公开(公告)号：EP2044609B1

公开(公告)日：2011-01-12

申请号：EP07766170.0

申请日：2007-07-06

Applicant: SPP Process Technology Systems UK Limited

Inventor： PROUDFOOT, Gary ,  GEORGE, Christopher, David ,  LIMA, Paulo, Edurado ,  GREEN, Gordon, Robert ,  TROWELL, Robert, Kenneth

IPC: H01J37/305 ,  H01J37/317 ,  C23C14/46 ,  H01J37/08 ,  H01J27/04 ,  H01J27/16 ,  H01J37/20

CPC classification number: C23C14/46 ,  H01J27/18 ,  H01J37/20 ,  H01J37/3178 ,  H01J2237/024 ,  H01J2237/3146

Abstract: This invention relates to a broad beam ion deposition apparatus (100) including an ion source (101), a target (102), a tillable substrate table (103) and an auxiliary port (104). The target (102) is in the form of a carousel which carries a number of targets and the ion source (101) is configured to produce a substantially rectangular section beam (105).

公开(公告)号：EP2044610B1

公开(公告)日：2012-11-28

申请号：EP07733491.0

申请日：2007-07-06

Applicant: SPP Process Technology Systems UK Limited

Inventor： PROUDFOOT, Gary ,  GEORGE, Christopher, David ,  LIMA, Paulo, Eduardo

IPC: H01J37/32

CPC classification number: H01J37/32082 ,  H01J37/32623

公开(公告)号：EP2044608B1

公开(公告)日：2012-05-02

申请号：EP07766199.9

申请日：2007-07-12

Applicant: SPP Process Technology Systems UK Limited

Inventor： PROUDFOOT, Gary ,  GREEN, Gordon Robert ,  TROWELL, Robert Kenneth

IPC: H01J27/18 ,  H01J37/08

CPC classification number: H01J27/18 ,  H01J27/024 ,  H01J37/04 ,  H01J37/08 ,  H01J2237/04735 ,  H01J2237/083

Abstract: This invention relates to an Ion gun (10) which comprises of plasma generator (11) driven from an RF source (12), a plasma or source chamber (13), having an outlet (14), across which is mounted an accelerator grid (15). The accelerator grid (15) comprises four individual grids. The first grid (16), which is closest to the outlet (14), is maintained at a positive voltage by a DC source (16a), the second grid (17) is maintained strongly negative by DC source (17a). The third grid (18) is maintained at a negative voltage, which is much lower than that of the second grid (17), by DC source (18a) and the fourth grid is grounded. Means of mounting these grids are also described.