Abstract:
The invention relates to a semiconductor power device (20) with insulated gate and improved trench-gate structure, of the type wherein the trench-gate structure is realised on a semiconductor substrate (1) covered by at least an epitaxial layer (3) and by means of a trench (29) realised in the semiconductor to form the device gate region (27); a dielectric coating (28) being provided on the inner and bottom walls of the trench (29), characterised in that said gate region (27) comprises a conductive spacer layer (30) on said coating layer (28) only in correspondence with the inner walls of the trench (29).
Abstract:
The integrated power device (100) comprises a power transistor (2) made up of a first diode (25) and a second diode (26) which are connected together in series between a collector region (6) and emitter-contact region (14) of the power transistor (2) and define a common intermediate node (24). The power device (100) also comprises a control circuit (3) including a high-voltage region (30) bonded on the emitter-contact region (14) by means of an adhesive layer (108), and biasing means (109, 110, 111) connected between the common intermediate node (24) and the high-voltage region (30). The biasing means (109, 110, 111) comprise a contact pad (109) electrically connected to the common intermediate node (24), an electrical connection region (111) which is in electrical contact with the high-voltage region (30), and a wire (110) having a first end soldered on the contact pad (109) and a second end soldered on said electrical connection region (111).
Abstract:
A diode (100; 200) is proposed. The diode is integrated on a chip (105) of semiconductor material having an anode surface (105a) and a cathode surface (105c) opposite to each other. The diode comprises at least one cathode region (120) having a doping of a first type, the cathode region extending from the cathode surface in the chip. Furthermore, the diode comprises an intrinsic region (130) having a doping of the first type with a dopant concentration lower than a dopant concentration of the cathode region, the intrinsic region extending between the anode surface and the cathode region. In addition, the diode comprises a plurality of anode regions (135c, 135f) having a doping of a second type, each anode region extending from the anode surface in the intrinsic region. The diode further comprises a cathode electrode (110) of electrically conductive material electrically coupled with said at least one cathode region on the cathode surface, and an anode electrode (115) of electrically conducting material. In the solution according to an embodiment of the present disclosure, one or more contacted anode regions (135c) of said anode regions are electrically coupled with the anode electrode on the anode surface, and one or more floating anode regions (135f) of said anode regions are electrically insulated from the anode electrode. The diode is configured so that charge carriers are injected from said at least one floating anode region into the intrinsic region in response to the applying of a control voltage between the anode electrode and the cathode electrode exceeding a threshold voltage of the diode.
Abstract:
A method of manufacturing an electronic structure, which structure comprises a first power device (1) and a second unidirectional device (120), both integrated in the same protective package; the first device (1) having at least first and second electrodes (8,9) of the first device (1), with said first electrode (8) of the first device (1) being attached to the package; and the second device (120) having first and second electrodes (170,160) of the second device (120); wherein the first electrode (170) of the second device (120) is superposed on the second electrode (9) of the first device (1) and connected electrically to the second electrode (9) of the first device (1).
Abstract:
A MOS power device such as a power MOSFET (eg. VDMOS) or an insulated gate bipolar transistor (ie. IGBT) with a high dynamic ruggedness, which comprises a parasitic bipolar transistor having its base in a base region (3,5) of the power device and means for counter-biasing the parasitic bipolar transistor. The counter-biasing means are resistive means inserted between a source region (4) of the power device and an emitter (E1) of the parasitic bipolar transistor (NPN). Said resistive means may consist of a lightly doped region (12) of the same conductivity type as that of the source region (4) of the power device and disposed in the base region (3,5) of the power device, under said source region (4).
Abstract:
An electronic power device (2) for controlling a load (3), comprising: a high-voltage integrated switch (8) having an output terminal to be connected to said load; integrated, and low-voltage driving means (9) for driving the switch (8), a start-up integrated circuit (10) comprising a high-voltage resistor (15) that can be enabled, during a step of turning on said power device (2), in order to activate the driving means. Said device is characterized in that the switch (8) and the start-up circuit (10) are integrated in a first semiconductor chip and the driving means (9) is integrated in a different, second semiconductor chip.
Abstract:
A method for producing devices for control circuits integrated in power devices, the particularity of which is the fact that it comprises the steps that consist in:
forming a signal device inside an active area of a power device in a chip; forming, by means of an implantation, an edge structure of the signal device and providing, by means of the implantation of the edge structure, at the active area of the signal device, a P-type well at a lower concentration than wells of holes arranged at the source and drain regions of the signal device, the well of holes providing electrical continuity between the drain and source regions of the signal device.