Abstract:
Stress sensor (1) formed by a membrane plate (4); a first bonding region (5) arranged on top of the membrane plate; a cover plate (6) arranged on top of the first bonding region, the first bonding region bonding the membrane plate to the cover plate; three-dimensional detection piezoresistive elements (11) extending on the membrane plate (4) that are embedded in the bonding layer; and planar detection piezoresistive elements (12) that extend across the membrane plate and are surrounded by and separated from the bonding layer.
Abstract:
A load sensor package (140) includes a housing having a cap (142), a column (144), a peripheral structure (146), and a base (148). The base (148) includes a major surface configured to mount a stress sensor (120), while the cap (142) includes a cap major surface configured to receive a load to be measured. The column (144) is configured to transfer a predetermined fraction of the load to be measured to the base through the stress sensor (120). The peripheral structure (146) is configured to transfer the remaining fraction of the load to be measured to the base.
Abstract:
A microelectromechanical transducer (1; 20; 30; 50), comprising: a semiconductor body (2), having a first surface (2a) and a second surface (2b) opposite to one another; a first structural body (8), coupled to the first surface (2a) of the semiconductor body (2); a first sealed cavity (10) between the semiconductor body (2) and the first structural body (8); and an active area (7) housed in the first sealed cavity (10), including at least two trenches (4; 34) and a sensor element (6a-6d; 60) between the trenches (4; 34). The trenches (4; 34) extend along a vertical direction (Z) from the first surface (2a) towards the second surface (2b) of the semiconductor body (2).
Abstract:
A load-sensing device (10), arranged in a package (12) forming a chamber (24). The package (12) has a deformable substrate (21) configured, in use, to be deformed by an external force. A sensor unit (11) is in direct contact with the deformable substrate (21) and is configured to detect deformations of the deformable substrate. An elastic element (15) is arranged within of the chamber (24) and acts between the package (12) and the sensor unit (11) to generate, on the sensor unit, a force keeping the sensor unit in contact with the deformable substrate. For example, the deformable substrate is a base (21) of the package (12), and the elastic element is a metal lamina (15) arranged between the lid (22) of the package (12) and the sensor unit (11). The sensor unit (11) may be a semiconductor die integrating piezoresistors.
Abstract:
A load sensor package (140) includes a housing having a cap (142), a column (144), a peripheral structure (146), and a base (148). The base (148) includes a major surface configured to mount a stress sensor (120), while the cap (142) includes a cap major surface configured to receive a load to be measured. The column (144) is configured to transfer a predetermined fraction of the load to be measured to the base through the stress sensor (120). The peripheral structure (146) is configured to transfer the remaining fraction of the load to be measured to the base.
Abstract:
A microelectromechanical transducer (1), comprising: a semiconductor body (2), having a first surface (2a) and a second surface (2b) opposite to one another; a plurality of trenches (4) extending in the semiconductor body (2) from the first surface (2a) towards the second surface (2b), including a first pair of trenches (4a) having a respective main direction of extension along a first axis (x), and a second pair of trenches (4b) having a respective main direction of extension along a second axis (y) orthogonal to the first axis; a first piezoresistive sensor (6a) and a second piezoresistive sensor (6b) extending at the first surface (2a) of the semiconductor body (2), respectively arranged between said first and second pair of trenches (4a, 4b), wherein the first piezoresistive sensor (6a), the second piezoresistive sensor (6b) and the plurality of trenches (4) form an active region (7a, 7b); and a first structural body (8), mechanically coupled to the first surface (2a) of the semiconductor body (2) in such a way to form a first sealed cavity (10) which encloses the active region.