 2개이상의패턴요소들의집합을포함하며, 타겟구조물은타겟구조물의정렬시에공통대칭중심을공유하도록구성되고, 각타겟구조물은공통대칭중심에대한 N도(N도는 180도이상임) 회전에대하여불변체이며, 2개이상의패턴요소는각각개별적인대칭중심을갖고, 각타겟구조물의 2개이상의패턴요소들은각각개별적인대칭중심에대한 M도(M도는 180도이상임) 회전에대하여불변체이다.

Abstract translation: 公开了用于基于成像的度量衡中的多层覆盖目标。 覆盖目标包括多个包括三个或更多个目标结构的目标结构，每个目标结构包括一组两个或更多个模式元素，其中目标结构被配置为在目标结构对齐时共享对称的共同中心，每个 目标结构围绕所述公共对称中心不变为N度旋转，其中N等于或大于180度，其中所述两个或更多个图案元件中的每一个具有单独的对称中心，其中所述两个或更多个图案中的每一个 每个目标结构的元素对于围绕单个对称中心的M度旋转是不变的，其中M等于或大于180度。

公开(公告)号：SG11201708164YA

公开(公告)日：2017-11-29

申请号：SG11201708164Y

申请日：2016-04-19

Applicant: KLA TENCOR CORP

Inventor： LEE MYUNGJUN ,  SMITH MARK D ,  ADEL MICHAEL E ,  AMIT ERAN ,  KANDEL DANIEL

IPC: H01L21/66

Abstract: Metrology methods, modules and targets are provided, for measuring tilted device designs. The methods analyze and optimize target design with respect to the relation of the Zernike sensitivity of pattern placement errors (PPEs) between target candidates and device designs. Monte Carlo methods may be applied to enhance the robustness of the selected target candidates to variation in lens aberration and/or in device designs. Moreover, considerations are provided for modifying target parameters judiciously with respect to the Zernike sensitivities to improve metrology measurement quality and reduce inaccuracies.

公开(公告)号：SG11201703585RA

公开(公告)日：2017-06-29

申请号：SG11201703585R

申请日：2015-11-24

Applicant: KLA TENCOR CORP

Inventor： MARCIANO TAL ,  BRINGOLTZ BARAK ,  GUREVICH EVGENI ,  ADAM IDO ,  LINDENFELD ZA'EV ,  ZHAO ZENG ,  FELER YOEL ,  KANDEL DANIEL ,  CARMEL NADAV ,  MANASSEN AMNON ,  AMIR NURIEL ,  KAMINSKY ODED ,  YAZIV TAL ,  ZAHARAN OFER ,  COOPER MOSHE ,  SULIMARSKI ROEE ,  LEVIANT TOM ,  SELLA NOGA ,  EFRATY BORIS ,  SALTOUN LILACH ,  HANDELMAN AMIR ,  ASHWAL ELTSAFON ,  BACHAR OHAD

IPC: H01L21/66

Abstract: Methods are provided for deriving a partially continuous dependency of metrology metric(s) on recipe parameter(s), analyzing the derived dependency, determining a metrology recipe according to the analysis, and conducting metrology measurement(s) according to the determined recipe. The dependency may be analyzed in form of a landscape such as a sensitivity landscape in which regions of low sensitivity and/or points or contours of low or zero inaccuracy are detected, analytically, numerically or experimentally, and used to configure parameters of measurement, hardware and targets to achieve high measurement accuracy. Process variation is analyzed in terms of its effects on the sensitivity landscape, and these effects are used to characterize the process variation further, to optimize the measurements and make the metrology both more robust to inaccuracy sources and more flexible with respect to different targets on the wafer and available measurement conditions.

公开(公告)号：WO2011103048A3

公开(公告)日：2012-03-01

申请号：PCT/US2011024689

申请日：2011-02-14

Applicant: KLA TENCOR CORP ,  IZIKSON PAVEL ,  KANDEL DANIEL ,  ROBINSON JOHN

Inventor： IZIKSON PAVEL ,  KANDEL DANIEL ,  ROBINSON JOHN

IPC: H01L21/66 ,  H01L21/027

CPC classification number: H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

Abstract: The present invention may include performing a first measurement on a wafer of a first lot of wafers via an omniscient sampling process, calculating a first set of process tool correctables utilizing one or more results of the measurement performed via an omniscient sampling process, randomly selecting a set of field sampling locations of the wafer of a first lot of wafers, calculating a second set of process tool correctables by applying an interpolation process to the randomly selected set of field sampling locations, wherein the interpolation process utilizes values from the first set of process tool correctables for the randomly selected set of field sampling locations in order to calculate correctables for fields of the wafer of the first lot not included in the set of randomly selected fields, and determining a sub-sampling scheme by comparing the first set of process tool correctables to the second set of correctables.

Abstract translation: 本发明可以包括通过无所不在的采样处理在第一批晶片的晶片上进行第一测量，利用通过全方位采样过程执行的一个或多个测量结果来计算第一组处理工具校正值，随机选择 第一批晶片的晶片的一组场采样位置，通过对随机选择的一组场采样位置应用内插处理来计算第二组处理工具可校正值，其中所述内插处理利用来自第一组处理的值 用于随机选择的一组场采样位置的工具可校正，以便计算不包括在随机选择的场的集合中的第一批的晶片的场的可校正性，以及通过比较第一组处理工具来确定子采样方案 可纠正到第二组可纠正的。

公开(公告)号：SG11201708135YA

公开(公告)日：2017-11-29

申请号：SG11201708135Y

申请日：2016-04-05

Applicant: KLA TENCOR CORP

Inventor： LEVY ADY ,  KANDEL DANIEL ,  ADEL MICHAEL E ,  POSLAVSKY LEONID ,  ROBINSON JOHN ,  MARCIANO TAL ,  BRINGOLTZ BARAK ,  GRUNZWEIG TZAHI ,  KLEIN DANA ,  ITZKOVICH TAL ,  CARMEL NADAV ,  AMIR NURIEL ,  RAMANATHAN VIDYA ,  CAMP JANAY ,  WAGNER MARK

IPC: H01L21/66 ,  G01N21/95

Abstract: A metrology performance analysis system includes a metrology tool including one or more detectors and a controller communicatively coupled to the one or more detectors. The controller is configured to receive one or more metrology data sets associated with a metrology target from the metrology tool in which the one or more metrology data sets include one or more measured metrology metrics and the one or more measured metrology metrics indicate deviations from nominal values. The controller is further configured to determine relationships between the deviations from the nominal values and one or more selected semiconductor process variations, and determine one or more root causes of the deviations from the nominal values based on the relationships between values of the one or more metrology metrics and the one or more selected semiconductor process variations.

公开(公告)号：SG178432A1

公开(公告)日：2012-04-27

申请号：SG2012010575

申请日：2010-09-01

Applicant: KLA TENCOR CORP

Inventor： KANDEL DANIEL ,  LEVINSKI VLADIMIR ,  SVIZHER ALEXANDER ,  SELIGSON JOEL ,  HILL ANDREW ,  BACHAR OHAD ,  MANASSEN AMNON ,  CHUANG YUNG-HO ALEX ,  SELA ILAN ,  MARKOWITZ MOSHE ,  NEGRI DARIA ,  ROTEM EFRAIM

Abstract: Various metrology systems and methods are provided.

公开(公告)号：WO2009143200A3

公开(公告)日：2010-03-04

申请号：PCT/US2009044594

申请日：2009-05-20

Applicant: KLA TENCOR CORP ,  IZIKSON PAVEL ,  ADEL MICHAEL E ,  KANDEL DANIEL

Inventor： IZIKSON PAVEL ,  ADEL MICHAEL E ,  KANDEL DANIEL

IPC: H01L21/66

CPC classification number: G03F7/70641 ,  G05B19/41845 ,  G05B2219/32187 ,  G05B2219/36307 ,  H01L22/20 ,  Y02P90/16 ,  Y02P90/22

Abstract: A method of characterizing a process by selecting the process to characterize, selecting a parameter of the process to characterize, determining values of the parameter to use in a test matrix, specifying an eccentricity for the test matrix, selecting test structures to be created in cells on a substrate, processing the substrate through the process using in each cell the value of the parameter as determined by the eccentric test matrix, measuring a property of the test structures in the cells, and developing a correlation between the parameter and the property.

Abstract translation: 一种通过选择表征过程来表征过程的方法，选择过程的参数来表征，确定在测试矩阵中使用的参数的值，指定测试矩阵的偏心度，选择要在单元格中创建的测试结构 在基板上，通过在每个单元中使用由偏心测试矩阵确定的参数值来处理基板，测量单元中的测试结构的性质，以及发展参数与特性之间的相关性。

公开(公告)号：WO2012018674A3

公开(公告)日：2012-05-18

申请号：PCT/US2011045784

申请日：2011-07-28

Applicant: KLA TENCOR CORP ,  MANASSEN AMMON ,  KANDEL DANIEL ,  BARUCH MOSHE ,  SELIGSON JOEL ,  SVIZHER ALEXANDER ,  COHEN GUY ,  ROTEM EFRAIM ,  BACHAR OHAD ,  NEGRI DARIA ,  SAPIENS NOAM

Inventor： MANASSEN AMMON ,  KANDEL DANIEL ,  BARUCH MOSHE ,  SELIGSON JOEL ,  SVIZHER ALEXANDER ,  COHEN GUY ,  ROTEM EFRAIM ,  BACHAR OHAD ,  NEGRI DARIA ,  SAPIENS NOAM

IPC: H01L21/027

CPC classification number: G03F7/70633 ,  G01N21/55 ,  G03F7/70616

Abstract: The present invention includes an illumination source, at least one illumination symmetrization module (ISM) configured to symmetrize at least a portion of light emanating from the illumination source, a first beam splitter configured to direct a first portion of light processed by the ISM along an object path to a surface of one or more specimens and a second portion of light processed by the ISM along a reference path, and a detector disposed along a primary optical axis, wherein the detector is configured to collect a portion of light reflected from the surface of the one or more specimens.

Abstract translation: 本发明包括照明源，至少一个照明对称化模块（ISM），被配置为对来自照明源发出的光的至少一部分进行对称;第一分束器，被配置为将由ISM处理的光的第一部分沿着 一个或多个样本的表面的物体路径和沿着基准路径由ISM处理的光的第二部分以及沿着主光轴布置的检测器，其中检测器被配置为收集从表面反射的光的一部分 的一个或多个标本。

公开(公告)号：WO2011159725A3

公开(公告)日：2012-04-26

申请号：PCT/US2011040389

申请日：2011-06-14

Applicant: KLA TENCOR CORP ,  HILL ANDREW V ,  MANASSEN AMNON ,  KANDEL DANIEL ,  LEVINSKI VLADIMIR ,  SELIGSON JOEL ,  SVIZHER ALEXANDER ,  WANG DAVID Y ,  ROTTER LAWRENCE D ,  DE VEER JOHANNES D

Inventor： HILL ANDREW V ,  MANASSEN AMNON ,  KANDEL DANIEL ,  LEVINSKI VLADIMIR ,  SELIGSON JOEL ,  SVIZHER ALEXANDER ,  WANG DAVID Y ,  ROTTER LAWRENCE D ,  DE VEER JOHANNES D

IPC: H01L21/027 ,  H01L21/66

CPC classification number: G02B27/141 ,  G01N21/474 ,  G01N21/4788 ,  G01N2021/4792 ,  G02B27/145 ,  G03F7/70633

Abstract: Systems and methods for discrete polarization scatterometry are provided. One embodiment relates to an optical subsystem of a scatterometer. The optical subsystem includes one or more light sources configured to produce light having different polarizations. The optical subsystem also includes a polarizing beam splitter configured to separate the light into two different light beams having orthogonal and mutually exclusive polarizations. The optical subsystem further includes one or more second optical elements configured to control which one of the two different light beams illuminates the wafer during measurements. The optical subsystem also includes a detection subsystem configured to separately detect two different scattered light beams resulting from illumination of the wafer. The two different scattered light beams have orthogonal and mutually exclusive polarizations. All optical surfaces of the optical subsystem used for the measurements are stationary during the measurements.

Abstract translation: 提供了离散极化散射法的系统和方法。 一个实施例涉及一种散射仪的光学子系统。 光学子系统包括被配置为产生具有不同偏振的光的一个或多个光源。 光学子系统还包括偏振分束器，其被配置为将光分离成具有正交和相互排斥的极化的两个不同光束。 光学子系统还包括一个或多个第二光学元件，其被配置为在测量期间控制两个不同光束中的哪一个照射晶片。 光学子系统还包括被配置为分别检测由晶片的照明产生的两个不同散射光束的检测子系统。 两个不同的散射光束具有正交和相互排斥的偏振。 用于测量的光学子系统的所有光学表面在测量期间是静止的。

公开(公告)号：WO2010080732A3

公开(公告)日：2010-10-07

申请号：PCT/US2010020046

申请日：2010-01-04

Applicant: KLA TENCOR CORP ,  ADEL MICHAEL E ,  MANASSEN AMNON ,  KANDEL DANIEL

Inventor： ADEL MICHAEL E ,  MANASSEN AMNON ,  KANDEL DANIEL

IPC: H01L21/66

CPC classification number: G03F7/70683 ,  G03F7/705 ,  G03F7/70633 ,  H01L22/12

Abstract: A metrology target design may be optimized using inputs including metrology target design information, substrate information, process information, and metrology system information. Acquisition of a metrology signal with a metrology system may be modeled using the inputs to generate one or more optical characteristics of the metrology target. A metrology algorithm may be applied to the characteristics to determine a predicted accuracy and precision of measurements of the metrology target made by the metrology system. Part of the information relating to the metrology target design may be modified and the signal modeling and metrology algorithm may be repeated to optimize the accuracy and precision of the one or more measurements. The metrology target design may be displayed or stored after the accuracy and precision are optimized.

Abstract translation: 度量目标设计可以使用包括度量衡目标设计信息，衬底信息，过程信息和度量衡系统信息的输入来优化。 采用计量系统采集计量信号可以使用输入来建模以产生计量目标的一个或多个光学特性。 计量算法可以应用于特征以确定由计量系统制造的计量目标的测量的预测精度和精度。 与计量目标设计有关的部分信息可能会被修改，信号建模和计量算法可能会重复，以优化一个或多个测量的准确度和精确度。 计量目标设计可以在精确度和精度得到优化之后显示或存储。