SEMICONDUCTOR LASER ELEMENT AND MANUFACTURING METHOD OF THE SAME

    公开(公告)号:JP2012109499A

    公开(公告)日:2012-06-07

    申请号:JP2010258883

    申请日:2010-11-19

    Applicant: SONY CORP

    Abstract: PROBLEM TO BE SOLVED: To provide a semiconductor laser element and a manufacturing method of the same, capable of suppressing reliably a facet degradation caused by interface oxidation and strain application.SOLUTION: The semiconductor laser element comprises: a laser structure part 107 having resonator surfaces 108 and 109 opposing to each other; and protective films 110 and 120 formed on at least one of opposing resonator surfaces. The protective films 110 and 120 are formed with nitride dielectric films having a multilevel structure whose crystal structures are amorphous layers 111 and 121 and polycrystalline layers 112 and 122 from a side contacting a resonator surface.

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