PHOTORESIST STRIPPER COMPOSITION.
    7.
    发明公开
    PHOTORESIST STRIPPER COMPOSITION. 失效
    ÄTZZUSAMMENSETZUNGFÜRPHOTORESERVE。

    公开(公告)号:EP0301044A4

    公开(公告)日:1989-03-29

    申请号:EP88900899

    申请日:1987-09-10

    Applicant: MACDERMID INC

    Abstract: A photoresist stripper composition comprises a mixture of (a) pyrrolidone, N-substituted pyrrolidones, butyrolactone or caprolactone as the major component and (b) from about 2 to about 10 percent by weight of a tetraalkylammonium hydroxide or a trialkylaralkylammonium hydroxide. Optional components of the mixture include surfactants, diluents and metal corrosion inhibitors. Extraneously added water is avoided. The compositions are efficient in stripping photoresists which, by reason of processing conditions, have become highly cross-linked and resistant to removal by solvents other than hot phenolic or halohydrocarbon strippers.

    Abstract translation: 光刻胶剥离剂组合物包含(a)吡咯烷酮,N-取代的吡咯烷酮,丁内酯或己内酯作为主要组分的混合物和(b)约2至约10重量%的四烷基氢氧化铵或三烷基芳基氢氧化铵。 混合物的任选组分包括表面活性剂,稀释剂和金属腐蚀抑制剂。 避免外加水。 该组合物有效剥离光致抗蚀剂,由于加工条件的原因,该抗光蚀剂已变得高度交联并且耐受除热酚或脱卤剂以外的溶剂的去除。

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