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    92.
    发明专利
    未知

    公开(公告)号：DE602005019930D1

    公开(公告)日：2010-04-29

    申请号：DE602005019930

    申请日：2005-01-14

    Applicant: ADEKA CORP

    Inventor： KOBAYASHI HIROMITSU ,  NITO HIROHISA ,  KAWAMATA HIROMASA

    IPC: C25D3/00 ,  C23C18/16 ,  C25D3/02 ,  C25D3/32 ,  C25D7/12 ,  C25D21/14

    Abstract: A plating bath additive and a plating bath using the said additive are provided, which plating bath contains a hydroxyalkanesulfonic acid and which even when applied to an electronic part such as a semiconductor device does not give rise to a problem such as circuit-to-circuit insulation becoming defective. The plating bath additive contains a hydroxyalkanesulfonic acid as a main component and has an alkali metal content of less than 0.05 mass% relative to the hydroxyalkanesulfonic acid. The plating bath incorporates the said additive therein.

    93.
    发明专利
    未知

    公开(公告)号：DE112006001453T5

    公开(公告)日：2008-11-06

    申请号：DE112006001453

    申请日：2006-03-14

    Applicant: ADEKA CORP

    Inventor： IRISAWA MASATOMI ,  MIURA TOMOHISA ,  SHINANO HIROKATSU

    IPC: C07C43/225 ,  C09K19/12 ,  C09K19/14 ,  C09K19/20 ,  C09K19/32 ,  C09K19/34 ,  G02F1/13

    Abstract: A compound represented by the following general formula (I). (In the formula, R1 is hydrogen or C1-8 alkyl; ring A is 1,4-phenylene, 1,4-trans-cyclohexylene, or 2,6-naphthylene; Z1 and Z2 each are —COO—, —OCO—, —CH2O—, —OCH2—, —CH2CH2—, —CH═CH—, —C≡C—, or a single bond; m is 1 or 2; n is 0 or 1; X1 and X2 each are C1-3 alkyl or alkoxy or hydrogen, provided that when one of X1 and X2 is hydrogen, the other must not be hydrogen; Y1 and Y2 each are hydrogen, fluorine, or chlorine; Q is C1-8 saturated or unsaturated alkyl in which all or part of the hydrogen atoms are replaced by a halogen atom; and L is oxygen atom or a single bond.)

    95.
    发明专利
    未知

    公开(公告)号：DE60317879T2

    公开(公告)日：2008-04-03

    申请号：DE60317879

    申请日：2003-01-20

    Applicant: ADEKA CORP

    Inventor： HASHIZUME KENICHI ,  OKUTOMI YASUO ,  KAJIMURA TORU ,  SHIRAHANE MIKI

    IPC: A23D9/00 ,  A21D2/16 ,  A21D10/00 ,  A21D13/00 ,  A21D13/08 ,  A23D7/00 ,  A23D9/04

    Abstract: A fat and oil composition of the present invention is one the oil phase of which crystallizes into fat and oil crystals of beta form having a double chain length structure when completely melted at 70 DEG C and maintained at 0 DEG C for 30 minutes and then at 5 DEG C for 7 days. The fat and oil composition comprises stable crystals without involving special temperature control in the preparation thereof. It is soft in low temperature, plastic over a wide temperature range, stable against hardness change with time, and particularly suitable for roll-in application.

    100.
    发明专利
    未知

    公开(公告)号：DE60125839T8

    公开(公告)日：2007-08-30

    申请号：DE60125839

    申请日：2001-12-25

    Applicant: ADEKA CORP

    Inventor： GOTA TETSUYA ,  KOBAYASHI KAZUSHI ,  KOMIYA KAORU ,  TSUZUKI MASAHIDE ,  MIZUTARI TAKEAKI ,  BEPPU KOJI

    IPC: C08F2/24 ,  C07C43/178 ,  C08F2/26 ,  C08F2/28 ,  C08F220/28 ,  C09K23/00 ,  C09K23/18 ,  C09K23/42

    Abstract: Disclosed are surfactants represented by the following formula (1): wherein R represents a branched aliphatic hydrocarbon group, a secondary aliphatic hydrocarbon group or a branched aliphatic acyl group, AO and AO' each independently represents an oxyalkylene group having 2 to 4 carbon atoms, L represents a group represented by formula (2) to be described below, z stands for a number of from 1 to 10, X represents a hydrogen atom or an ionic hydrophilic group, m stands for a number of from 0 to 1,000, and n stands for a number of from 0 to 1,000. wherein R and R each independently represents a hydrogen atom or a methyl group, x stands for a number of from 0 to 12, and y stands for a number of 0 or 1. These surfactants do not contain any phenyl ether group considered to have significant effects on the environment, such as a nonylphenyl group, and have performance comparable with reactive surfactants containing one or more phenyl ether groups. Emulsifiers for emulsion polymerization, dispersants for dispersion polymerization and resin modifiers, all of which contain the surfactants, are also disclosed.

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