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1.发明授权Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter 有权光谱纯度滤光片，光刻设备和制造光谱纯度滤光片的方法公开(公告)号：US09195152B2
公开(公告)日：2015-11-24
申请号：US13119895
申请日：2009-08-26
Applicant: Wouter Anthon Soer , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak , Denny Mathew , Hendrik Jan Kettelarij , Fredericus Christiaan Van Den Heuvel , Petrus Elizabeth Maria Kuijpers
Inventor： Wouter Anthon Soer , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak , Denny Mathew , Hendrik Jan Kettelarij , Fredericus Christiaan Van Den Heuvel , Petrus Elizabeth Maria Kuijpers
CPC classification number: G03F7/7095 , B82Y10/00 , G02B5/208 , G03F7/70191 , G03F7/70575 , G21K1/10 , G21K2201/061
Abstract: A transmissive spectral purity filter is configured to transmit extreme ultraviolet radiation. The spectral purity filter includes a filter part having a plurality of apertures configured to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. Each aperture has been manufactured by an anisotropic etching process.
Abstract translation: 透射光谱纯度滤光器被配置为透射极紫外辐射。 光谱纯度滤光器包括具有多个孔的滤光器部分，其被配置为透射极紫外辐射并抑制第二类型辐射的透射。 每个孔径均通过各向异性蚀刻工艺制造。
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公开(公告)号：US08836917B2
公开(公告)日：2014-09-16
申请号：US13347320
申请日：2012-01-10
CPC classification number: G02B27/44 , G02B5/1838 , G02B5/1876 , G02B27/4244 , G02F1/061 , G03F7/70191 , G21K1/06 , G21K2201/067
Abstract: A zone plate includes a plurality of consecutively arranged, adjacent, and alternating first and second regions. The first regions are arranged to be substantially transparent to a first predetermined wavelength of radiation and a second predetermined wavelength of radiation that is different from the first predetermined wavelength of radiation. The second regions are arranged to be substantially opaque, diffractive, or reflective to the first predetermined wavelength of radiation and substantially transparent to the second predetermined wavelength of radiation.
Abstract translation: 区域板包括多个连续布置的，相邻的和交替的第一和第二区域。 第一区域被布置成对于辐射的第一预定波长和不同于第一预定波长辐射的第二预定波长的辐射基本上是透明的。 第二区域被布置为基本上不透明，衍射或反射到第一预定波长的辐射并且对第二预定波长的辐射基本透明。
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公开(公告)号：US20130161542A1
公开(公告)日：2013-06-27
申请号：US13774612
申请日：2013-02-22
Applicant: Vadim Yevgenyevich BANINE , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Martin Jacobus Johan Jak
Inventor： Vadim Yevgenyevich BANINE , Maarten Marinus Johannes Wilhelmus Van Herpen , Wouter Anthon Soer , Martin Jacobus Johan Jak
IPC: B08B7/00
CPC classification number: G03F7/70925
Abstract: A radiation source includes an uncapped Mo/Si multilayer mirror, and a cleaning apparatus configured to remove a deposition comprising Sn on the uncapped Mo/Si multilayer mirror. The cleaning apparatus is configured to provide a gas comprising one or more of H2, D2 and HD and one or more additional compounds selected from hydrocarbon compounds and/or silane compounds in at least part of the radiation source, to produce hydrogen and/or deuterium radicals and radicals of the one or more additional compounds, from the gas, and to supply the hydrogen and/or deuterium radicals and radicals of the one or more additional compounds to the uncapped Mo/Si multilayer mirror to remove at least part of the deposition.
Abstract translation: 辐射源包括未加盖的Mo / Si多层反射镜，以及被配置为去除未开盖的Mo / Si多层反射镜上的包含Sn的沉积物的清洁装置。 清洁装置被配置为在至少部分辐射源中提供包含H2，D2和HD中的一种或多种的气体和一种或多种选自烃化合物和/或硅烷化合物的其它化合物，以产生氢和/或氘 来自气体的一种或多种另外的化合物的自由基和基团，并且将一种或多种另外的化合物的氢和/或氘自由基和自由基供应到未开孔的Mo / Si多层反射镜，以去除至少一部分沉积物 。
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公开(公告)号：US08227771B2
公开(公告)日：2012-07-24
申请号：US11878306
申请日：2007-07-23
IPC: A61N5/00
CPC classification number: G03F7/70925 , B08B1/00 , B82Y10/00 , G03F7/70166 , G03F7/70916
Abstract: A debris prevention system is constructed and arranged to prevent debris emanating from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes a first foil trap that is rotatable around an axis of rotation, and a second foil trap that at least partly encloses the first foil trap. The second foil trap includes a plurality of foils optically open respective to a central location for placement of a radiation source and optically closed respective to directions perpendicular to the axis of rotation.
Abstract translation: 构建和布置防碎片系统，以防止从辐射源发出的碎屑从辐射源的辐射传播到光刻设备内或其内。 碎片防止系统包括可围绕旋转轴线旋转的第一箔捕获器和至少部分地包围第一箔捕获器的第二箔阱。 第二箔捕获器包括多个箔片，其相应于中心位置光学地打开，用于放置辐射源并且相应于垂直于旋转轴线的方向光学地闭合。
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公开(公告)号：US20120105961A1
公开(公告)日：2012-05-03
申请号：US13347320
申请日：2012-01-10
IPC: G02B27/44
CPC classification number: G02B27/44 , G02B5/1838 , G02B5/1876 , G02B27/4244 , G02F1/061 , G03F7/70191 , G21K1/06 , G21K2201/067
Abstract: A zone plate includes a plurality of consecutively arranged, adjacent, and alternating first and second regions. The first regions are arranged to be substantially transparent to a first predetermined wavelength of radiation and a second predetermined wavelength of radiation that is different from the first predetermined wavelength of radiation. The second regions are arranged to be substantially opaque, diffractive, or reflective to the first predetermined wavelength of radiation and substantially transparent to the second predetermined wavelength of radiation.
Abstract translation: 区域板包括多个连续布置的，相邻的和交替的第一和第二区域。 第一区域被布置成对于辐射的第一预定波长和不同于第一预定波长辐射的第二预定波长的辐射基本上是透明的。 第二区域被布置为基本上不透明，衍射或反射到第一预定波长的辐射并且对第二预定波长的辐射基本透明。
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Patent Agency Ranking
6.发明申请SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS INCLUDING SUCH A SPECTRAL PURITY FILTER AND DEVICE MANUFACTURING METHOD 审中-公开光谱滤光片，包含这种光谱纯度滤光片和器件制造方法的光刻设备公开(公告)号：US20110157573A1
公开(公告)日：2011-06-30
申请号：US13060901
申请日：2009-07-29
Applicant: Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Martin Jacobus Johan Jak
Inventor： Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen , Martin Jacobus Johan Jak
CPC classification number: G03F7/70941 , G02B5/208 , G03F7/70191 , G03F7/70575 , G21K1/10
Abstract: A spectral purity filter includes an aperture. The spectral purity filter is configured to enhance the spectral purity of a radiation beam by being configured to absorb radiation of a first wavelength and allow at least a portion of radiation of a second wavelength to transmit through the aperture. The first wavelength is larger than the second wavelength. The spectral purity filter may be used to improve the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam.
Abstract translation: 光谱纯度滤光片包括孔径。 光谱纯度滤光器被配置为通过被配置为吸收第一波长的辐射并且允许第二波长的至少一部分辐射透射通过孔来增强辐射束的光谱纯度。 第一波长大于第二波长。 光谱纯度滤光片可用于提高极紫外（EUV）辐射束的光谱纯度。
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公开(公告)号：US20110043782A1
公开(公告)日：2011-02-24
申请号：US12860603
申请日：2010-08-20
Applicant: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
Inventor： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Maarten Marinus Johannes Wilhelmus Van Herpen , Andrei Mikhailovich Yakunin , Martin Jacobus Johan Jak
CPC classification number: G03B27/72 , G02B27/46 , G03F7/70191 , G03F7/70575
Abstract: A spectral purity filter includes a plurality of apertures extending through a member. The apertures are arranged to suppress radiation having a first wavelength and to allow at least a portion of radiation having a second wavelength to be transmitted through the apertures. The second wavelength of radiation is shorter than the first wavelength of radiation, A first region of the spectral purity filter has a first configuration that results in a first radiation transmission profile for the radiation having the first wavelength and the radiation having the second wavelength, and a second region of the spectral purity filter has a second, different configuration that results in a second, different radiation transmission profile for the radiation having the first wavelength and the radiation having the second wavelength.
Abstract translation: 光谱纯度滤光器包括延伸穿过部件的多个孔。 孔被布置成抑制具有第一波长的辐射并且允许具有第二波长的辐射的至少一部分透射通过孔。 辐射的第二波长比辐射的第一波长短。光谱纯度滤光器的第一区域具有第一配置，其导致具有第一波长的辐射和具有第二波长的辐射的第一辐射透射曲线，以及 光谱纯度滤光器的第二区域具有第二不同的结构，其导致具有第一波长的辐射和具有第二波长的辐射的第二不同的辐射透射分布。
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公开(公告)号：US07687788B2
公开(公告)日：2010-03-30
申请号：US11826525
申请日：2007-07-16
IPC: H05G2/00
CPC classification number: G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70883 , G03F7/70983
Abstract: A debris prevention system is constructed and arranged to prevent debris that emanates from a radiation source from propagating with radiation from the radiation source into or within a lithographic apparatus. The debris prevention system includes an aperture that defines a maximum emission angle of the radiation coming from the radiation source, and a first debris barrier having a radiation transmittance. The first debris barrier includes a rotatable foil trap. The debris prevention system also includes a second debris barrier that has a radiation transmittance. The first debris barrier is configured to cover a part of the emission angle and the second debris barrier is configured to cover another part of the emission angle.
Abstract translation: 防碎系统被构造和布置成防止从辐射源发出的碎屑通过来自辐射源的辐射传播到光刻设备内或在光刻设备内。 碎片防止系统包括限定来自辐射源的辐射的最大发射角的孔，以及具有辐射透射率的第一碎片屏障。 第一个碎片障碍物包括一个可旋转的箔片陷阱。 碎片防止系统还包括具有辐射透射率的第二碎片屏障。 第一碎片屏障配置成覆盖发射角的一部分，并且第二碎片屏障构造为覆盖发射角的另一部分。
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公开(公告)号：US20090309048A1
公开(公告)日：2009-12-17
申请号：US12465118
申请日：2009-05-13
Applicant: Maarten Marinus Johannes Wilhelmus VAN HERPEN , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardu Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
Inventor： Maarten Marinus Johannes Wilhelmus VAN HERPEN , Vadim Yevgenyevich Banine , Derk Jan Wilfred Klunder , Wouter Anthon Soer , Johannes Christiaan Leonardu Franken , Olav Waldemar Vladimir Frijns , Niels Machiel Driessen
CPC classification number: G03F7/70916 , G01N21/15 , G03F7/70558
Abstract: An optical sensor apparatus for use in an extreme ultraviolet lithographic system is disclosed. The apparatus includes an optical sensor comprising a sensor surface and a removal mechanism configured to remove debris from the sensor surface. Accordingly, dose and/or contamination measurements may be carried out conveniently for the lithographic system.
Abstract translation: 公开了一种用于极紫外光刻系统的光学传感器装置。 该装置包括光学传感器，其包括传感器表面和被配置为从传感器表面去除碎屑的移除机构。 因此，可以方便地为光刻系统进行剂量和/或污染测量。
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公开(公告)号：US20090272917A1
公开(公告)日：2009-11-05
申请号：US12431423
申请日：2009-04-28
Applicant: Wouter Anthon Soer , Vadim Yevgenyevich Banine , Tjarko Adriaan Rudolf Van Empel , Erik Roelof Loopstra , Maarten Marinus Johannes Wilhelmus Van Herpen
Inventor： Wouter Anthon Soer , Vadim Yevgenyevich Banine , Tjarko Adriaan Rudolf Van Empel , Erik Roelof Loopstra , Maarten Marinus Johannes Wilhelmus Van Herpen
CPC classification number: G03F7/70916 , G21K2201/064 , H05G2/005
Abstract: A radiation source includes a radiation emitter configured to emit radiation, a collector configured to collect the radiation, and a contamination trap configured to trap contamination emitted by the radiation source. The contamination trap includes a plurality of foils that extend substantially radially, a first magnet ring configured to lie outside of an outer conical trajectory of radiation that is collected by the collector, and a second magnet ring configured to lie within the trajectory of radiation that is collected by the collector. The magnet rings are configured to provide a magnetic field that includes a component that is parallel to the foils.
Abstract translation: 辐射源包括被配置为发射辐射的辐射发射器，被配置为收集辐射的收集器以及被配置为捕获由辐射源发射的污染的污染阱。 污染物捕集器包括大致径向延伸的多个箔片，构造成位于由收集器收集的辐射的外锥形轨迹之外的第一磁环，以及构造成位于辐射轨迹内的第二磁环， 由收藏者收集。 磁环被配置成提供包括与箔片平行的部件的磁场。
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